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Class Information
Number: 438/230
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Self-aligned > Utilizing gate sidewall structure
Description: Process with a step of utilizing a structure located on the sidewall of the gate electrode as the previously formed device feature.










Sub-classes under this class:

Class Number Class Name Patents
438/231 Plural doping steps 692


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8710569 Semiconductor device and manufacturing method thereof Apr. 29, 2014
8703556 Method of making a FinFET device Apr. 22, 2014
8703569 MOS transistor, manufacturing method thereof, and semiconductor device Apr. 22, 2014
8703594 Semiconductor device having a treated gate structure and fabrication method thereof Apr. 22, 2014
8704229 Partial poly amorphization for channeling prevention Apr. 22, 2014
8658491 Manufacturing method of transistor structure having a recessed channel Feb. 25, 2014
8652917 Superior stability of characteristics of transistors having an early formed high-K metal gate Feb. 18, 2014
8648394 Method for growing conformal EPI layers and structure thereof Feb. 11, 2014
8642435 Performing treatment on stressors Feb. 4, 2014
8642441 Self-aligned STI with single poly for manufacturing a flash memory device Feb. 4, 2014
8617946 Integrated circuits including metal gates and fabrication methods thereof Dec. 31, 2013
8614123 Method of forming a semiconductor device by using sacrificial gate electrodes and sacrificial self-aligned contact structures Dec. 24, 2013
8609497 Method of dual EPI process for semiconductor device Dec. 17, 2013
8609498 Transistor with embedded Si/Ge material having reduced offset and superior uniformity Dec. 17, 2013
8586440 Methods for fabricating integrated circuits using non-oxidizing resist removal Nov. 19, 2013
8574978 Method for forming semiconductor device Nov. 5, 2013
8546204 Method for growing conformal epi layers and structure thereof Oct. 1, 2013
8546873 Integrated circuit and method of fabrication thereof Oct. 1, 2013
8541296 Method of manufacturing dummy gates in gate last process Sep. 24, 2013
8541272 Method of manufacturing semiconductor device with offset sidewall structure Sep. 24, 2013
8513075 Method for manufacturing a semiconductor device Aug. 20, 2013
8507351 Dopant profile tuning for MOS devices by adapting a spacer width prior to implantation Aug. 13, 2013
8501571 Method of manufacturing semiconductor device having silicon carbide layers containing phosphorus Aug. 6, 2013
8502325 Metal high-K transistor having silicon sidewalls for reduced parasitic capacitance Aug. 6, 2013
8492830 Multiple channel fin-FET and its manufacturing method Jul. 23, 2013
8492236 Step-like spacer profile Jul. 23, 2013
8486778 Low resistance source and drain extensions for ETSOI Jul. 16, 2013
8470661 High-K gate electrode structure formed after transistor fabrication by using a spacer Jun. 25, 2013
8470662 Semiconductor device and method of manufacturing the same Jun. 25, 2013
8470664 Methods of fabricating a dual polysilicon gate and methods of fabricating a semiconductor device using the same Jun. 25, 2013
8466520 Transistor with an embedded strain-inducing material having a gradually shaped configuration Jun. 18, 2013
8450169 Replacement metal gate structures providing independent control on work function and gate leakage current May. 28, 2013
8445345 CMOS structure having multiple threshold voltage devices May. 21, 2013
8441070 Semiconductor device and method of manufacturing semiconductor device May. 14, 2013
8426266 Stress memorization with reduced fringing capacitance based on silicon nitride in MOS semiconductor devices Apr. 23, 2013
8420470 Method of fabricating a semiconductor device using compressive material with a replacement gate technique Apr. 16, 2013
8415213 Method of manufacturing semiconductor device with offset sidewall structure Apr. 9, 2013
8410568 Integrated photodiode for semiconductor substrates Apr. 2, 2013
8409975 Method for decreasing polysilicon gate resistance in a carbon co-implantation process Apr. 2, 2013
8389392 FinFET with separate gates and method for fabricating a finFET with separate gates Mar. 5, 2013
8383500 Semiconductor device formed by a replacement gate approach based on an early work function metal Feb. 26, 2013
8361869 Method for manufacturing suspended fin and gate-all-around field effect transistor Jan. 29, 2013
8357573 Strain enhancement in transistors comprising an embedded strain-inducing semiconductor alloy by creating a patterning non-uniformity at the bottom of the gate electrode Jan. 22, 2013
8357576 Method of manufacturing semiconductor device Jan. 22, 2013
8338831 Semiconductor device and manufacturing method thereof Dec. 25, 2012
8329526 Cap removal in a high-k metal gate electrode structure by using a sacrificial fill material Dec. 11, 2012
8324689 Self aligned field effect transistor structure Dec. 4, 2012
8318570 Enhancing MOSFET performance by optimizing stress properties Nov. 27, 2012
8309411 Semiconductor device and method of fabricating the same Nov. 13, 2012
8288219 Method of forming a non-volatile memory cell using off-set spacers Oct. 16, 2012

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