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Class Information
Number: 438/229
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Self-aligned
Description: Process for making complementary insulated gate field effect transistors wherein a previously formed device feature is utilized to make device regions in the desired registration to the previously formed feature.










Sub-classes under this class:

Class Number Class Name Patents
438/232 Plural doping steps 394
438/230 Utilizing gate sidewall structure 415


Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8704229 Partial poly amorphization for channeling prevention Apr. 22, 2014
8691644 Method of forming a CMOS device with a stressed-channel NMOS transistor and a strained-channel PMOS transistor Apr. 8, 2014
8673713 Method for forming a transistor with recessed drain and source areas and non-conformal metal silicide regions Mar. 18, 2014
8674452 Semiconductor device with lower metal layer thickness in PMOS region Mar. 18, 2014
8669155 Hybrid channel semiconductor device and method for forming the same Mar. 11, 2014
8664060 Semiconductor structure and method of fabricating the same Mar. 4, 2014
8664068 Low-diffusion drain and source regions in CMOS transistors for low power/high performance applications Mar. 4, 2014
8664054 Method for forming semiconductor structure Mar. 4, 2014
8642418 Method of manufacturing semiconductor device with offset sidewall structure Feb. 4, 2014
8642420 Fabrication of a semiconductor device with extended epitaxial semiconductor regions Feb. 4, 2014
8614123 Method of forming a semiconductor device by using sacrificial gate electrodes and sacrificial self-aligned contact structures Dec. 24, 2013
8580635 Method of replacing silicon with metal in integrated circuit chip fabrication Nov. 12, 2013
8541272 Method of manufacturing semiconductor device with offset sidewall structure Sep. 24, 2013
8541812 Semiconductor device and method of manufacture thereof Sep. 24, 2013
8530303 Method of fabricating semiconductor device Sep. 10, 2013
8481382 Method and apparatus for manufacturing semiconductor device Jul. 9, 2013
8481412 Method of and apparatus for active energy assist baking Jul. 9, 2013
8476675 Semiconductor device and method of manufacture thereof Jul. 2, 2013
8470664 Methods of fabricating a dual polysilicon gate and methods of fabricating a semiconductor device using the same Jun. 25, 2013
8420490 High-performance semiconductor device and method of manufacturing the same Apr. 16, 2013
8415213 Method of manufacturing semiconductor device with offset sidewall structure Apr. 9, 2013
8409947 Method of manufacturing semiconductor device having stress creating layer Apr. 2, 2013
8404539 Self-aligned contacts in carbon devices Mar. 26, 2013
8404538 Device with self aligned stressor and method of making same Mar. 26, 2013
8377777 Semiconductor device and method of fabricating the same Feb. 19, 2013
8368128 Compact field effect transistor with counter-electrode and fabrication method Feb. 5, 2013
8357978 Methods of forming semiconductor devices with replacement gate structures Jan. 22, 2013
8334177 Methods for forming isolated fin structures on bulk semiconductor material Dec. 18, 2012
8329526 Cap removal in a high-k metal gate electrode structure by using a sacrificial fill material Dec. 11, 2012
8309411 Semiconductor device and method of fabricating the same Nov. 13, 2012
8283230 Fabrication method of self-aligned trenched power semiconductor structure Oct. 9, 2012
8273642 Method of fabricating an NMOS transistor Sep. 25, 2012
8247279 Method of fabricating semiconductor device using epitaxial growth inhibiting layers Aug. 21, 2012
8236637 Planar silicide semiconductor structure Aug. 7, 2012
8232151 Structure and method for manufacturing asymmetric devices Jul. 31, 2012
8222122 Method of forming nonvolatile memory device Jul. 17, 2012
8207030 Method for producing nMOS and pMOS devices in CMOS processing Jun. 26, 2012
8173504 Method of fabricating gate electrode using a treated hard mask May. 8, 2012
8143119 Method of manufacturing semiconductor device having plural transistors formed in well region and semiconductor device Mar. 27, 2012
8143670 Self aligned field effect transistor structure Mar. 27, 2012
8138055 Semiconductor devices having pFET with SiGe gate electrode and embedded SiGe source/drain regions and methods of making the same Mar. 20, 2012
8134152 CMOS thin film transistor, method of fabricating the same and organic light emitting display device having laminated PMOS poly-silicon thin film transistor with a top gate configuration and a Mar. 13, 2012
8129235 Method of fabricating two-step self-aligned contact Mar. 6, 2012
8129236 Method for creating tensile strain by applying stress memorization techniques at close proximity to the gate electrode Mar. 6, 2012
8124472 Manufacturing method of a semiconductor device Feb. 28, 2012
8114729 Differential poly doping and circuits therefrom Feb. 14, 2012
8076194 Method of fabricating metal oxide semiconductor transistor Dec. 13, 2011
8062966 Method for integration of replacement gate in CMOS flow Nov. 22, 2011
8018004 Semiconductor device and manufacturing method thereof Sep. 13, 2011
8013398 Semiconductor device Sep. 6, 2011

1 2 3 4 5 6










 
 
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