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Class Information
Number: 430/921
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Initiator containing > Sulfur compound containing
Description: Art collection involving a free radical initiator containing a compound having sulfur.










Sub-classes under this class:

Class Number Class Name Patents
430/922 Sulfur in heterocyclic ring 208


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
8709700 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Apr. 29, 2014
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8703383 Photosensitive copolymer and photoresist composition Apr. 22, 2014
8703387 Resist composition, method of forming resist pattern, novel compound, and acid generator Apr. 22, 2014
8691490 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process Apr. 8, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685616 Photoacid generators and lithographic resists comprising the same Apr. 1, 2014
8663899 Resist composition and method for producing resist pattern Mar. 4, 2014
8663900 Resist composition and method for producing resist pattern Mar. 4, 2014
8663901 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Mar. 4, 2014
8652753 Resist composition and method for producing resist pattern Feb. 18, 2014
8652754 Resist composition and method for producing resist pattern Feb. 18, 2014
8642253 Resist composition for negative tone development and pattern forming method using the same Feb. 4, 2014
8632945 Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition Jan. 21, 2014
8632939 Polymer, chemically amplified positive resist composition and pattern forming process Jan. 21, 2014
8628910 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Jan. 14, 2014
8628909 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Jan. 14, 2014
8628908 Chemically amplified resist composition and patterning process Jan. 14, 2014
8623584 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Jan. 7, 2014
8617785 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Dec. 31, 2013
8617786 Poly-oxycarbosilane compositions for use in imprint lithography Dec. 31, 2013
8617791 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Dec. 31, 2013
8614046 Salt and photoresist composition containing the same Dec. 24, 2013
8614047 Photodecomposable bases and photoresist compositions Dec. 24, 2013
8609317 Salt and photoresist composition containing the same Dec. 17, 2013
8609889 Photoacid generator, resist composition, and patterning process Dec. 17, 2013
8609891 Photoacid generators and photoresists comprising same Dec. 17, 2013
8597869 Sulfonium salt, resist composition, and patterning process Dec. 3, 2013
8592128 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Nov. 26, 2013
8592132 Resist composition and method for producing resist pattern Nov. 26, 2013
8586281 Positive resist composition and method of forming resist pattern Nov. 19, 2013
8580486 Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method Nov. 12, 2013
8574817 Positive resist composition and patterning process Nov. 5, 2013
8574812 Resist composition and method for producing resist pattern Nov. 5, 2013
8557499 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition Oct. 15, 2013
8557500 Salt and photoresist composition comprising the same Oct. 15, 2013
8546059 Photoresist composition Oct. 1, 2013
8546061 Photo-curing polysiloxane composition and protective film formed from the same Oct. 1, 2013
8546060 Chemically amplified positive resist composition and pattern forming process Oct. 1, 2013
8541161 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method Sep. 24, 2013
8541157 Resist composition, method of forming resist pattern, compound and acid generator including the same Sep. 24, 2013
8530135 Photoresist composition Sep. 10, 2013
8530137 Photoresist composition Sep. 10, 2013
8524440 Photoresist composition Sep. 3, 2013
8512934 Sulphonium salt initiators Aug. 20, 2013
8507172 Positive resist composition and pattern forming method using the positive resist composition Aug. 13, 2013
8507176 Photosensitive compositions Aug. 13, 2013
8501382 Acid amplifiers Aug. 6, 2013
8501384 Positive resist composition and patterning process Aug. 6, 2013
8470513 Radiation-sensitive resin composition and polymer Jun. 25, 2013

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