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Class Information
Number: 430/913
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Initiator containing
Description: Art collection relating to subclasses 270.1+ involving a substance or composition which upon radiation initiates the polymerization of a polymerizable substance in the subclasses 270.1+ product. The initiator may cause polymerization of a substance inactive in its absence or may increase the rate of a polymerization which would otherwise occur.


Sub-classes under this class:

Class Number Class Name Patents
430/923 Carbonyl compound containing 139
430/914 Cationic or anionic 496
430/916 Free radical 250
430/925 Halogen compound containing 206
430/919 Nitrogen compound containing 277
430/915 Redox or dye sensitizer 134
430/921 Sulfur compound containing 381
430/917 With inhibitor or stabilizer 82


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7622241 Initiator compositions, negative-working imageable elements, and methods of use Nov. 24, 2009
7622243 Photosensitive element, resist pattern formation method and printed wiring board production method Nov. 24, 2009
7611819 Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same Nov. 3, 2009
7611821 Positive resist compositions and patterning process Nov. 3, 2009
7611817 Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and Nov. 3, 2009
7611818 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board Nov. 3, 2009
7611820 Positive resist composition and pattern-forming method using the same Nov. 3, 2009
7598014 Thick film photoresist composition and method of forming resist pattern Oct. 6, 2009
7595143 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same Sep. 29, 2009
7588878 Inkless printing paper and method Sep. 15, 2009
7585611 Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof Sep. 8, 2009
7585610 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same Sep. 8, 2009
7582398 Inkless reimageable printing paper and method Sep. 1, 2009
7575848 Image recording media and image layers Aug. 18, 2009
7572560 Inkless reimageable printing paper and method Aug. 11, 2009
7569324 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Aug. 4, 2009
7556910 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester Jul. 7, 2009
7556909 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Jul. 7, 2009
7553603 Inkless printing paper and method Jun. 30, 2009
7550250 Positive resist composition and pattern forming method using the same Jun. 23, 2009
7550248 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same Jun. 23, 2009
7534547 Optically active compound and photosensitive resin composition May. 19, 2009
7531287 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same May. 12, 2009
7527915 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto May. 5, 2009
7524606 Nanocomposite photoresist composition for imaging thick films Apr. 28, 2009
7521170 Photoactive compounds Apr. 21, 2009
7521169 Radiation-sensitive resin composition Apr. 21, 2009
7514198 Color forming composition containing a plurality of antenna dyes Apr. 7, 2009
7488566 Positive type radiation-sensitive resin composition Feb. 10, 2009
7485405 Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film Feb. 3, 2009
7482108 Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns Jan. 27, 2009
7442489 Photoresist composition and method of forming a photoresist pattern using the same Oct. 28, 2008
7442488 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode Oct. 28, 2008
7435529 Photosensitive composition and image recording method using the same Oct. 14, 2008
7407734 Resist composition for electron beam or EUV Aug. 5, 2008
7402376 Photosensitive resin composition and photosensitive dry film containing the same Jul. 22, 2008
7396634 Photosensitive composition Jul. 8, 2008
7381516 Multiphoton photosensitization system Jun. 3, 2008
7381517 Curable composition and image forming material containing the same Jun. 3, 2008
7371506 Positive photosensitive resin composition May. 13, 2008
7335454 Positive resist composition Feb. 26, 2008
7326517 Planographic printing plate material and preparing process of planographic printing plate Feb. 5, 2008
7326511 Sulfonate derivatives and the use thereof as latent acids Feb. 5, 2008
7326518 Photoresist compositions Feb. 5, 2008
7314699 Radiation-sensitive mixture and recording material produced therewith Jan. 1, 2008
7312013 Photoreactive composition Dec. 25, 2007
7303852 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method Dec. 4, 2007
7297460 Radiation curable ink compositions suitable for ink-jet printing Nov. 20, 2007
7267925 Photosensitive composition and novel compound used therefor Sep. 11, 2007
7252924 Positive resist composition and method of pattern formation using the same Aug. 7, 2007

1 2 3 4


 
 
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