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Class Information
Number: 438/179
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having schottky gate (e.g., mesfet, hemt, etc.) > Asymmetric
Description: Process for making a Schottky gate field effect transistor wherein the pair of active regions are off-set or nonsymmetrical with respect to the centerline of the Schottky gate electrode.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8652916 Self aligned impact-ionization MOS (I-MOS) device and methods of manufacture Feb. 18, 2014
8637871 Asymmetric hetero-structure FET and method of manufacture Jan. 28, 2014
8541296 Method of manufacturing dummy gates in gate last process Sep. 24, 2013
8530291 Method for manufacturing display device Sep. 10, 2013
8524547 Fin-type field effect transistor Sep. 3, 2013
8513738 ESD field-effect transistor and integrated diffusion resistor Aug. 20, 2013
8445341 Semiconductor device and fabrication method for the same May. 21, 2013
8426279 Asymmetric transistor Apr. 23, 2013
8390000 Semiconductor devices with field plates Mar. 5, 2013
8283243 Bottom anode schottky diode structure and method Oct. 9, 2012
8211774 Method for forming semiconductor structure Jul. 3, 2012
8193053 Integrated semiconductor nonvolatile storage device Jun. 5, 2012
8138550 Method of manufacturing a semiconductor device and a semiconductor device Mar. 20, 2012
8134180 Nitride semiconductor device with a vertical channel and method for producing the nitride semiconductor device Mar. 13, 2012
8093115 Tuning of SOI substrate doping Jan. 10, 2012
8063447 Multiple-gate transistors and processes of making same Nov. 22, 2011
8043906 Method of forming a III-nitride selective current carrying device including a contact in a recess Oct. 25, 2011
8034692 Structure and method for manufacturing asymmetric devices Oct. 11, 2011
7994612 FinFETs single-sided implant formation Aug. 9, 2011
7859063 Semiconductor device using SOI-substrate Dec. 28, 2010
7785945 Method for fabricating PMOS transistor Aug. 31, 2010
7767508 Method for forming offset spacers for semiconductor device arrangements Aug. 3, 2010
7666745 Method of manufacturing a semiconductor device and a semiconductor device Feb. 23, 2010
7560324 Drain extended MOS transistors and methods for making the same Jul. 14, 2009
7507597 Method for fabricating CMOS image sensor Mar. 24, 2009
7504286 Semiconductor memory devices and methods for fabricating the same Mar. 17, 2009
7456057 Germanium on glass and glass-ceramic structures Nov. 25, 2008
7416917 Method of fabricating electroluminescent display Aug. 26, 2008
7314814 Semiconductor devices and methods of fabricating the same Jan. 1, 2008
7265399 Asymetric layout structures for transistors and methods of fabricating the same Sep. 4, 2007
7183149 Method of manufacturing field effect transistor Feb. 27, 2007
7107170 Multiport network analyzer calibration employing reciprocity of a device Sep. 12, 2006
7033897 Encapsulated spacer with low dielectric constant material to reduce the parasitic capacitance between gate and drain in CMOS technology Apr. 25, 2006
6838323 Diffusion resistor/capacitor (DRC) non-aligned MOSFET structure Jan. 4, 2005
6821853 Differential implant oxide process Nov. 23, 2004
6818488 Process for making a gate for a short channel CMOS transistor structure Nov. 16, 2004
6638801 Semiconductor device and its manufacturing method Oct. 28, 2003
6624057 Method for making an access transistor Sep. 23, 2003
6620688 Method for fabricating an extended drain metal oxide semiconductor field effect transistor with a source field plate Sep. 16, 2003
6482724 Integrated circuit asymmetric transistors Nov. 19, 2002
6458639 MOS transistor with stepped gate insulator Oct. 1, 2002
6351018 Monolithically integrated trench MOSFET and Schottky diode Feb. 26, 2002
6316298 Fabrication method for a flash memory device Nov. 13, 2001
6284579 Drain leakage reduction by indium transient enchanced diffusion (TED) for low power applications Sep. 4, 2001
6225661 MOS transistor with stepped gate insulator May. 1, 2001
6197644 High density mosfet fabrication method with integrated device scaling Mar. 6, 2001
6153477 Ultra short transistor channel length formed using a gate dielectric having a relatively high dielectric constant Nov. 28, 2000
5936277 MOS transistor with impurity-implanted region Aug. 10, 1999
5885860 Silicon carbide transistor and method Mar. 23, 1999
5773333 Method for manufacturing self-aligned T-type gate Jun. 30, 1998

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