| |
 |
|
Class Information
Number: 438/276
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Making plural insulated gate field effect transistors of differing electrical characteristics > Introducing a dopant into the channel region of selected transistors
Description: Process for making plural insulated gate field effect transistors having a step of introducing an electrically active dopant species into the semiconductor channel region beneath the gate insulator of one or more transistors to produce transistors of differing electrical characteristics.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622354 |
Integrated circuit and method of manufacturing an integrated circuit |
Nov. 24, 2009 |
| 7622356 |
Method of fabricating metal oxide semiconductor field effect transistor |
Nov. 24, 2009 |
| 7622777 |
Semiconductor device and method for fabricating the same |
Nov. 24, 2009 |
| 7615453 |
Method of manufacturing a semiconductor integrated circuit device |
Nov. 10, 2009 |
| 7608504 |
Memory and manufacturing method thereof |
Oct. 27, 2009 |
| 7595243 |
Fabrication of semiconductor structure having N-channel channel-junction field-effect transistor |
Sep. 29, 2009 |
| 7588986 |
Method of manufacturing a semiconductor device |
Sep. 15, 2009 |
| 7534674 |
Method of making a semiconductor device with a stressor |
May. 19, 2009 |
| 7517760 |
Semiconductor device manufacturing method including three gate insulating films |
Apr. 14, 2009 |
| 7514318 |
Method for fabricating non-volatile memory cells |
Apr. 7, 2009 |
| 7504278 |
Image sensor and method for manufacturing the same |
Mar. 17, 2009 |
| 7491605 |
Zero cost non-volatile memory cell with write and erase features |
Feb. 17, 2009 |
| 7488652 |
Manufacturing method of gate oxidation films |
Feb. 10, 2009 |
| 7488653 |
Semiconductor device and method for implantation of doping agents in a channel |
Feb. 10, 2009 |
| 7482232 |
Method for fabricating a nanotube field effect transistor |
Jan. 27, 2009 |
| 7482233 |
Embedded non-volatile memory cell with charge-trapping sidewall spacers |
Jan. 27, 2009 |
| 7470560 |
Image sensor having a charge storage region provided within an implant region |
Dec. 30, 2008 |
| 7439140 |
Formation of standard voltage threshold and low voltage threshold MOSFET devices |
Oct. 21, 2008 |
| 7432164 |
Semiconductor device comprising a transistor having a counter-doped channel region and method for forming the same |
Oct. 7, 2008 |
| 7413946 |
Formation of standard voltage threshold and low voltage threshold MOSFET devices |
Aug. 19, 2008 |
| 7405129 |
Device comprising doped nano-component and method of forming the device |
Jul. 29, 2008 |
| 7402495 |
Method for manufacturing a semiconductor device |
Jul. 22, 2008 |
| 7399678 |
Method for reading an array of multi-bit ROM cells with each cell having bi-directional read |
Jul. 15, 2008 |
| 7396727 |
Transistor of semiconductor device and method for fabricating the same |
Jul. 8, 2008 |
| 7385232 |
CMOS imager with enhanced transfer of charge and low voltage operation and method of formation |
Jun. 10, 2008 |
| 7354817 |
Semiconductor device, manufacturing method thereof, and CMOS integrated circuit device |
Apr. 8, 2008 |
| 7352035 |
Flash memory devices and methods for fabricating flash memory devices |
Apr. 1, 2008 |
| 7329569 |
Methods of forming semiconductor devices including mesa structures and multiple passivation layers |
Feb. 12, 2008 |
| 7314800 |
Application of different isolation schemes for logic and embedded memory |
Jan. 1, 2008 |
| 7265012 |
Formation of standard voltage threshold and low voltage threshold MOSFET devices |
Sep. 4, 2007 |
| 7259054 |
Method of manufacturing a semiconductor device that includes a process for forming a high breakdown voltage field effect transistor |
Aug. 21, 2007 |
| 7230877 |
Method of making a semiconductor memory device |
Jun. 12, 2007 |
| 7217606 |
Method of forming vertical sub-micron CMOS transistors on (110), (111), (311), (511), and higher order surfaces of bulk, soi and thin film structures |
May. 15, 2007 |
| 7186619 |
Insulated-gate field-effect transistor integrated with negative differential resistance (NDR) FET |
Mar. 6, 2007 |
| 7115462 |
Processes providing high and low threshold p-type and n-type transistors |
Oct. 3, 2006 |
| 7115471 |
Method of manufacturing semiconductor device including nonvolatile memory |
Oct. 3, 2006 |
| 7091093 |
Method for fabricating a semiconductor device having a pocket dopant diffused layer |
Aug. 15, 2006 |
| 7049189 |
Method of fabricating non-volatile memory cell adapted for integration of devices and for multiple read/write operations |
May. 23, 2006 |
| 7015535 |
Nonvolatile semiconductor memory device |
Mar. 21, 2006 |
| 7008848 |
Mask ROM fabrication method |
Mar. 7, 2006 |
| 6998316 |
Method for fabricating read only memory including a first and second exposures to a photoresist layer |
Feb. 14, 2006 |
| 6979609 |
Method of fabricating MOSFET transistors with multiple threshold voltages by halo compensation and masks |
Dec. 27, 2005 |
| 6969642 |
Method of controlling implantation dosages during coding of read-only memory devices |
Nov. 29, 2005 |
| 6933188 |
Use of a selective hard mask for the integration of double diffused drain MOS devices in deep sub-micron fabrication technologies |
Aug. 23, 2005 |
| 6919607 |
Structure of two-bit mask read-only memory device and fabricating method thereof |
Jul. 19, 2005 |
| 6916713 |
Code implantation process |
Jul. 12, 2005 |
| 6916716 |
Asymmetric halo implants |
Jul. 12, 2005 |
| 6900101 |
LDMOS transistors and methods for making the same |
May. 31, 2005 |
| 6888202 |
Low-power high-performance storage circuitry |
May. 3, 2005 |
| 6879007 |
Low volt/high volt transistor |
Apr. 12, 2005 |
|
|
|
