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Class Information
Number: 438/231
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Self-aligned > Utilizing gate sidewall structure > Plural doping steps
Description: Process including multiple steps of introducing electrically active dopant species into semiconductor regions of the substrate.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7601583 |
Transistor structure of memory device and method for fabricating the same |
Oct. 13, 2009 |
| 7595234 |
Fabricating method for a metal oxide semiconductor transistor |
Sep. 29, 2009 |
| 7591659 |
Method and structure for second spacer formation for strained silicon MOS transistors |
Sep. 22, 2009 |
| 7582523 |
Method of manufacturing semiconductor device including insulated-gate field-effect transistors |
Sep. 1, 2009 |
| 7563665 |
Semiconductor device and method for manufacturing semiconductor device |
Jul. 21, 2009 |
| 7560319 |
Method for fabricating a semiconductor device |
Jul. 14, 2009 |
| 7550396 |
Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device |
Jun. 23, 2009 |
| 7528030 |
Semiconductor device comprising at least one MOS transistor having an etch stop layer, and corresponding fabrication process |
May. 5, 2009 |
| 7524716 |
Fabricating method of semiconductor structure |
Apr. 28, 2009 |
| 7514309 |
Methods to selectively protect NMOS regions, PMOS regions, and gate layers during EPI process |
Apr. 7, 2009 |
| 7510925 |
Method of manufacturing semiconductor device, and semiconductor device |
Mar. 31, 2009 |
| 7507618 |
Method for making electronic devices using metal oxide nanoparticles |
Mar. 24, 2009 |
| 7504289 |
Process for forming an electronic device including transistor structures with sidewall spacers |
Mar. 17, 2009 |
| 7494862 |
Methods for uniform doping of non-planar transistor structures |
Feb. 24, 2009 |
| 7473595 |
Method for decreasing PN junction leakage current of dynamic random access memory |
Jan. 6, 2009 |
| 7470562 |
Methods of forming field effect transistors using disposable aluminum oxide spacers |
Dec. 30, 2008 |
| 7456062 |
Method of forming a semiconductor device |
Nov. 25, 2008 |
| 7439123 |
Low resistance contact semiconductor device structure |
Oct. 21, 2008 |
| 7439124 |
Method of manufacturing a semiconductor device and semiconductor device |
Oct. 21, 2008 |
| 7432144 |
Method for forming a transistor for reducing a channel length |
Oct. 7, 2008 |
| 7432570 |
Semiconductor device and manufacturing method thereof |
Oct. 7, 2008 |
| 7413946 |
Formation of standard voltage threshold and low voltage threshold MOSFET devices |
Aug. 19, 2008 |
| 7410859 |
Stressed MOS device and method for its fabrication |
Aug. 12, 2008 |
| 7402485 |
Method of forming a semiconductor device |
Jul. 22, 2008 |
| 7402484 |
Methods for forming a field effect transistor |
Jul. 22, 2008 |
| 7390719 |
Method of manufacturing a semiconductor device having a dual gate structure |
Jun. 24, 2008 |
| 7390711 |
MOS transistor and manufacturing method thereof |
Jun. 24, 2008 |
| 7384839 |
SRAM cell with asymmetrical transistors for reduced leakage |
Jun. 10, 2008 |
| 7378308 |
CMOS devices with improved gap-filling |
May. 27, 2008 |
| 7378305 |
Semiconductor integrated circuit and fabrication process thereof |
May. 27, 2008 |
| 7358168 |
Ion implantation method for forming a shallow junction |
Apr. 15, 2008 |
| 7351627 |
Method of manufacturing semiconductor device using gate-through ion implantation |
Apr. 1, 2008 |
| 7329571 |
Technique for providing multiple stress sources in NMOS and PMOS transistors |
Feb. 12, 2008 |
| 7326609 |
Semiconductor device and fabrication method |
Feb. 5, 2008 |
| 7326610 |
Process options of forming silicided metal gates for advanced CMOS devices |
Feb. 5, 2008 |
| 7314794 |
Low-cost high-performance planar back-gate CMOS |
Jan. 1, 2008 |
| 7314805 |
Method for fabricating semiconductor device |
Jan. 1, 2008 |
| 7312113 |
Method of forming source/drain region of semiconductor device |
Dec. 25, 2007 |
| 7309901 |
Field effect transistors (FETs) with multiple and/or staircase silicide |
Dec. 18, 2007 |
| 7282403 |
Temperature stable metal nitride gate electrode |
Oct. 16, 2007 |
| 7276407 |
Method for fabricating semiconductor device |
Oct. 2, 2007 |
| 7268028 |
Well isolation trenches (WIT) for CMOS devices |
Sep. 11, 2007 |
| 7265012 |
Formation of standard voltage threshold and low voltage threshold MOSFET devices |
Sep. 4, 2007 |
| 7265011 |
Method of manufacturing a transistor |
Sep. 4, 2007 |
| 7259056 |
Method for manufacturing semiconductor device |
Aug. 21, 2007 |
| 7259053 |
Methods for forming a device isolation structure in a semiconductor device |
Aug. 21, 2007 |
| 7256084 |
Composite stress spacer |
Aug. 14, 2007 |
| 7253049 |
Method for fabricating dual work function metal gates |
Aug. 7, 2007 |
| 7250332 |
Method for fabricating a semiconductor device having improved hot carrier immunity ability |
Jul. 31, 2007 |
| 7229870 |
Methods of fabricating semiconductor devices |
Jun. 12, 2007 |
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