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Class Information
Number: 438/216
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos) > Gate insulator structure constructed of diverse dielectrics (e.g., mnos, etc.) or of nonsilicon compound
Description: Process for making complementary insulated gate field effect transistors wherein the gate dielectric insulator of at least one of the transistors is constructed of plural diverse dielectrics (e.g., nitride and oxide layers, etc.) or of a nonsilicon containing dielectric compound.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8710583 Dual work function recessed access device and methods of forming Apr. 29, 2014
8709902 Sacrificial spacer approach for differential source/drain implantation spacers in transistors comprising a high-k metal gate electrode structure Apr. 29, 2014
8691643 Methods of forming semiconductor devices Apr. 8, 2014
8691645 Method of manufacturing convex shaped thin-film transistor device Apr. 8, 2014
8685815 Hafnium tantalum titanium oxide films Apr. 1, 2014
8685814 Transistor device and method of manufacture thereof Apr. 1, 2014
8673711 Methods of fabricating a semiconductor device having a high-K gate dielectric layer and semiconductor devices fabricated thereby Mar. 18, 2014
8669617 Multi-gate transistors Mar. 11, 2014
8669154 Transistor device and method of manufacture thereof Mar. 11, 2014
8664103 Metal gate stack formation for replacement gate technology Mar. 4, 2014
8659071 Method and structure to improve the erasing speed operation of SONOS memory device having a graded silicon nitride layer Feb. 25, 2014
8658501 Method and apparatus for flatband voltage tuning of high-k field effect transistors Feb. 25, 2014
8658490 Passivating point defects in high-K gate dielectric layers during gate stack formation Feb. 25, 2014
8652908 Semiconductor devices employing high-K dielectric layers as a gate insulating layer and methods of fabricating the same Feb. 18, 2014
8642374 Image sensor with reduced noise by blocking nitridation using photoresist Feb. 4, 2014
8624326 FinFET device and method of manufacturing same Jan. 7, 2014
8617991 Method of manufacturing semiconductor device Dec. 31, 2013
8609524 Method for making semiconductor device comprising replacement gate electrode structures with an enhanced diffusion barrier Dec. 17, 2013
8597995 Metal gate device with low temperature oxygen scavenging Dec. 3, 2013
8592902 Semiconductor structure that reduces the effects of gate cross diffusion and method of forming the structure Nov. 26, 2013
8592269 Method of manufacturing gate structure and method of manufacturing semiconductor device including the same Nov. 26, 2013
8586440 Methods for fabricating integrated circuits using non-oxidizing resist removal Nov. 19, 2013
8581321 Nonvolatile memory device and method of forming the same Nov. 12, 2013
8580639 Method of making ultrahigh density vertical NAND memory device Nov. 12, 2013
8580629 Method of fabricating semiconductor device using a work function control film Nov. 12, 2013
8580628 Integrated circuit contact structure and method Nov. 12, 2013
8575012 Semiconductor device production method and semiconductor device Nov. 5, 2013
8563411 Semiconductor devices having a diffusion barrier layer and methods of manufacturing the same Oct. 22, 2013
8557651 Method of manufacturing a semiconductor device using an etchant Oct. 15, 2013
8552507 Semiconductor device and method of manufacturing the same Oct. 8, 2013
8551847 Method for forming metal gate Oct. 8, 2013
8546211 Replacement gate having work function at valence band edge Oct. 1, 2013
8546212 Semiconductor device and fabricating method thereof Oct. 1, 2013
8541275 Single metal gate CMOS integration by intermixing polarity specific capping layers Sep. 24, 2013
8536005 Semiconductor integrated circuit device and manufacturing method thereof Sep. 17, 2013
8530302 Method for manufacturing CMOS FET Sep. 10, 2013
8530317 Corner rounding to improve metal fill in replacement gate process Sep. 10, 2013
8525250 SONOS memory device with reduced short-channel effects Sep. 3, 2013
8524555 Susceptor with backside area of constant emissivity Sep. 3, 2013
8501568 Method of forming flash memory with ultraviolet treatment Aug. 6, 2013
8497169 Method for protecting a gate structure during contact formation Jul. 30, 2013
8492278 Method of forming a plurality of spaced features Jul. 23, 2013
8482053 Nonvolatile semiconductor memory device with high-K insulating film Jul. 9, 2013
8470659 Method for reducing interfacial layer thickness for high-k and metal gate stack Jun. 25, 2013
8461000 Method of making ultrahigh density vertical NAND memory device Jun. 11, 2013
8455345 Methods of forming gate structure and methods of manufacturing semiconductor device including the same Jun. 4, 2013
8450169 Replacement metal gate structures providing independent control on work function and gate leakage current May. 28, 2013
8445344 Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning May. 21, 2013
8445349 Method of manufacturing nonvolatile semiconductor memory device May. 21, 2013
8440521 Method of manufacturing a semiconductor device May. 14, 2013

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