| |
 |
|
Class Information
Number: 438/228
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Including isolation structure > Recessed oxide formed by localized oxidation (i.e., locos) > Having well structure of opposite conductivity type > Plural wells
Description: Process for making complementary insulated gate field effect transistors wherein plural wells of the same or opposite conductivity type are formed in the semiconductive substrate, each well utilized for formation therein of an insulated gate field effect transistor.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7605034 |
Integrated circuit memory cells and methods of forming |
Oct. 20, 2009 |
| 7588978 |
Method for forming semiconductor device |
Sep. 15, 2009 |
| 7582522 |
Method and device for CMOS image sensing with separate source formation |
Sep. 1, 2009 |
| 7521312 |
Method and system for creating self-aligned twin wells with co-planar surfaces in a semiconductor device |
Apr. 21, 2009 |
| 7507596 |
Method of fabricating a high quantum efficiency photodiode |
Mar. 24, 2009 |
| 7445983 |
Method of manufacturing a semiconductor integrated circuit device |
Nov. 4, 2008 |
| 7445982 |
Method of manufacturing a semiconductor integrated circuit device |
Nov. 4, 2008 |
| 7445979 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Nov. 4, 2008 |
| 7410855 |
Semiconductor device |
Aug. 12, 2008 |
| 7371630 |
Patterned backside stress engineering for transistor performance optimization |
May. 13, 2008 |
| 7368354 |
Planar substrate devices integrated with FinFETs and method of manufacture |
May. 6, 2008 |
| 7364972 |
Semiconductor device |
Apr. 29, 2008 |
| 7335546 |
Method and device for CMOS image sensing with separate source formation |
Feb. 26, 2008 |
| 7329583 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Feb. 12, 2008 |
| 7323367 |
Diagonal deep well region for routing body-bias voltage for MOSFETS in surface well regions |
Jan. 29, 2008 |
| 7309636 |
High-voltage metal-oxide-semiconductor device and method of manufacturing the same |
Dec. 18, 2007 |
| 7288451 |
Method and structure for forming self-aligned, dual stress liner for CMOS devices |
Oct. 30, 2007 |
| 7279378 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Oct. 9, 2007 |
| 7279399 |
Method of forming isolated pocket in a semiconductor substrate |
Oct. 9, 2007 |
| 7273776 |
Methods of forming a P-well in an integrated circuit device |
Sep. 25, 2007 |
| 7247534 |
Silicon device on Si:C-OI and SGOI and method of manufacture |
Jul. 24, 2007 |
| 7226832 |
Complementary metal oxide semiconductor transistor technology using selective epitaxy of a strained silicon germanium layer |
Jun. 5, 2007 |
| 7226834 |
PMD liner nitride films and fabrication methods for improved NMOS performance |
Jun. 5, 2007 |
| 7211481 |
Method to strain NMOS devices while mitigating dopant diffusion for PMOS using a capped poly layer |
May. 1, 2007 |
| 7144796 |
Method of fabricating semiconductor components through implantation and diffusion in a semiconductor substrate |
Dec. 5, 2006 |
| 7145187 |
Substrate independent multiple input bi-directional ESD protection structure |
Dec. 5, 2006 |
| 7138311 |
Semiconductor integrated circuit device and manufacture method therefore |
Nov. 21, 2006 |
| 7132323 |
CMOS well structure and method of forming the same |
Nov. 7, 2006 |
| 7112480 |
Method and structure for a low voltage CMOS integrated circuit incorporating higher-voltage devices |
Sep. 26, 2006 |
| 7049699 |
Low RC structures for routing body-bias voltage |
May. 23, 2006 |
| 7022566 |
Integrated radio frequency circuits |
Apr. 4, 2006 |
| 7008836 |
Method to provide a triple well in an epitaxially based CMOS or BiCMOS process |
Mar. 7, 2006 |
| 7005354 |
Depletion drain-extended MOS transistors and methods for making the same |
Feb. 28, 2006 |
| 7005340 |
Method for manufacturing semiconductor device |
Feb. 28, 2006 |
| 6995055 |
Structure of a semiconductor integrated circuit and method of manufacturing the same |
Feb. 7, 2006 |
| 6974742 |
Method for fabricating complementary metal oxide semiconductor image sensor |
Dec. 13, 2005 |
| 6927116 |
Semiconductor device having a double-well structure and method for manufacturing the same |
Aug. 9, 2005 |
| 6911694 |
Semiconductor device and method for fabricating such device |
Jun. 28, 2005 |
| 6908859 |
Low leakage power transistor and method of forming |
Jun. 21, 2005 |
| 6900081 |
Method of manufacturing semiconductor integrated circuit device |
May. 31, 2005 |
| 6900091 |
Isolated complementary MOS devices in epi-less substrate |
May. 31, 2005 |
| 6881634 |
Buried-channel transistor with reduced leakage current |
Apr. 19, 2005 |
| 6875663 |
Semiconductor device having a trench isolation and method of fabricating the same |
Apr. 5, 2005 |
| 6875650 |
Eliminating substrate noise by an electrically isolated high-voltage I/O transistor |
Apr. 5, 2005 |
| 6853037 |
Fabrication of low power CMOS device with high reliability |
Feb. 8, 2005 |
| 6841430 |
Semiconductor and fabrication method thereof |
Jan. 11, 2005 |
| 6838328 |
Back-biased MOS device fabrication method |
Jan. 4, 2005 |
| 6806133 |
Method for fabricating semiconductor device with triple well structure |
Oct. 19, 2004 |
| 6806160 |
Method for forming a lateral SCR device for on-chip ESD protection in shallow-trench-isolation CMOS process |
Oct. 19, 2004 |
| 6787410 |
Semiconductor device having dynamic threshold transistors and element isolation region and fabrication method thereof |
Sep. 7, 2004 |
|
|
|
