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Class Information
Number: 438/216
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Gate insulator structure constructed of diverse dielectrics (e.g., mnos, etc.) or of nonsilicon compound
Description: Process for making complementary insulated gate field effect transistors wherein the gate dielectric insulator of at least one of the transistors is constructed of plural diverse dielectrics (e.g., nitride and oxide layers, etc.) or of a nonsilicon containing dielectric compound.

Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14

Patent Number Title Of Patent Date Issued
8202776 Method for protecting a gate structure during contact formation Jun. 19, 2012
8203177 Flash memory device with an array of gate columns penetrating through a cell stack Jun. 19, 2012
8198151 Method for fabricating a metal gate structure Jun. 12, 2012
8193577 Nonvolatile semiconductor memory device Jun. 5, 2012
8193054 Ultrahigh density vertical NAND memory device and method of making thereof Jun. 5, 2012
8193053 Integrated semiconductor nonvolatile storage device Jun. 5, 2012
8193048 Semiconductor device and method of manufacturing a semiconductor device Jun. 5, 2012
8187936 Ultrahigh density vertical NAND memory device and method of making thereof May. 29, 2012
8187961 Threshold adjustment for high-K gate dielectric CMOS May. 29, 2012
8188447 Field-by-field laser annealing and feed forward process control May. 29, 2012
8178401 Method for fabricating dual-metal gate device May. 15, 2012
8178412 Semiconductor memory device and method of manufacturing the same May. 15, 2012
8174049 Semiconductor device and method of fabricating the same May. 8, 2012
8163611 Semiconductor device fabrication method and semiconductor device Apr. 24, 2012
8158474 Semiconductor device with localized stressor Apr. 17, 2012
8158527 Semiconductor device fabrication method using multiple resist patterns Apr. 17, 2012
8153514 Method of forming metal/high-.kappa. gate stacks with high mobility Apr. 10, 2012
8143661 Memory cell system with charge trap Mar. 27, 2012
8138041 In-situ silicon cap for metal gate electrode Mar. 20, 2012
8134201 Semiconductor memory device provided with stacked layer gate including charge accumulation layer and control gate, and manufacturing method thereof Mar. 13, 2012
8129792 Semiconductor device and method for manufacturing the same Mar. 6, 2012
8124470 Strained thin body semiconductor-on-insulator substrate and device Feb. 28, 2012
8120144 Method for forming dual high-K metal gate using photoresist mask and structures thereof Feb. 21, 2012
8119511 Non-volatile memory device with improved immunity to erase saturation and method for manufacturing same Feb. 21, 2012
8114726 AlGaN/GaN HEMT with normally-off threshold minimized and method of manufacturing the same Feb. 14, 2012
8110490 Gate oxide leakage reduction Feb. 7, 2012
8105892 Thermal dual gate oxide device integration Jan. 31, 2012
8101478 TFT MONOS or SONOS memory cell structures Jan. 24, 2012
8101485 Replacement gates to enhance transistor strain Jan. 24, 2012
8093666 Lanthanide yttrium aluminum oxide dielectric films Jan. 10, 2012
8093129 Methods of forming memory cells Jan. 10, 2012
8088683 Sequential deposition and anneal of a dielectic layer in a charge trapping memory device Jan. 3, 2012
8084808 Zirconium silicon oxide films Dec. 27, 2011
8076193 CMOS device fabrication method with PMOS interface insulating film formed concurrently with sidewall insulating film Dec. 13, 2011
8058122 Formation of metal gate electrode using rare earth alloy incorporated into mid gap metal Nov. 15, 2011
8048746 Method of making flash memory cells and peripheral circuits having STI, and flash memory devices and computer systems having the same Nov. 1, 2011
8044452 Semiconductor device and method for manufacturing the same Oct. 25, 2011
8030709 Metal gate stack and semiconductor gate stack for CMOS devices Oct. 4, 2011
8026565 Thin film semiconductor device comprising nanocrystalline silicon powder Sep. 27, 2011
8021942 Method of forming CMOS device having gate insulation layers of different type and thickness Sep. 20, 2011
8021990 Gate structure and method Sep. 20, 2011
8017993 Nonvolatile semiconductor memory device and method for manufacturing same Sep. 13, 2011
8017470 Method of forming a structure over a semiconductor substrate Sep. 13, 2011
8017469 Dual high-k oxides with sige channel Sep. 13, 2011
8012822 Process for forming dielectric films Sep. 6, 2011
8013339 Thin film transistors and arrays with controllable threshold voltages and off state leakage current Sep. 6, 2011
8008115 Thin film transistor and method for producing the same Aug. 30, 2011
8008144 Dual work function recessed access device and methods of forming Aug. 30, 2011
8008147 Semiconductor device and method for manufacturing the same Aug. 30, 2011
8003548 Atomic layer deposition Aug. 23, 2011

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