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Class Information
Number: 438/299
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned
Description: Process for making an insulated gate field effect transistor wherein a previously formed device feature is utilized to make device regions in the desired registration to the previously formed feature.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615454 |
Embedded stressed nitride liners for CMOS performance improvement |
Nov. 10, 2009 |
| 7611936 |
Method to control uniformity/composition of metal electrodes, silicides on topography and devices using this method |
Nov. 3, 2009 |
| 7605030 |
Hafnium tantalum oxynitride high-k dielectric and metal gates |
Oct. 20, 2009 |
| 7605087 |
Methods of forming semiconductor devices using di-block polymer layers |
Oct. 20, 2009 |
| 7601599 |
Semiconductor device and method for manufacturing the same |
Oct. 13, 2009 |
| 7598536 |
Semiconductor device having load resistor and method of fabricating the same |
Oct. 6, 2009 |
| 7588982 |
Methods of forming semiconductor constructions and flash memory cells |
Sep. 15, 2009 |
| 7569437 |
Formation of transistor having a strained channel region including a performance enhancing material composition utilizing a mask pattern |
Aug. 4, 2009 |
| 7569455 |
Manufacturing method of semiconductor device |
Aug. 4, 2009 |
| 7566603 |
Method for manufacturing semiconductor device having metal silicide layer |
Jul. 28, 2009 |
| 7566624 |
Method for the production of transistor structures with LDD |
Jul. 28, 2009 |
| 7560326 |
Silicon/silcion germaninum/silicon body device with embedded carbon dopant |
Jul. 14, 2009 |
| 7560776 |
Semiconductor device, electronic apparatus, method of manufacturing semiconductor device, and method of manufacturing electronic apparatus |
Jul. 14, 2009 |
| 7557023 |
Implantation of gate regions in semiconductor device fabrication |
Jul. 7, 2009 |
| 7550337 |
Dual gate dielectric SRAM |
Jun. 23, 2009 |
| 7550356 |
Method of fabricating strained-silicon transistors |
Jun. 23, 2009 |
| 7544575 |
Dual metal silicide scheme using a dual spacer process |
Jun. 9, 2009 |
| 7545023 |
Semiconductor transistor |
Jun. 9, 2009 |
| 7537981 |
Silicon on insulator device and method of manufacturing the same |
May. 26, 2009 |
| 7537990 |
Method of manufacturing semiconductor devices |
May. 26, 2009 |
| 7534665 |
Method of manufacturing semiconductor device |
May. 19, 2009 |
| 7531373 |
Methods of forming a conductive interconnect in a pixel of an imager and in other integrated circuitry |
May. 12, 2009 |
| 7524695 |
Image sensor and pixel having an optimized floating diffusion |
Apr. 28, 2009 |
| 7521316 |
Methods of forming gate structures for semiconductor devices |
Apr. 21, 2009 |
| 7517772 |
Selective etch for patterning a semiconductor film deposited non-selectively |
Apr. 14, 2009 |
| 7498602 |
Protecting silicon germanium sidewall with silicon for strained silicon/silicon mosfets |
Mar. 3, 2009 |
| 7494871 |
Semiconductor memory devices and methods for forming the same |
Feb. 24, 2009 |
| 7491595 |
Creating high voltage FETs with low voltage process |
Feb. 17, 2009 |
| 7488658 |
Stressed semiconductor device structures having granular semiconductor material |
Feb. 10, 2009 |
| 7488631 |
Semiconductor device having a schottky source/drain transistor |
Feb. 10, 2009 |
| 7485520 |
Method of manufacturing a body-contacted finfet |
Feb. 3, 2009 |
| 7482210 |
Method of fabricating semiconductor device having junction isolation insulating layer |
Jan. 27, 2009 |
| 7479422 |
Semiconductor device with stressors and method therefor |
Jan. 20, 2009 |
| 7479432 |
CMOS transistor junction regions formed by a CVD etching and deposition sequence |
Jan. 20, 2009 |
| 7473593 |
Semiconductor transistors with expanded top portions of gates |
Jan. 6, 2009 |
| 7473975 |
Fully silicided metal gate semiconductor device structure |
Jan. 6, 2009 |
| 7465953 |
Positioning of nanoparticles and fabrication of single election devices |
Dec. 16, 2008 |
| 7465620 |
Transistor mobility improvement by adjusting stress in shallow trench isolation |
Dec. 16, 2008 |
| 7465616 |
Method of forming a field effect transistor |
Dec. 16, 2008 |
| 7465635 |
Method for manufacturing a gate sidewall spacer using an energy beam treatment |
Dec. 16, 2008 |
| 7452777 |
Self-aligned trench MOSFET structure and method of manufacture |
Nov. 18, 2008 |
| 7439143 |
Flash memory device and method of manufacturing the same |
Oct. 21, 2008 |
| 7435659 |
Method for manufacturing a semiconductor device having an alignment feature formed using an N-type dopant and a wet oxidation process |
Oct. 14, 2008 |
| 7429517 |
CMOS transistor using high stress liner layer |
Sep. 30, 2008 |
| 7425490 |
Reducing reactions between polysilicon gate electrodes and high dielectric constant gate dielectrics |
Sep. 16, 2008 |
| 7422949 |
High voltage transistor and method of manufacturing the same |
Sep. 9, 2008 |
| 7419892 |
Semiconductor devices including implanted regions and protective layers and methods of forming the same |
Sep. 2, 2008 |
| 7416968 |
Methods of forming field effect transistors having metal silicide gate electrodes |
Aug. 26, 2008 |
| 7413956 |
Semiconductor device manufacturing method |
Aug. 19, 2008 |
| 7405130 |
Method of manufacturing a semiconductor device with a notched gate electrode |
Jul. 29, 2008 |
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