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Class Information
Number: 438/288
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Having step of storing electrical charge in gate dielectric
Description: Process for making an insulated gate field effect transistor having an active step of storing electrical charge in the gate dielectric insulator.

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8679927 Integration of non-volatile charge trap memory devices and logic CMOS devices Mar. 25, 2014
8669161 Fabricating method of mirror bit memory device having split ONO film with top oxide film formed by oxidation process Mar. 11, 2014
8659071 Method and structure to improve the erasing speed operation of SONOS memory device having a graded silicon nitride layer Feb. 25, 2014
8642439 Semiconductor device and method of formation Feb. 4, 2014
8633080 Methods of making multi-state non-volatile memory cells Jan. 21, 2014
8629018 Methods of forming NAND memory constructions Jan. 14, 2014
8610199 Fabricating method of mirror bit memory device having split ONO film with top oxide film formed by oxidation process Dec. 17, 2013
8603878 Vertical-type semiconductor devices and methods of manufacturing the same Dec. 10, 2013
8586475 Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same Nov. 19, 2013
8574992 Contact architecture for 3D memory array Nov. 5, 2013
8575675 Nonvolatile memory device Nov. 5, 2013
8569182 Methods of fabricating three-dimensional semiconductor device Oct. 29, 2013
8569798 Semicondcutor device comprising transistor Oct. 29, 2013
8552490 Nonvolatile memory device with a high-K charge storage layer having a U-shaped,cross-sectional structure Oct. 8, 2013
8546215 Methods of fabricating a memory device Oct. 1, 2013
8530305 Nanodot charge storage structures and methods Sep. 10, 2013
8513075 Method for manufacturing a semiconductor device Aug. 20, 2013
8507968 Memristive transistor memory Aug. 13, 2013
8492213 Transistor and method for forming the same Jul. 23, 2013
8481385 Methods of fabricating a memory device Jul. 9, 2013
8460996 Semiconductor devices with different dielectric thicknesses Jun. 11, 2013
8460998 Method of fabricating semiconductor device Jun. 11, 2013
8440527 Memory device and method of fabricating the same May. 14, 2013
8440531 Methods of forming semiconductor memory devices having vertically stacked memory cells therein May. 14, 2013
8441072 Non-planar semiconductor structure and fabrication method thereof May. 14, 2013
8409952 Method of forming an electronic device including forming a charge storage element in a trench of a workpiece Apr. 2, 2013
8404548 Method of manufacturing nonvolatile memory device and nonvolatile memory device manufactured by the method Mar. 26, 2013
8404549 Fabricating method of mirror bit memory device having split ONO film with top oxide film formed by oxidation process Mar. 26, 2013
8377782 Method for fabricating a non-volatile memory device Feb. 19, 2013
8378392 Trench MOSFET with body region having concave-arc shape Feb. 19, 2013
8372699 Method for forming a split-gate memory cell Feb. 12, 2013
8373233 Highly N-type and P-type co-doping silicon for strain silicon application Feb. 12, 2013
8349695 Work function adjustment in high-k gate stacks including gate dielectrics of different thickness Jan. 8, 2013
8329535 Multi-level-cell trapping DRAM Dec. 11, 2012
8329543 Method for forming a semiconductor device having nanocrystals Dec. 11, 2012
8329544 Method for forming a semiconductor device having nanocrystals Dec. 11, 2012
8330210 High-.kappa. capped blocking dielectric bandgap engineered SONOS and MONOS Dec. 11, 2012
8318566 Method to seperate storage regions in the mirror bit device Nov. 27, 2012
8288811 Fortification of charge-storing material in high-K dielectric environments and resulting apparatuses Oct. 16, 2012
8278168 Methods of forming a semiconductor device Oct. 2, 2012
8273627 Semiconductor device and method for manufacturing thereof Sep. 25, 2012
8273628 Semiconductor device manufacturing method including exposing electrode layers into a hole Sep. 25, 2012
8268692 Non-volatile memory cell devices and methods Sep. 18, 2012
8263465 Method of forming memory with floating gates including self-aligned metal nanodots using a coupling layer Sep. 11, 2012
8247850 Dual interlayer dielectric stressor integration with a sacrificial underlayer film stack Aug. 21, 2012
8236647 Method for fabricating nonvolatile memory device Aug. 7, 2012
8237213 Memory arrays having substantially vertical, adjacent semiconductor structures and the formation thereof Aug. 7, 2012
8232170 Methods for fabricating semiconductor devices with charge storage patterns Jul. 31, 2012
8222105 Methods of fabricating a memory device Jul. 17, 2012
8222111 Simultaneous formation of a top oxide layer in a silicon-oxide-nitride-oxide-silicon (SONOS) transistor and a gate oxide in a metal oxide semiconductor (MOS) Jul. 17, 2012

1 2 3 4 5 6

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