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Browse by Category: Main > Chemistry
Class Information
Number: 430/910
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Binder containing > Polymer of unsaturated acid or ester
Description: Art collection involving a binder which is a polymer of an unsaturated acid or ester.










Patents under this class:

Patent Number Title Of Patent Date Issued
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8703383 Photosensitive copolymer and photoresist composition Apr. 22, 2014
8685620 Resist composition, method of forming resist pattern and polymeric compound Apr. 1, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685618 Resist composition and method for producing resist pattern Apr. 1, 2014
8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Mar. 25, 2014
8663900 Resist composition and method for producing resist pattern Mar. 4, 2014
8663899 Resist composition and method for producing resist pattern Mar. 4, 2014
8663897 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same Mar. 4, 2014
8658343 Resist composition, and method of forming resist pattern Feb. 25, 2014
8652754 Resist composition and method for producing resist pattern Feb. 18, 2014
8652753 Resist composition and method for producing resist pattern Feb. 18, 2014
8647808 Fluorinated monomer, polymer, resist composition, and patterning process Feb. 11, 2014
8642253 Resist composition for negative tone development and pattern forming method using the same Feb. 4, 2014
8642245 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same Feb. 4, 2014
8637220 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition Jan. 28, 2014
8632960 Method of forming resist pattern and negative tone-development resist composition Jan. 21, 2014
8632939 Polymer, chemically amplified positive resist composition and pattern forming process Jan. 21, 2014
8628911 Polymers, photoresist compositions and methods of forming photolithographic patterns Jan. 14, 2014
8628908 Chemically amplified resist composition and patterning process Jan. 14, 2014
8617785 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Dec. 31, 2013
8614283 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer Dec. 24, 2013
8609321 Radiation-sensitive resin composition, polymer and compound Dec. 17, 2013
8609317 Salt and photoresist composition containing the same Dec. 17, 2013
8597870 TARC material for immersion watermark reduction Dec. 3, 2013
8592622 Polymerizable fluorine-containing compound Nov. 26, 2013
8592132 Resist composition and method for producing resist pattern Nov. 26, 2013
8592131 Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same Nov. 26, 2013
8592128 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Nov. 26, 2013
8586366 Gel for radiation dosimeter and radiation dosimeter which uses the same Nov. 19, 2013
8580486 Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method Nov. 12, 2013
8580481 Resist polymer and resist composition Nov. 12, 2013
8574817 Positive resist composition and patterning process Nov. 5, 2013
8574816 Positive resist composition and patterning process Nov. 5, 2013
8574813 Resist composition for immersion exposure and method of forming resist pattern Nov. 5, 2013
8574812 Resist composition and method for producing resist pattern Nov. 5, 2013
8574811 Resist composition and method for producing resist pattern Nov. 5, 2013
8568956 Resist composition and method for producing resist pattern Oct. 29, 2013
8563219 Resist composition and method for producing resist pattern Oct. 22, 2013
8563218 Resist composition and method for producing resist pattern Oct. 22, 2013
8563217 Resist composition and method for producing resist pattern Oct. 22, 2013
8551684 Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition Oct. 8, 2013
8546060 Chemically amplified positive resist composition and pattern forming process Oct. 1, 2013
8541161 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method Sep. 24, 2013
8541158 Positive resist compositions and patterning process Sep. 24, 2013
8541157 Resist composition, method of forming resist pattern, compound and acid generator including the same Sep. 24, 2013
8535872 Thermally cured underlayer for lithographic application Sep. 17, 2013
8535871 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer Sep. 17, 2013
8535868 Positive resist composition and method of forming resist pattern Sep. 17, 2013
8530139 Solvent for printing, pattern composition for printing comprising the solvent, and patterning method using the composition Sep. 10, 2013











 
 
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