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Class Information
Number: 438/221
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Including isolation structure > Dielectric isolation formed by grooving and refilling with dielectric material
Description: Process for making complementary insulated gate field effect transistors wherein lateral isolation means is provided by forming a recess into the semiconductor substrate and refilling the recess at least in part with electrically insulative material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618866 |
Structure and method to form multilayer embedded stressors |
Nov. 17, 2009 |
| 7611937 |
High performance transistors with hybrid crystal orientations |
Nov. 3, 2009 |
| 7608518 |
Semiconductor device and method for fabricating the same |
Oct. 27, 2009 |
| 7601583 |
Transistor structure of memory device and method for fabricating the same |
Oct. 13, 2009 |
| 7601576 |
Method for fabricating semiconductor device |
Oct. 13, 2009 |
| 7598142 |
CMOS device with dual-epi channels and self-aligned contacts |
Oct. 6, 2009 |
| 7579664 |
Semiconductor device with trench type device isolation layer and method for fabricating the same |
Aug. 25, 2009 |
| 7560781 |
Semiconductor device and fabrication method thereof |
Jul. 14, 2009 |
| 7560357 |
Method for creating narrow trenches in dielectric materials |
Jul. 14, 2009 |
| 7556999 |
Method for fabricating non-volatile memory |
Jul. 7, 2009 |
| 7553741 |
Manufacturing method of semiconductor device |
Jun. 30, 2009 |
| 7553767 |
Method for fabricating semiconductor device having taper type trench |
Jun. 30, 2009 |
| 7550338 |
Method and structure for forming strained SI for CMOS devices |
Jun. 23, 2009 |
| 7550343 |
Forming a semiconductor structure in manufacturing a semiconductor device using one or more epitaxial growth processes |
Jun. 23, 2009 |
| 7544560 |
Image sensor and fabrication method thereof |
Jun. 9, 2009 |
| 7541259 |
Semiconductor device having a compressed device isolation structure |
Jun. 2, 2009 |
| 7534676 |
Method of forming enhanced device via transverse stress |
May. 19, 2009 |
| 7528031 |
Semiconductor device and method for manufacturing the same |
May. 5, 2009 |
| 7528045 |
MOS transistor and manufacturing methods thereof |
May. 5, 2009 |
| 7514715 |
Angled implant for trench isolation |
Apr. 7, 2009 |
| 7514336 |
Robust shallow trench isolation structures and a method for forming shallow trench isolation structures |
Apr. 7, 2009 |
| 7514339 |
Method for fabricating shallow trench isolation structures using diblock copolymer patterning |
Apr. 7, 2009 |
| 7510927 |
LOCOS isolation for fully-depleted SOI devices |
Mar. 31, 2009 |
| 7510926 |
Technique for providing stress sources in MOS transistors in close proximity to a channel region |
Mar. 31, 2009 |
| 7507635 |
CMOS image sensor and method of fabricating the same |
Mar. 24, 2009 |
| 7507647 |
Method of manufacturing a high voltage semiconductor device including a deep well and a gate oxide layer simultaneously |
Mar. 24, 2009 |
| 7508053 |
Semiconductor MOS transistor device and method for making the same |
Mar. 24, 2009 |
| 7501686 |
Semiconductor device and method for manufacturing the same |
Mar. 10, 2009 |
| 7465623 |
Methods for fabricating a semiconductor device on an SOI substrate |
Dec. 16, 2008 |
| 7449378 |
Structure and method for improved stress and yield in pFETS with embedded SiGe source/drain regions |
Nov. 11, 2008 |
| 7439131 |
Flash memory device having resistivity measurement pattern and method of forming the same |
Oct. 21, 2008 |
| 7432148 |
Shallow trench isolation by atomic-level silicon reconstruction |
Oct. 7, 2008 |
| 7432149 |
CMOS on SOI substrates with hybrid crystal orientations |
Oct. 7, 2008 |
| 7422960 |
Method of forming gate arrays on a partial SOI substrate |
Sep. 9, 2008 |
| 7419866 |
Process of forming an electronic device including a semiconductor island over an insulating layer |
Sep. 2, 2008 |
| 7410858 |
Isolation structure configurations for modifying stresses in semiconductor devices |
Aug. 12, 2008 |
| 7402494 |
Method for fabricating high voltage semiconductor device |
Jul. 22, 2008 |
| 7402473 |
Semiconductor device and process for producing the same |
Jul. 22, 2008 |
| 7396737 |
Method of forming shallow trench isolation |
Jul. 8, 2008 |
| 7390710 |
Protection of tunnel dielectric using epitaxial silicon |
Jun. 24, 2008 |
| 7384854 |
Method of forming low capacitance ESD robust diodes |
Jun. 10, 2008 |
| 7384837 |
Method for isolating silicon germanium dislocation regions in strained-silicon CMOS applications |
Jun. 10, 2008 |
| 7368353 |
Trench power MOSFET with reduced gate resistance |
May. 6, 2008 |
| 7364975 |
Semiconductor device fabrication methods |
Apr. 29, 2008 |
| 7365011 |
Catalytic nucleation monolayer for metal seed layers |
Apr. 29, 2008 |
| 7354812 |
Multiple-depth STI trenches in integrated circuit fabrication |
Apr. 8, 2008 |
| 7342284 |
Semiconductor MOS transistor device and method for making the same |
Mar. 11, 2008 |
| 7338850 |
Method for manufacturing device isolation film of semiconductor device |
Mar. 4, 2008 |
| 7321141 |
Image sensor device and manufacturing method thereof |
Jan. 22, 2008 |
| 7303962 |
Fabricating method of CMOS and MOS device |
Dec. 4, 2007 |
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