Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Including isolation structure > Dielectric isolation formed by grooving and refilling with dielectric material > Patents

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Class Information
Number: 438/296
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Including isolation structure > Dielectric isolation formed by grooving and refilling with dielectric material
Description: Process for making an insulated gate field effect transistor including the step of forming an isolation structure by making a recess in the semiconductor substrate and refilling the recess with an insulative material.

Patents under this class:

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Patent Number	Title Of Patent	Date Issued
8173516	Method of forming shallow trench isolation structure	May. 8, 2012
8163621	High performance LDMOS device having enhanced dielectric strain layer	Apr. 24, 2012
8158488	Method of increasing deposition rate of silicon dioxide on a catalyst	Apr. 17, 2012
8148784	Semiconductor device having first and second device isolation layers formed of different insulation materials	Apr. 3, 2012
8133796	Method for fabricating shallow trench isolation structures	Mar. 13, 2012
8133797	Protective layer to enable damage free gap fill	Mar. 13, 2012
8120094	Shallow trench isolation with improved structure and method of forming	Feb. 21, 2012
8114746	Method for forming double gate and tri-gate transistors on a bulk substrate	Feb. 14, 2012
8114744	Methods for reducing gate dielectric thinning on trench isolation edges and integrated circuits therefrom	Feb. 14, 2012
8114743	Integrated circuit device with a semiconductor body and method for the production of an integrated circuit device	Feb. 14, 2012
8110455	Semiconductor device and a method of manufacturing the same	Feb. 7, 2012
8110466	Cross OD FinFET patterning	Feb. 7, 2012
8101512	Method of enhancing lithography capabilities during gate formation in semiconductors having a pronounced surface topography	Jan. 24, 2012
8102030	Semiconductor device with strain	Jan. 24, 2012
8093084	Semiconductor device with photonics	Jan. 10, 2012
8088664	Method of manufacturing integrated deep and shallow trench isolation structures	Jan. 3, 2012
8084355	Methods of forming copper-comprising conductive lines in the fabrication of integrated circuitry	Dec. 27, 2011
8076208	Method for forming transistor with high breakdown voltage using pitch multiplication technique	Dec. 13, 2011
8076203	Semiconductor device and method of manufacturing the same	Dec. 13, 2011
8072035	Semiconductor device and method of manufacturing the same	Dec. 6, 2011
8067293	Power semiconductor device and method of manufacturing the same	Nov. 29, 2011
8067799	Semiconductor device having recess channel structure and method for manufacturing the same	Nov. 29, 2011
8062953	Semiconductor devices with extended active regions	Nov. 22, 2011
8053860	Semiconductor device and manufacturing method of the same	Nov. 8, 2011
8053322	Epitaxial deposition-based processes for reducing gate dielectric thinning at trench edges and integrated circuits therefrom	Nov. 8, 2011
8053272	Semiconductor device fabrication method	Nov. 8, 2011
8048765	Method for fabricating a MOS transistor with source/well heterojunction and related structure	Nov. 1, 2011
8043918	Semiconductor device and its manufacturing method	Oct. 25, 2011
8043917	Method for manufacturing semiconductor device	Oct. 25, 2011
8043912	Manufacturing method of a semiconductor device having polycide wiring layer	Oct. 25, 2011
8039340	Methods of forming an array of memory cells, methods of forming a plurality of field effect transistors, methods of forming source/drain regions and isolation trenches, and methods of forming	Oct. 18, 2011
8039359	Method of forming low capacitance ESD device and structure therefor	Oct. 18, 2011
8034691	HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system	Oct. 11, 2011
8030171	Method of forming element isolation film and nonvolatile semiconductor memory	Oct. 4, 2011
8030173	Silicon nitride hardstop encapsulation layer for STI region	Oct. 4, 2011
8017486	Method of fabricating low on-resistance lateral double-diffused MOS device	Sep. 13, 2011
8012847	Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry	Sep. 6, 2011
8012831	Method of forming isolation layer of flash memory device	Sep. 6, 2011
8012829	Semiconductor device and method of manufacturing the same	Sep. 6, 2011
8004039	Field effect transistor with trench-isolated drain	Aug. 23, 2011
7994013	Semiconductor device and method of fabricating the semiconductor device	Aug. 9, 2011
7994049	Manufacturing method of semiconductor device including filling a connecting hole with metal film	Aug. 9, 2011
7994061	Mask layout and method for forming vertical channel transistor in semiconductor device using the same	Aug. 9, 2011
7989894	Fusion bonding process and structure for fabricating silicon-on-insulation (SOI) semiconductor devices	Aug. 2, 2011
7989309	Method of improving a shallow trench isolation gapfill process	Aug. 2, 2011
7977196	Semiconductor device with increased channel area and fabrication method thereof	Jul. 12, 2011
7977218	Thin oxide dummy tiling as charge protection	Jul. 12, 2011
7977749	Semiconductor device with increased channel area	Jul. 12, 2011
7968409	Mixed-signal semiconductor platform incorporating fully-depleted castellated-gate MOSFET device and method of manufacture thereof	Jun. 28, 2011
7964467	Method, structure and design structure for customizing history effects of soi circuits	Jun. 21, 2011