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Class Information
Number: 438/296
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Including isolation structure > Dielectric isolation formed by grooving and refilling with dielectric material
Description: Process for making an insulated gate field effect transistor including the step of forming an isolation structure by making a recess in the semiconductor substrate and refilling the recess with an insulative material.

Patents under this class:

Patent Number Title Of Patent Date Issued
7449378 Structure and method for improved stress and yield in pFETS with embedded SiGe source/drain regions Nov. 11, 2008
7440255 Capacitor constructions and methods of forming Oct. 21, 2008
7439141 Shallow trench isolation approach for improved STI corner rounding Oct. 21, 2008
7439139 Fully-depleted castellated gate MOSFET device and method of manufacture thereof Oct. 21, 2008
7439131 Flash memory device having resistivity measurement pattern and method of forming the same Oct. 21, 2008
7435656 Semiconductor device of transistor structure having strained semiconductor layer Oct. 14, 2008
7435654 Analog capacitor having at least three high-k dielectric layers, and method of fabricating the same Oct. 14, 2008
7432148 Shallow trench isolation by atomic-level silicon reconstruction Oct. 7, 2008
7429512 Method for fabricating flash memory device Sep. 30, 2008
7425489 Self-aligned shallow trench isolation Sep. 16, 2008
7422960 Method of forming gate arrays on a partial SOI substrate Sep. 9, 2008
7413952 Methods of forming a plurality of circuit components and methods of forming a plurality of structures suspended elevationally above a substrate Aug. 19, 2008
7407864 Polysilazane perhydride solution and method of manufacturing a semiconductor device using the same Aug. 5, 2008
7402492 Method of manufacturing a memory device having improved erasing characteristics Jul. 22, 2008
7396737 Method of forming shallow trench isolation Jul. 8, 2008
7396729 Methods of forming semiconductor devices having a trench with beveled corners Jul. 8, 2008
7396728 Methods of improving drive currents by employing strain inducing STI liners Jul. 8, 2008
7393751 Semiconductor structure including laminated isolation region Jul. 1, 2008
7393750 Method for manufacturing a semiconductor device Jul. 1, 2008
7387929 Capacitor in semiconductor device and method of manufacturing the same Jun. 17, 2008
7384854 Method of forming low capacitance ESD robust diodes Jun. 10, 2008
7384836 Integrated circuit transistor insulating region fabrication method Jun. 10, 2008
7381625 Deterministic process for constructing nanodevices Jun. 3, 2008
7381603 Semiconductor structure with improved on resistance and breakdown voltage performance Jun. 3, 2008
7374974 Thyristor-based device with trench dielectric material May. 20, 2008
7371645 Method of manufacturing a field effect transistor device with recessed channel and corner gate device May. 13, 2008
7368401 Integrated circuit having a doped porous dielectric and method of manufacturing the same May. 6, 2008
7368353 Trench power MOSFET with reduced gate resistance May. 6, 2008
7368346 Method for forming gate structure in flash memory device May. 6, 2008
7364975 Semiconductor device fabrication methods Apr. 29, 2008
7361551 Method for making an integrated circuit having an embedded non-volatile memory Apr. 22, 2008
7358144 Method for fabricating semiconductor device Apr. 15, 2008
7358143 Semiconductor device Apr. 15, 2008
7358142 Method for forming a FinFET by a damascene process Apr. 15, 2008
7354834 Semiconductor devices and methods to form trenches in semiconductor devices Apr. 8, 2008
7354818 Process for high voltage superjunction termination Apr. 8, 2008
7344949 Non-volatile memory device and method of fabricating the same Mar. 18, 2008
7338870 Methods of fabricating semiconductor devices Mar. 4, 2008
7338850 Method for manufacturing device isolation film of semiconductor device Mar. 4, 2008
7335565 Metal-oxide-semiconductor device having improved performance and reliability Feb. 26, 2008
7335564 Method for forming device isolation layer of semiconductor device Feb. 26, 2008
7326621 Method of fabricating a recess channel array transistor using a mask layer with a high etch selectivity with respect to a silicon substrate Feb. 5, 2008
7323394 Method of producing element separation structure Jan. 29, 2008
7316958 Masks for fabricating semiconductor devices and methods of forming mask patterns Jan. 8, 2008
7314803 Method for producing a semiconductor structure Jan. 1, 2008
7306998 Formation of abrupt junctions in devices by using silicide growth dopant snowplow effect Dec. 11, 2007
7303962 Fabricating method of CMOS and MOS device Dec. 4, 2007
7303951 Method of manufacturing a trench isolation region in a semiconductor device Dec. 4, 2007
7297604 Semiconductor device having dual isolation structure and method of fabricating the same Nov. 20, 2007
7279393 Trench isolation structure and method of manufacture therefor Oct. 9, 2007

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