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Class Information
Number: 438/294
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Including isolation structure
Description: Process for making an insulated gate field effect transistor having a structure which serves to at least partially electrically isolate the semiconductor region in which the device is formed from laterally adjacent semiconductive regions.

Sub-classes under this class:

Class Number Class Name Patents
438/296 Dielectric isolation formed by grooving and refilling with dielectric material 1,012
438/297 Recessed oxide formed by localized oxidation (i.e., locos) 519
438/295 Total dielectric isolation 157

Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
8709900 Double diffused metal oxide semiconductor device and manufacturing method thereof Apr. 29, 2014
8704332 Metal oxide semiconductor field effect transistor (MOSFET) gate termination Apr. 22, 2014
8691643 Methods of forming semiconductor devices Apr. 8, 2014
8686500 Double diffused metal oxide semiconductor device and manufacturing method thereof Apr. 1, 2014
8679929 On current in one-time-programmable memory cells Mar. 25, 2014
8673683 Graphene field effect transistor Mar. 18, 2014
8673722 Strained channel field effect transistor and the method for fabricating the same Mar. 18, 2014
8674449 Semiconductor device and method for manufacturing the same Mar. 18, 2014
8664050 Structure and method to improve ETSOI MOSFETS with back gate Mar. 4, 2014
8658504 Method for manufacturing semiconductor device Feb. 25, 2014
8648394 Method for growing conformal EPI layers and structure thereof Feb. 11, 2014
8642429 Wide and deep oxide trench in a semiconductor substrate with interspersed vertical oxide ribs Feb. 4, 2014
8633055 Graphene field effect transistor Jan. 21, 2014
8633081 Modifying growth rate of a device layer Jan. 21, 2014
8629028 Metal oxide semiconductor field effect transistor (MOSFET) gate termination Jan. 14, 2014
8614130 Integrated circuit guard rings Dec. 24, 2013
8580625 Metal oxide semiconductor transistor and method of manufacturing the same Nov. 12, 2013
8575702 Semiconductor device and method for fabricating semiconductor device Nov. 5, 2013
8575704 Semiconductor device and manufacturing method of the semiconductor device Nov. 5, 2013
8557666 Methods for fabricating integrated circuits Oct. 15, 2013
8551843 Methods of forming CMOS semiconductor devices Oct. 8, 2013
8552478 Corner transistor and method of fabricating the same Oct. 8, 2013
8552494 Semiconductor devices including elevated source and drain regions Oct. 8, 2013
8546204 Method for growing conformal epi layers and structure thereof Oct. 1, 2013
8546854 Semiconductor device and method for manufacturing the same Oct. 1, 2013
8530299 Electronic device including a well region Sep. 10, 2013
8530286 Low power semiconductor transistor structure and method of fabrication thereof Sep. 10, 2013
8524560 Method of fabricating semiconductor device with vertical channel transistor Sep. 3, 2013
8524569 Methods of forming an isolation layer and methods of manufacturing semiconductor devices having an isolation layer Sep. 3, 2013
8519480 Electrostatic discharge protection device Aug. 27, 2013
8507349 Semiconductor device employing fin-type gate and method for manufacturing the same Aug. 13, 2013
8501566 Method for fabricating a recessed channel access transistor device Aug. 6, 2013
8486791 Mufti-layer single crystal 3D stackable memory Jul. 16, 2013
8482067 Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) with tapered dielectric plates to achieve a high drain-to-body breakdown voltage, a method of forming the t Jul. 9, 2013
8471312 Solid-state imaging device and camera Jun. 25, 2013
8455323 Method for manufacturing semiconductor wafer Jun. 4, 2013
8440532 Structure and method for making metal semiconductor field effect transistor (MOSFET) with isolation last process May. 14, 2013
8405156 Semiconductor device and manufacturing method thereof Mar. 26, 2013
8384060 Resistive memory device Feb. 26, 2013
8369144 Semiconductor device and method of manufacturing the same Feb. 5, 2013
8354319 Integrated planar and multiple gate FETs Jan. 15, 2013
8350339 Integrated circuits having dummy gate electrodes and methods of forming the same Jan. 8, 2013
8343872 Method of forming strained structures with compound profiles in semiconductor devices Jan. 1, 2013
8338919 Semiconductor device with strain Dec. 25, 2012
8338909 Two-Step STI formation process Dec. 25, 2012
8338250 Process for fabricating memory device Dec. 25, 2012
8334184 Polish to remove topography in sacrificial gate layer prior to gate patterning Dec. 18, 2012
8334219 Method of forming stress-tuned dielectric film having Si-N bonds by modified PEALD Dec. 18, 2012
8334177 Methods for forming isolated fin structures on bulk semiconductor material Dec. 18, 2012
8324668 Dummy structure for isolating devices in integrated circuits Dec. 4, 2012

1 2 3 4 5 6 7 8 9 10 11

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