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Class Information
Number: 438/142
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions
Description: Process for forming or altering a pair of device active regions (i.e., source or drain) separated by a gate structure intended to permit or block the flow of electrical current therebetween.

Sub-classes under this class:

Class Number Class Name Patents
438/144 Charge transfer device (e.g., ccd, etc.) 199
438/143 Gettering of semiconductor substrate 159
438/197 Having insulated gate (e.g., igfet, misfet, mosfet, etc.) 2,249
438/186 Having junction gate (e.g., jfet, sit, etc.) 163
438/167 Having schottky gate (e.g., mesfet, hemt, etc.) 366
438/149 On insulating substrate or layer (e.g., tft, etc.) 2,766

Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
7851790 Isolated Germanium nanowire on Silicon fin Dec. 14, 2010
7846783 Use of poly resistor implant to dope poly gates Dec. 7, 2010
7824983 Methods of providing electrical isolation in semiconductor structures Nov. 2, 2010
7808082 Structure and method for dual surface orientations for CMOS transistors Oct. 5, 2010
7803718 BiCMOS performance enhancement by mechanical uniaxial strain and methods of manufacture Sep. 28, 2010
7803668 Transistor and fabrication process Sep. 28, 2010
7795644 Integrated circuits with stress memory effect and fabrication methods thereof Sep. 14, 2010
7790549 Configurations and methods for manufacturing charge balanced devices Sep. 7, 2010
7781843 Integrating high-voltage CMOS devices with low-voltage CMOS Aug. 24, 2010
7776646 Organic field-effect transistor and method of making same based on polymerizable self-assembled monolayers Aug. 17, 2010
7776661 Nano-electromechanical circuit using co-planar transmission line Aug. 17, 2010
7772059 Method for fabricating graphene transistors on a silicon or SOI substrate Aug. 10, 2010
7772048 Forming semiconductor fins using a sacrificial fin Aug. 10, 2010
7767511 Semiconductor device manufactured using a method to improve gate doping while maintaining good gate profile Aug. 3, 2010
7767514 Methods of implanting dopant into channel regions Aug. 3, 2010
7767501 Devices using abrupt metal-insulator transition layer and method of fabricating the device Aug. 3, 2010
7767102 Systems and methods for harvesting and integrating nanowires Aug. 3, 2010
7759174 Method of manufacturing a semiconductor device Jul. 20, 2010
7750709 Method and apparatus for biasing a floating node in an integrated circuit Jul. 6, 2010
7750378 Field effect transistor and method of fabricating the same Jul. 6, 2010
7739636 Design structure incorporating semiconductor device structures that shield a bond pad from electrical noise Jun. 15, 2010
7732285 Semiconductor device having self-aligned epitaxial source and drain extensions Jun. 8, 2010
7723171 Semiconductor device and method of fabricating the same May. 25, 2010
7718475 Method for manufacturing an integrated circuit including a transistor May. 18, 2010
7718474 Semiconductor device and method of manufacturing the same May. 18, 2010
7713795 Flash memory device with single-poly structure and method for manufacturing the same May. 11, 2010
7709334 Stacked non-volatile memory device and methods for fabricating the same May. 4, 2010
7704814 Method for manufacturing MOS transistor of semiconductor device Apr. 27, 2010
7700416 Tensile strained semiconductor on insulator using elastic edge relaxation and a sacrificial stressor layer Apr. 20, 2010
7692238 Field effect transistor and its manufacturing method Apr. 6, 2010
7687324 Semiconductor device and method of fabricating the same Mar. 30, 2010
7674670 Methods of forming threshold voltage implant regions Mar. 9, 2010
7674697 MOSFET with multiple fully silicided gate and method for making the same Mar. 9, 2010
7670882 Electronic device fabrication Mar. 2, 2010
7655988 Method of manufacturing multi-channel transistor device and multi-channel transistor device manufactured using the method Feb. 2, 2010
7648860 Self-aligned thin-film transistor and method of forming same Jan. 19, 2010
7642142 Method for manufacturing a flash memory device with cavities in upper portions of conductors Jan. 5, 2010
7633117 Capacitorless DRAM with cylindrical auxiliary gate and fabrication method thereof Dec. 15, 2009
7618851 Method for the production of a semiconductor component having a metallic gate electrode disposed in a double-recess structure Nov. 17, 2009
7618901 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 Nov. 17, 2009
7615454 Embedded stressed nitride liners for CMOS performance improvement Nov. 10, 2009
7615418 High performance stress-enhance MOSFET and method of manufacture Nov. 10, 2009
7608489 High performance stress-enhance MOSFET and method of manufacture Oct. 27, 2009
7605036 Method of forming floating gate array of flash memory device Oct. 20, 2009
7605447 Highly manufacturable SRAM cells in substrates with hybrid crystal orientation Oct. 20, 2009
7598544 Hybrid carbon nanotude FET(CNFET)-FET static RAM (SRAM) and method of making same Oct. 6, 2009
7585706 Method of fabricating a semiconductor device Sep. 8, 2009
7585773 Non-conformal stress liner for enhanced MOSFET performance Sep. 8, 2009
7582162 Semiconductor device and semiconductor device production system Sep. 1, 2009
7572693 Methods for transistor formation using selective gate implantation Aug. 11, 2009

1 2 3 4 5 6 7 8 9 10

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