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Class Information
Number: 438/184
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having schottky gate (e.g., mesfet, hemt, etc.) > Self-aligned > Doping of semiconductive region > Utilizing gate sidewall structure
Description: Process wherein a gate sidewall structure is utilized during the doping of semiconductive regions adjacent the gate structure.

Sub-classes under this class:

Class Number Class Name Patents
438/185 Multiple doping steps 58

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
6596554 Body-tied-to-source partially depleted SOI MOSFET Jul. 22, 2003
6583436 Strain-engineered, self-assembled, semiconductor quantum dot lattices Jun. 24, 2003
6576503 Laser diodes and manufacturing methods Jun. 10, 2003
6573132 Method for fabricating a semiconductor device having contacts self-aligned with a gate electrode thereof Jun. 3, 2003
6545370 Composite silicon nitride sidewall spacers for reduced nickel silicide bridging Apr. 8, 2003
6521519 MIS transistor and manufacturing method thereof Feb. 18, 2003
6521529 HDP treatment for reduced nickel silicide bridging Feb. 18, 2003
6455361 Semiconductor device and manufacturing method of the same Sep. 24, 2002
6391661 Semiconductor and method of fabricating May. 21, 2002
6380013 Method for forming semiconductor device having epitaxial channel layer using laser treatment Apr. 30, 2002
6376314 Method of semiconductor device fabrication Apr. 23, 2002
6365471 Method for producing PMOS devices Apr. 2, 2002
6346464 Manufacturing method of semiconductor device Feb. 12, 2002
6291299 Method for making MOS transistors Sep. 18, 2001
6200866 Use of silicon germanium and other alloys as the replacement gate for the fabrication of MOSFET Mar. 13, 2001
6200840 Method for producing PMOS devices Mar. 13, 2001
6174756 Spacers to block deep junction implants and silicide formation in integrated circuits Jan. 16, 2001
6140169 Method for manufacturing field effect transistor Oct. 31, 2000
6133131 Method of forming a gate spacer on a semiconductor wafer Oct. 17, 2000
6103578 Method for forming high breakdown semiconductor device Aug. 15, 2000
6096636 Methods of forming conductive lines Aug. 1, 2000
6096624 Method for forming ETOX cell using self-aligned source etching process Aug. 1, 2000
6037630 Semiconductor device with gate electrode portion and method of manufacturing the same Mar. 14, 2000
6027959 Methods for in-situ removal of an anti-reflective coating during a nitride resistor protect etching process Feb. 22, 2000
5930636 Method of fabricating high-frequency GaAs substrate-based Schottky barrier diodes Jul. 27, 1999
5895955 MOS transistor employing a removable, dual layer etch stop to protect implant regions from sidewall spacer overetch Apr. 20, 1999
5888860 Method of making field effect transistor Mar. 30, 1999
5888890 Method of manufacturing field effect transistor Mar. 30, 1999
5882961 Method of manufacturing semiconductor device with reduced charge trapping Mar. 16, 1999
5804846 Process for forming a self-aligned raised source/drain MOS device and device therefrom Sep. 8, 1998
5759880 Resistless methods of fabricating FETs Jun. 2, 1998
5688703 Method of manufacturing a gate structure for a metal semiconductor field effect transistor Nov. 18, 1997
5631186 Method for making a dynamic random access memory using silicon-on-insulator techniques May. 20, 1997
5631175 Method for fabricating an elevated-gate field effect transistor May. 20, 1997
5538910 Method of making a narrow gate electrode for a field effect transistor Jul. 23, 1996
5538910 Method of making a narrow gate electrode for a field effect transistor Jul. 23, 1996
5512518 Method of manufacture of multilayer dielectric on a III-V substrate Apr. 30, 1996
5512499 Method of making symmetrical and asymmetrical MESFETS Apr. 30, 1996
5510280 Method of making an asymmetrical MESFET having a single sidewall spacer Apr. 23, 1996
5504039 Method for making a self-aligned oxide gate cap Apr. 2, 1996
5413947 Method for manufacturing a semiconductor device with an epitaxial void May. 9, 1995
5411903 Self-aligned complementary HFETS May. 2, 1995
5344788 Method of making field effect transistor Sep. 6, 1994
5187111 Method of manufacturing Schottky barrier gate FET Feb. 16, 1993
4962054 Method for manufacturing a field effect transistor using spacers of different thicknesses Oct. 9, 1990
4892835 Method of manufacturing a field effect transistor Jan. 9, 1990
4863879 Method of manufacturing self-aligned GaAs MESFET Sep. 5, 1989
4784718 Method for manufacturing semiconductor device Nov. 15, 1988
4769339 Method of manufacturing a field effect transistor device having a multilayer gate electrode Sep. 6, 1988
4729966 Process for manufacturing a Schottky FET device using metal sidewalls as gates Mar. 8, 1988

1 2 3 4

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