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Class Information
Number: 438/265
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Having additional gate electrode surrounded by dielectric (i.e., floating gate) > Oxidizing sidewall of gate electrode
Description: Process for making a floating gate-type field effect transistor including a step of forming a dielectric sidewall on the gate electrode by reacting the gate electrode material with oxygen.


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
7452766 Finned memory cells and the fabrication thereof Nov. 18, 2008
7439106 Gate CD trimming beyond photolithography Oct. 21, 2008
7439157 Isolation trenches for memory devices Oct. 21, 2008
7439131 Flash memory device having resistivity measurement pattern and method of forming the same Oct. 21, 2008
7413953 Method of forming floating gate array of flash memory device Aug. 19, 2008
7410869 Method of manufacturing a semiconductor device Aug. 12, 2008
7402492 Method of manufacturing a memory device having improved erasing characteristics Jul. 22, 2008
7371645 Method of manufacturing a field effect transistor device with recessed channel and corner gate device May. 13, 2008
7368348 Methods of forming MOS transistors having buried gate electrodes therein May. 6, 2008
7364963 Method for fabricating semiconductor device Apr. 29, 2008
7358130 Method for monitoring lateral encroachment of spacer process on a CD SEM Apr. 15, 2008
7358139 Method of forming a field effect transistor including depositing and removing insulative material effective to expose transistor gate conductive material but not transistor gate semiconductor Apr. 15, 2008
7354824 Fabrication method of non-volatile memory Apr. 8, 2008
7332408 Isolation trenches for memory devices Feb. 19, 2008
7320915 Method of manufacturing flash memory device Jan. 22, 2008
7300842 Method of fabricating a mask ROM Nov. 27, 2007
7297598 Process for erase improvement in a non-volatile memory device Nov. 20, 2007
7276403 Selective oxidation of silicon in diode, TFT, and monolithic three dimensional memory arrays Oct. 2, 2007
7271064 Method of forming a field effect transistor using conductive masking material Sep. 18, 2007
7250337 Method for fabricating a nonvolatile sonos memory device Jul. 31, 2007
7247917 Nonvolatile semiconductor memory devices and methods of manufacturing the same Jul. 24, 2007
7244642 Method to obtain fully silicided gate electrodes Jul. 17, 2007
7232725 Split gate memory device and fabricating method thereof Jun. 19, 2007
7226838 Methods for fabricating a semiconductor device Jun. 5, 2007
7217621 Self-aligned split-gate NAND flash memory and fabrication process May. 15, 2007
7208377 Silicon oxidation method Apr. 24, 2007
7199034 Flash memory device and method for fabricating the same Apr. 3, 2007
7189618 Method of manufacturing a transistor of a semiconductor device Mar. 13, 2007
7183158 Method of fabricating a non-volatile memory Feb. 27, 2007
7179709 Method of fabricating non-volatile memory device having local SONOS gate structure Feb. 20, 2007
7166508 Method for forming nonvolatile memory device including insulating film containing nitrogen (nitride) Jan. 23, 2007
7163898 Method for manufacturing semiconductor integrated circuit structures Jan. 16, 2007
7160776 Methods of forming a gate structure of a non-volatile memory device and apparatus for performing the same Jan. 9, 2007
7118969 Method of manufacturing a floating gate and method of manufacturing a non-volatile semiconductor memory device comprising the same Oct. 10, 2006
7118967 Protection of charge trapping dielectric flash memory devices from UV-induced charging in BEOL processing Oct. 10, 2006
7115458 Gate coupling in floating-gate memory cells Oct. 3, 2006
7112491 Methods of forming field effect transistors including floating gate field effect transistors Sep. 26, 2006
7105398 Method for monitoring lateral encroachment of spacer process on a CD SEM Sep. 12, 2006
7091091 Nonvolatile memory fabrication methods in which a dielectric layer underlying a floating gate layer is spaced from an edge of an isolation trench and/or an edge of the floating gate layer Aug. 15, 2006
7087490 Method and composite for decreasing charge leakage Aug. 8, 2006
7084031 Method for manufacturing flash memory device and flash memory device Aug. 1, 2006
7084030 Method of forming a non-volatile memory device having floating trap type memory cell Aug. 1, 2006
7074678 Method for fabricating a buried bit line for a semiconductor memory Jul. 11, 2006
7074674 Method for manufacturing one-time electrically programmable read only memory Jul. 11, 2006
7012003 Memory for producing a memory component Mar. 14, 2006
6982203 Method of fabricating integrated circuitry Jan. 3, 2006
6977226 Semiconductor memory device and method for fabricating the same Dec. 20, 2005
6974748 Semiconductor device with split gate electrode structure and method for manufacturing the semiconductor device Dec. 13, 2005
6972229 Method of manufacturing self-aligned non-volatile memory device Dec. 6, 2005
6967372 Semiconductor memory array of floating gate memory cells with vertical control gate sidewalls and insulation spacers Nov. 22, 2005

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