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Class Information
Number: 438/165
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > On insulating substrate or layer (e.g., tft, etc.) > Having insulated gate > Semiconductor islands formed upon insulating substrate or layer (e.g., mesa formation, etc.) > Including differential oxidation
Description: Process in which the patterning of the semiconductive layer includes a step of oxidizing the semiconductive layer to form regions of differing oxide thickness.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622338 |
Method for manufacturing semiconductor device |
Nov. 24, 2009 |
| 7605039 |
Multiple-gate MOS transistor using Si substrate and method of manufacturing the same |
Oct. 20, 2009 |
| 7510919 |
Anchoring, by lateral oxidizing, of patterns of a thin film to prevent the dewetting phenomenon |
Mar. 31, 2009 |
| 7510927 |
LOCOS isolation for fully-depleted SOI devices |
Mar. 31, 2009 |
| 7504291 |
MOS transistor on an SOI substrate with a body contact and a gate insulating film with variable thickness |
Mar. 17, 2009 |
| 7462519 |
Semiconductor device, method of fabricating same, and, electrooptical device |
Dec. 9, 2008 |
| 7425480 |
Semiconductor device and method of manufacture thereof |
Sep. 16, 2008 |
| 7381631 |
Use of expanding material oxides for nano-fabrication |
Jun. 3, 2008 |
| 7344930 |
Semiconductor device and manufacturing method thereof |
Mar. 18, 2008 |
| 7303946 |
Method of manufacturing a semiconductor device using an oxidation process |
Dec. 4, 2007 |
| 7288447 |
Semiconductor device having trench isolation for differential stress and method therefor |
Oct. 30, 2007 |
| 7214555 |
Method for producing display device |
May. 8, 2007 |
| 7196383 |
Thin film oxide interface |
Mar. 27, 2007 |
| 7183143 |
Method for forming nitrided tunnel oxide layer |
Feb. 27, 2007 |
| 7183147 |
Light emitting device, method for manufacturing thereof and electronic appliance |
Feb. 27, 2007 |
| 7141459 |
Silicon-on-insulator ULSI devices with multiple silicon film thicknesses |
Nov. 28, 2006 |
| 7064018 |
Methods for fabricating three dimensional integrated circuits |
Jun. 20, 2006 |
| 7061029 |
High-voltage device structure |
Jun. 13, 2006 |
| 7023015 |
Thin-film semiconductor device and liquid crystal display |
Apr. 4, 2006 |
| 6955955 |
STI liner for SOI structure |
Oct. 18, 2005 |
| 6902960 |
Oxide interface and a method for fabricating oxide thin films |
Jun. 7, 2005 |
| 6867074 |
Method of fabricating a polysilicon layer |
Mar. 15, 2005 |
| 6864127 |
Semiconductor device and method of fabricating the same |
Mar. 8, 2005 |
| 6844225 |
Self-aligned mask formed utilizing differential oxidation rates of materials |
Jan. 18, 2005 |
| 6812077 |
Method for patterning narrow gate lines |
Nov. 2, 2004 |
| 6709908 |
Methods for making semiconductor devices |
Mar. 23, 2004 |
| 6667197 |
Method for differential oxidation rate reduction for n-type and p-type materials |
Dec. 23, 2003 |
| 6664146 |
Integration of fully depleted and partially depleted field effect transistors formed in SOI technology |
Dec. 16, 2003 |
| 6656778 |
Passivation structure for flash memory and method for fabricating same |
Dec. 2, 2003 |
| 6599791 |
Semiconductor integrated circuit |
Jul. 29, 2003 |
| 6551867 |
Non-volatile semiconductor memory device and method for manufacturing the same |
Apr. 22, 2003 |
| 6537927 |
Apparatus and method for heat-treating semiconductor substrate |
Mar. 25, 2003 |
| 6524883 |
Quantum dot of single electron memory device and method for fabricating thereof |
Feb. 25, 2003 |
| 6500715 |
Method of forming a CMOS structure having gate insulation films of different thicknesses |
Dec. 31, 2002 |
| 6448115 |
Semiconductor device having quasi-SOI structure and manufacturing method thereof |
Sep. 10, 2002 |
| 6406969 |
Method of manufacturing a thin film transistor array substrate |
Jun. 18, 2002 |
| 6387741 |
Manufacturing a semiconductor device with isolated circuit-element formation layers of different thicknesses |
May. 14, 2002 |
| 6372561 |
Fabrication of fully depleted field effect transistor formed in SOI technology with a single implantation step |
Apr. 16, 2002 |
| 6368986 |
Use of selective ozone TEOS oxide to create variable thickness layers and spacers |
Apr. 9, 2002 |
| 6346486 |
Transistor device and method of forming the same |
Feb. 12, 2002 |
| 6346436 |
Quantum thin line producing method and semiconductor device |
Feb. 12, 2002 |
| 6335267 |
Semiconductor substrate and method of fabricating semiconductor device |
Jan. 1, 2002 |
| 6306692 |
Coplanar type polysilicon thin film transistor and method of manufacturing the same |
Oct. 23, 2001 |
| 6303415 |
Semiconductor device and method of fabricating same |
Oct. 16, 2001 |
| 6287899 |
Thin film transistor array panels for a liquid crystal display and a method for manufacturing the same |
Sep. 11, 2001 |
| 6271065 |
Method directed to the manufacture of an SOI device |
Aug. 7, 2001 |
| 6265251 |
Method to fabricate a thick oxide MOS transistor for electrostatic discharge protection in an STI process |
Jul. 24, 2001 |
| 6150203 |
Method for manufacturing a semiconductor device |
Nov. 21, 2000 |
| 6124153 |
Method for manufacturing a polysilicon TFT with a variable thickness gate oxide |
Sep. 26, 2000 |
| 6096582 |
Method of making a semiconductor device |
Aug. 1, 2000 |
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