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Class Information
Number: 438/301
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping
Description: Process having a step for the self-aligned introduction of electrically active dopant species into the semiconductor regions of the substrate to form the transistor source or drain regions or portions thereof.










Sub-classes under this class:

Class Number Class Name Patents
438/302 Oblique implantation 566
438/306 Plural doping steps 638
438/303 Utilizing gate sidewall structure 1,534


Patents under this class:

Patent Number Title Of Patent Date Issued
8710501 Electro-optical device, method of manufacturing the same, and electronic apparatus Apr. 29, 2014
8709929 Methods of forming semiconductor devices having diffusion regions of reduced width Apr. 29, 2014
8704229 Partial poly amorphization for channeling prevention Apr. 22, 2014
8704206 Memory device including transistor array with shared plate channel and method for making the same Apr. 22, 2014
8703593 Techniques for FinFET doping Apr. 22, 2014
8692327 Lateral double diffused metal oxide semiconductor device and method for manufacturing the same Apr. 8, 2014
8691684 Layout and pad floor plan of power transistor for good performance of SPU and STOG Apr. 8, 2014
8685817 Metal gate structures for CMOS transistor devices having reduced parasitic capacitance Apr. 1, 2014
8680589 Omega shaped nanowire field effect transistors Mar. 25, 2014
8679961 Method of manufacturing semiconductor device having pre-silicide nitrogen implant Mar. 25, 2014
8673723 Methods of forming isolation regions for FinFET semiconductor devices Mar. 18, 2014
8673720 Structure and fabrication of field-effect transistor having nitrided gate dielectric layer with tailored vertical nitrogen concentration profile Mar. 18, 2014
8664071 Castellated gate MOSFET tetrode capable of fully-depleted operation Mar. 4, 2014
8664070 High temperature gate replacement process Mar. 4, 2014
8664069 Semiconductor structure and process thereof Mar. 4, 2014
8658520 Method of manufacturing semiconductor device Feb. 25, 2014
8658506 Method and apparatus for selectively improving integrated device performance Feb. 25, 2014
8652916 Self aligned impact-ionization MOS (I-MOS) device and methods of manufacture Feb. 18, 2014
8643137 Short channel lateral MOSFET Feb. 4, 2014
8643093 Semiconductor device and method of manufacturing the same Feb. 4, 2014
8642435 Performing treatment on stressors Feb. 4, 2014
8617942 Producing transistor including single layer reentrant profile Dec. 31, 2013
8614134 Shallow source and drain architecture in an active region of a semiconductor device having a pronounced surface topography by tilted implantation Dec. 24, 2013
8603872 Field effect device provided with a localized dopant diffusion barrier area and fabrication method Dec. 10, 2013
8598005 Method and manufacture for embedded flash to achieve high quality spacers for core and high voltage devices and low temperature spacers for high performance logic devices Dec. 3, 2013
8598004 Self aligned MOS structure with polysilicon contact Dec. 3, 2013
8592279 Electronic device including a tapered trench and a conductive structure therein and a process of forming the same Nov. 26, 2013
8586440 Methods for fabricating integrated circuits using non-oxidizing resist removal Nov. 19, 2013
8580663 Formation of shallow junctions by diffusion from a dielectronic doped by cluster or molecular ion beams Nov. 12, 2013
8580645 Memory devices and methods of forming memory devices Nov. 12, 2013
8575621 Low interconnect resistance integrated switches Nov. 5, 2013
8563386 Integrated circuit system with bandgap material and method of manufacture thereof Oct. 22, 2013
8563385 Field effect transistor device with raised active regions Oct. 22, 2013
8551847 Method for forming metal gate Oct. 8, 2013
8546202 Manufacturing method for semiconductor structures Oct. 1, 2013
8541272 Method of manufacturing semiconductor device with offset sidewall structure Sep. 24, 2013
8536010 Method for making a disilicide Sep. 17, 2013
8530317 Corner rounding to improve metal fill in replacement gate process Sep. 10, 2013
8530296 High voltage transistor using diluted drain Sep. 10, 2013
8519916 Low interconnect resistance integrated switches Aug. 27, 2013
8518786 Process for forming a metal oxide semiconductor devices Aug. 27, 2013
8507960 Solid-state imaging device Aug. 13, 2013
8507350 Fabricating method of semiconductor elements Aug. 13, 2013
8501571 Method of manufacturing semiconductor device having silicon carbide layers containing phosphorus Aug. 6, 2013
8492846 Stress-generating shallow trench isolation structure having dual composition Jul. 23, 2013
8486795 Method of fabricating transistors Jul. 16, 2013
8486778 Low resistance source and drain extensions for ETSOI Jul. 16, 2013
8481382 Method and apparatus for manufacturing semiconductor device Jul. 9, 2013
8476154 Method of making a charge trapping non-volatile semiconductor memory device Jul. 2, 2013
8476133 Method of manufacture and structure for a trench transistor having a heavy body region Jul. 2, 2013











 
 
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