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Class Information
Number: 438/296
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Including isolation structure > Dielectric isolation formed by grooving and refilling with dielectric material
Description: Process for making an insulated gate field effect transistor including the step of forming an isolation structure by making a recess in the semiconductor substrate and refilling the recess with an insulative material.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7618857 Method of reducing detrimental STI-induced stress in MOSFET channels Nov. 17, 2009
7615391 Solar cell and method of fabricating the same Nov. 10, 2009
7615451 Method for forming semiconductor device Nov. 10, 2009
7615818 Semiconductor device and method of manufacturing the same Nov. 10, 2009
7611950 Method for forming shallow trench isolation in semiconductor device Nov. 3, 2009
7608509 Method of manufacturing a flash memory device having compensation members formed on edge portions of a tunnel oxide layer Oct. 27, 2009
7608518 Semiconductor device and method for fabricating the same Oct. 27, 2009
7608514 MSM binary switch memory Oct. 27, 2009
7601576 Method for fabricating semiconductor device Oct. 13, 2009
7598562 Semiconductor device and method of manufacturing the same Oct. 6, 2009
7595224 Method for manufacturing integrated circuit Sep. 29, 2009
7595253 Method of forming the semiconductor device Sep. 29, 2009
7592216 Fabrication process of a semiconductor device having a capacitor Sep. 22, 2009
7592223 Methods of fabricating non-volatile memory with integrated select and peripheral circuitry and post-isolation memory cell formation Sep. 22, 2009
7588986 Method of manufacturing a semiconductor device Sep. 15, 2009
7585723 Method for fabricating capacitor Sep. 8, 2009
7579234 Method for fabricating memory device with recess channel MOS transistor Aug. 25, 2009
7579256 Method for forming shallow trench isolation in semiconductor device using a pore-generating layer Aug. 25, 2009
7579664 Semiconductor device with trench type device isolation layer and method for fabricating the same Aug. 25, 2009
7566621 Method for forming semiconductor device having fin structure Jul. 28, 2009
7563683 Transistor and method of fabricating the same Jul. 21, 2009
7560357 Method for creating narrow trenches in dielectric materials Jul. 14, 2009
7560335 Memory device transistors Jul. 14, 2009
7553748 Semiconductor device and method of manufacturing the same Jun. 30, 2009
7550355 Low-leakage transistor and manufacturing method thereof Jun. 23, 2009
7550796 Germanium semiconductor device and method of manufacturing the same Jun. 23, 2009
7547605 Microelectronic device and a method for its manufacture Jun. 16, 2009
7544560 Image sensor and fabrication method thereof Jun. 9, 2009
7538002 Semiconductor process integrating source/drain stressors and interlevel dielectric layer stressors May. 26, 2009
7534687 Semiconductor device and method for manufacturing the same May. 19, 2009
7531415 Multilayered CMP stop for flat planarization May. 12, 2009
7531424 Vacuum wafer-level packaging for SOI-MEMS devices May. 12, 2009
7528046 Method for manufacturing semiconductor device May. 5, 2009
7528033 Semiconductor device with a dummy gate and a method of manufacturing a semiconductor device with a dummy gate May. 5, 2009
7528045 MOS transistor and manufacturing methods thereof May. 5, 2009
7524729 Method of manufacturing a semiconductor integrated circuit device having a trench Apr. 28, 2009
7521318 Semiconductor device and method of manufacturing the same Apr. 21, 2009
7517760 Semiconductor device manufacturing method including three gate insulating films Apr. 14, 2009
7514304 MOSFET having channel in bulk semiconductor and source/drain on insulator, and method of fabrication Apr. 7, 2009
7514336 Robust shallow trench isolation structures and a method for forming shallow trench isolation structures Apr. 7, 2009
7501326 Method for forming isolation layer of semiconductor device Mar. 10, 2009
7501686 Semiconductor device and method for manufacturing the same Mar. 10, 2009
7498233 Method of forming an insulation layer structure having a concave surface and method of manufacturing a memory device using the same Mar. 3, 2009
7494883 Semiconductor device having a trench isolation and method of fabricating the same Feb. 24, 2009
7491614 Methods for forming channel stop for deep trench isolation prior to deep trench etch Feb. 17, 2009
7488658 Stressed semiconductor device structures having granular semiconductor material Feb. 10, 2009
7488659 Structure and methods for stress concentrating spacer Feb. 10, 2009
7485542 Method for producing bit lines for UCP flash memories Feb. 3, 2009
7470587 Flash memory device and method of manufacturing the same Dec. 30, 2008
7468301 PMOS transistor with increased effective channel length in the peripheral region and a multi-height substrate Dec. 23, 2008

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