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Class Information
Number: 438/165
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > On insulating substrate or layer (e.g., tft, etc.) > Having insulated gate > Semiconductor islands formed upon insulating substrate or layer (e.g., mesa formation, etc.) > Including differential oxidation
Description: Process in which the patterning of the semiconductive layer includes a step of oxidizing the semiconductive layer to form regions of differing oxide thickness.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7425480 Semiconductor device and method of manufacture thereof Sep. 16, 2008
7381631 Use of expanding material oxides for nano-fabrication Jun. 3, 2008
7344930 Semiconductor device and manufacturing method thereof Mar. 18, 2008
7303946 Method of manufacturing a semiconductor device using an oxidation process Dec. 4, 2007
7288447 Semiconductor device having trench isolation for differential stress and method therefor Oct. 30, 2007
7214555 Method for producing display device May. 8, 2007
7196383 Thin film oxide interface Mar. 27, 2007
7183143 Method for forming nitrided tunnel oxide layer Feb. 27, 2007
7183147 Light emitting device, method for manufacturing thereof and electronic appliance Feb. 27, 2007
7141459 Silicon-on-insulator ULSI devices with multiple silicon film thicknesses Nov. 28, 2006
7064018 Methods for fabricating three dimensional integrated circuits Jun. 20, 2006
7061029 High-voltage device structure Jun. 13, 2006
7023015 Thin-film semiconductor device and liquid crystal display Apr. 4, 2006
6955955 STI liner for SOI structure Oct. 18, 2005
6902960 Oxide interface and a method for fabricating oxide thin films Jun. 7, 2005
6867074 Method of fabricating a polysilicon layer Mar. 15, 2005
6864127 Semiconductor device and method of fabricating the same Mar. 8, 2005
6844225 Self-aligned mask formed utilizing differential oxidation rates of materials Jan. 18, 2005
6812077 Method for patterning narrow gate lines Nov. 2, 2004
6709908 Methods for making semiconductor devices Mar. 23, 2004
6667197 Method for differential oxidation rate reduction for n-type and p-type materials Dec. 23, 2003
6664146 Integration of fully depleted and partially depleted field effect transistors formed in SOI technology Dec. 16, 2003
6656778 Passivation structure for flash memory and method for fabricating same Dec. 2, 2003
6599791 Semiconductor integrated circuit Jul. 29, 2003
6551867 Non-volatile semiconductor memory device and method for manufacturing the same Apr. 22, 2003
6537927 Apparatus and method for heat-treating semiconductor substrate Mar. 25, 2003
6524883 Quantum dot of single electron memory device and method for fabricating thereof Feb. 25, 2003
6500715 Method of forming a CMOS structure having gate insulation films of different thicknesses Dec. 31, 2002
6448115 Semiconductor device having quasi-SOI structure and manufacturing method thereof Sep. 10, 2002
6406969 Method of manufacturing a thin film transistor array substrate Jun. 18, 2002
6387741 Manufacturing a semiconductor device with isolated circuit-element formation layers of different thicknesses May. 14, 2002
6372561 Fabrication of fully depleted field effect transistor formed in SOI technology with a single implantation step Apr. 16, 2002
6368986 Use of selective ozone TEOS oxide to create variable thickness layers and spacers Apr. 9, 2002
6346486 Transistor device and method of forming the same Feb. 12, 2002
6346436 Quantum thin line producing method and semiconductor device Feb. 12, 2002
6335267 Semiconductor substrate and method of fabricating semiconductor device Jan. 1, 2002
6306692 Coplanar type polysilicon thin film transistor and method of manufacturing the same Oct. 23, 2001
6303415 Semiconductor device and method of fabricating same Oct. 16, 2001
6287899 Thin film transistor array panels for a liquid crystal display and a method for manufacturing the same Sep. 11, 2001
6271065 Method directed to the manufacture of an SOI device Aug. 7, 2001
6265251 Method to fabricate a thick oxide MOS transistor for electrostatic discharge protection in an STI process Jul. 24, 2001
6150203 Method for manufacturing a semiconductor device Nov. 21, 2000
6124153 Method for manufacturing a polysilicon TFT with a variable thickness gate oxide Sep. 26, 2000
6096583 Semiconductor device and manufacturing method thereof Aug. 1, 2000
6096582 Method of making a semiconductor device Aug. 1, 2000
6060344 Method for producing a semiconductor substrate May. 9, 2000
6034001 Method for etching of silicon carbide semiconductor using selective etching of different conductivity types Mar. 7, 2000
6033940 Anodization control for forming offset between semiconductor circuit elements Mar. 7, 2000
5985733 Semiconductor device having a T-shaped field oxide layer and a method for fabricating the same Nov. 16, 1999
5915172 Method for manufacturing LCD and TFT Jun. 22, 1999

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