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Class Information
Number: 438/199
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Complementary insulated gate field effect transistors (i.e., cmos)
Description: Process for making plural insulated gate field effect transistors of opposite conductivity type (i.e., wherein source and drain regions of a first field effect transistor are of opposite conductivity type to source and drain regions of a second field effect transistor).


Sub-classes under this class:

Class Number Class Name Patents
438/200 And additional electrical device 396
438/233 And contact formation 353
438/213 Common active region 62
438/217 Doping of semiconductor channel region beneath gate insulator (e.g., threshold voltage adjustment, etc.) 441
438/216 Gate insulator structure constructed of diverse dielectrics (e.g., mnos, etc.) or of nonsilicon compound 396
438/215 Having fuse or integral short 103
438/211 Having gate surrounded by dielectric (i.e., floating gate) 366
438/214 Having underpass or crossunder 25
438/218 Including isolation structure 224
438/229 Self-aligned 198
438/212 Vertical channel 241


Patents under this class:

Patent Number Title Of Patent Date Issued
7619262 Method and device for electrostatic discharge protection Nov. 17, 2009
7619239 Semiconductor device and method of manufacturing the same Nov. 17, 2009
7618855 Manufacturing method of semiconductor device Nov. 17, 2009
7618854 High frequency MOS transistor, method of forming the same, and method of manufacturing a semiconductor device including the same Nov. 17, 2009
7616120 Multiple RF-port modulator for RFID tag Nov. 10, 2009
7615806 Method for forming a semiconductor structure and structure thereof Nov. 10, 2009
7615435 Semiconductor device and method of manufacture Nov. 10, 2009
7615434 CMOS device and fabricating method thereof Nov. 10, 2009
7615433 Double anneal with improved reliability for dual contact etch stop liner scheme Nov. 10, 2009
7615432 HDP/PECVD methods of fabricating stress nitride structures for field effect transistors Nov. 10, 2009
7615431 Manufacturing method of semiconductor device Nov. 10, 2009
7615430 Field effect transistor and method of manufacturing a field effect transistor Nov. 10, 2009
7615427 Spacer-less low-k dielectric processes Nov. 10, 2009
7615402 Electrostatically operated tunneling transistor Nov. 10, 2009
7611951 Method of fabricating MOS transistor having epitaxial region Nov. 3, 2009
7611943 Transistors, integrated circuits, systems, and processes of manufacture with improved work function modulation Nov. 3, 2009
7611939 Semiconductor device manufactured using a laminated stress layer Nov. 3, 2009
7611938 Semiconductor device having high drive current and method of manufacture therefor Nov. 3, 2009
7611935 Gate straining in a semiconductor device Nov. 3, 2009
7611922 Image sensor and method for manufacturing the same Nov. 3, 2009
7608501 Technique for creating different mechanical strain by forming a contact etch stop layer stack having differently modified intrinsic stress Oct. 27, 2009
7608499 Semiconductor structure comprising field effect transistors with stressed channel regions and method of forming the same Oct. 27, 2009
7608476 Electronic device Oct. 27, 2009
7605447 Highly manufacturable SRAM cells in substrates with hybrid crystal orientation Oct. 20, 2009
7598542 SRAM devices and methods of fabricating the same Oct. 6, 2009
7598540 High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same Oct. 6, 2009
7598142 CMOS device with dual-epi channels and self-aligned contacts Oct. 6, 2009
7595234 Fabricating method for a metal oxide semiconductor transistor Sep. 29, 2009
7595233 Gate stress engineering for MOSFET Sep. 29, 2009
7595231 Semiconductor device and its manufacture Sep. 29, 2009
7595230 Thin film transistor, method of manufacturing same, display device, method of modifying an oxide film, method of forming an oxide film, semiconductor device, method of manufacturing semiconduc Sep. 29, 2009
7595210 Method of manufacturing complementary metal oxide semiconductor image sensor Sep. 29, 2009
7592270 Modulation of stress in stress film through ion implantation and its application in stress memorization technique Sep. 22, 2009
7592214 Method of manufacturing a semiconductor device including epitaxially growing semiconductor epitaxial layers on a surface of semiconductor substrate Sep. 22, 2009
7589386 Semiconductor device and manufacturing method thereof Sep. 15, 2009
7586160 Method of manufacturing a semiconductor integrated circuit and semiconductor integrated circuit Sep. 8, 2009
7585720 Dual stress liner device and method Sep. 8, 2009
7582521 Dual metal gates for mugfet device Sep. 1, 2009
7579660 Semiconductor device and manufacturing method thereof Aug. 25, 2009
7579229 Semiconductor device and semiconductor substrate Aug. 25, 2009
7579228 Disposable organic spacers Aug. 25, 2009
7575969 Buried layer and method Aug. 18, 2009
7575968 Inverse slope isolation and dual surface orientation integration Aug. 18, 2009
7572692 Complementary transistors having different source and drain extension spacing controlled by different spacer sizes Aug. 11, 2009
7572690 Method of fabricating CMOS thin film transistor (TFT) and CMOS TFT fabricated using the same Aug. 11, 2009
7572689 Method and structure for reducing induced mechanical stresses Aug. 11, 2009
7569455 Manufacturing method of semiconductor device Aug. 4, 2009
7569447 Method of forming transistor structure having stressed regions of opposite types Aug. 4, 2009
7569446 Semiconductor structure and method of manufacture Aug. 4, 2009
7569445 Semiconductor device with constricted current passage Aug. 4, 2009



 
 
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