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Class Information
Number: 438/184
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having schottky gate (e.g., mesfet, hemt, etc.) > Self-aligned > Doping of semiconductive region > Utilizing gate sidewall structure
Description: Process wherein a gate sidewall structure is utilized during the doping of semiconductive regions adjacent the gate structure.










Sub-classes under this class:

Class Number Class Name Patents
438/185 Multiple doping steps 58


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8685808 Semiconductor device fabrication method Apr. 1, 2014
8679908 Use of silicide block process to camouflage a false transistor Mar. 25, 2014
8673707 Method for forming metal gate Mar. 18, 2014
8609479 Gated-varactors Dec. 17, 2013
8592264 Source-drain extension formation in replacement metal gate transistor device Nov. 26, 2013
8592265 Method for manufacturing semiconductor device having a metal gate electrode Nov. 26, 2013
8525270 Structures and methods to stop contact metal from extruding into replacement gates Sep. 3, 2013
8502325 Metal high-K transistor having silicon sidewalls for reduced parasitic capacitance Aug. 6, 2013
8466016 Hafnium tantalum oxynitride dielectric Jun. 18, 2013
8445341 Semiconductor device and fabrication method for the same May. 21, 2013
8431462 Methods of manufacturing semiconductor devices Apr. 30, 2013
8273616 Gated-varactors Sep. 25, 2012
8268680 Transistor of semiconductor device and method of fabricating the same Sep. 18, 2012
8236632 FET structures with trench implantation to improve back channel leakage and body resistance Aug. 7, 2012
8216907 Process to fabricate a metal high-K transistor having first and second silicon sidewalls for reduced parasitic capacitance Jul. 10, 2012
8202782 Method of manufacturing transistor Jun. 19, 2012
8154088 Semiconductor topography and method for reducing gate induced drain leakage (GIDL) in MOS transistors Apr. 10, 2012
8133776 Semiconductor device and fabrication method for the same Mar. 13, 2012
8114725 Method of manufacturing MOS device having lightly doped drain structure Feb. 14, 2012
8114729 Differential poly doping and circuits therefrom Feb. 14, 2012
8110456 Method for making a self aligning memory device Feb. 7, 2012
8093626 Normally-off field effect transistor using III-nitride semiconductor and method for manufacturing such transistor Jan. 10, 2012
8048730 Semiconductor device and method for manufacturing the same Nov. 1, 2011
8026133 Method of fabricating a semiconductor device with a non-uniform gate insulating film Sep. 27, 2011
7947589 FinFET formation with a thermal oxide spacer hard mask formed from crystalline silicon layer May. 24, 2011
7855135 Method to reduce parastic capacitance in a metal high dielectric constant (MHK) transistor Dec. 21, 2010
7843007 Metal high-k transistor having silicon sidewall for reduced parasitic capacitance Nov. 30, 2010
7754573 Method for manufacturing semiconductor device Jul. 13, 2010
7723222 Method of fabricating flash memory device May. 25, 2010
7718479 Forming integrated circuits with replacement metal gate electrodes May. 18, 2010
7687364 Low-k isolation spacers for conductive regions Mar. 30, 2010
RE41181 Manufacturing method of semiconductor device Mar. 30, 2010
7682888 Methods of forming NMOS/PMOS transistors with source/drains including strained materials Mar. 23, 2010
7638399 Semiconductor device having MOSFET with offset-spacer, and manufacturing method thereof Dec. 29, 2009
7625814 Filling deep features with conductors in semiconductor manufacturing Dec. 1, 2009
7622339 EPI T-gate structure for CoSi.sub.2 extendibility Nov. 24, 2009
7605044 Method of manufacturing semiconductor device Oct. 20, 2009
7605030 Hafnium tantalum oxynitride high-k dielectric and metal gates Oct. 20, 2009
7572693 Methods for transistor formation using selective gate implantation Aug. 11, 2009
7517745 Semiconductor device having MOSFET with offset-spacer, and manufacturing method thereof Apr. 14, 2009
7510923 Slim spacer implementation to improve drive current Mar. 31, 2009
7510922 Spacer T-gate structure for CoSi.sub.2 extendibility Mar. 31, 2009
7501317 Method of manufacturing semiconductor device Mar. 10, 2009
7485561 Filling deep features with conductors in semiconductor manufacturing Feb. 3, 2009
7446354 Power semiconductor device having improved performance and method Nov. 4, 2008
7410891 Method of manufacturing a superjunction device Aug. 12, 2008
7405116 Application of gate edge liner to maintain gate length CD in a replacement gate transistor flow Jul. 29, 2008
7399690 Methods of fabricating semiconductor devices and structures thereof Jul. 15, 2008
7381622 Method for forming embedded strained drain/source regions based on a combined spacer and cavity etch process Jun. 3, 2008
7344932 Use of silicon block process step to camouflage a false transistor Mar. 18, 2008

1 2 3 4










 
 
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