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Class Information
Number: 430/910
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Binder containing > Polymer of unsaturated acid or ester
Description: Art collection involving a binder which is a polymer of an unsaturated acid or ester.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625690 |
Positive resist composition and pattern forming method using the same |
Dec. 1, 2009 |
| 7622242 |
Resist composition and patterning process |
Nov. 24, 2009 |
| 7618764 |
Positive resist compositions and patterning process |
Nov. 17, 2009 |
| 7618765 |
Positive resist composition and patterning process |
Nov. 17, 2009 |
| 7611822 |
Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
Nov. 3, 2009 |
| 7608381 |
Polymer compound, positive resist composition and process for forming resist pattern |
Oct. 27, 2009 |
| 7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
Oct. 27, 2009 |
| 7604920 |
Positive resist composition, method of forming resist pattern, polymeric compound, and compound |
Oct. 20, 2009 |
| 7604919 |
Monomer, polymer and composition for photoresist |
Oct. 20, 2009 |
| 7601479 |
Polymer, resist composition and patterning process |
Oct. 13, 2009 |
| 7601480 |
Photoactive compounds |
Oct. 13, 2009 |
| 7601482 |
Negative photoresist compositions |
Oct. 13, 2009 |
| 7598017 |
Negative resist composition and method of forming resist pattern |
Oct. 6, 2009 |
| 7598016 |
Resist composition and patterning process |
Oct. 6, 2009 |
| 7598015 |
Polymer, resist composition and patterning process |
Oct. 6, 2009 |
| 7592118 |
Positive resist composition and pattern forming method using the same |
Sep. 22, 2009 |
| 7592125 |
Photoresist compositions comprising resin blends |
Sep. 22, 2009 |
| 7592126 |
Positive resist composition and pattern forming method using the resist composition |
Sep. 22, 2009 |
| 7582409 |
Negative resist composition and method of forming resist pattern |
Sep. 1, 2009 |
| 7579132 |
Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
Aug. 25, 2009 |
| 7575846 |
Resist polymer and resist composition |
Aug. 18, 2009 |
| 7575850 |
Chemically amplified resist composition |
Aug. 18, 2009 |
| 7572570 |
Chemically amplified resist composition |
Aug. 11, 2009 |
| 7569328 |
Resin composition and thermo/photosensitive composition |
Aug. 4, 2009 |
| 7569326 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process |
Aug. 4, 2009 |
| 7569325 |
Monomer having sulfonyl group, polymer thereof and photoresist composition including the same |
Aug. 4, 2009 |
| 7569323 |
Resist protective coating material and patterning process |
Aug. 4, 2009 |
| 7566522 |
Chemically amplified resist composition |
Jul. 28, 2009 |
| 7550249 |
Base soluble polymers for photoresist compositions |
Jun. 23, 2009 |
| 7544460 |
Resist composition, multilayer body, and method for forming resist pattern |
Jun. 9, 2009 |
| 7541138 |
Resist composition |
Jun. 2, 2009 |
| 7541133 |
Positive resist composition and patterning process |
Jun. 2, 2009 |
| 7541131 |
Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
Jun. 2, 2009 |
| 7537879 |
Photoresist composition for deep UV and process thereof |
May. 26, 2009 |
| 7537880 |
Polymer, resist composition, and patterning process |
May. 26, 2009 |
| 7534551 |
Planographic printing plate material |
May. 19, 2009 |
| 7534550 |
Positive resist composition and process for formation of resist patterns |
May. 19, 2009 |
| 7534549 |
Photoresist polymer, and photoresist composition |
May. 19, 2009 |
| 7534548 |
Polymer for immersion lithography and photoresist composition |
May. 19, 2009 |
| 7531286 |
Radiation-sensitive resin composition |
May. 12, 2009 |
| 7527912 |
Photoacid generators, resist compositions, and patterning process |
May. 5, 2009 |
| 7527913 |
Photoacid generators, photoresist composition including the same and method of forming pattern using the same |
May. 5, 2009 |
| 7524614 |
Negative-working radiation-sensitive compositions and imageable materials |
Apr. 28, 2009 |
| 7517633 |
Composition for forming gap-filling material for lithography |
Apr. 14, 2009 |
| 7514204 |
Resist composition and patterning process |
Apr. 7, 2009 |
| 7514203 |
Positive photoresist composition |
Apr. 7, 2009 |
| 7514201 |
Positive photosensitive composition |
Apr. 7, 2009 |
| 7514199 |
Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same |
Apr. 7, 2009 |
| 7504195 |
Photosensitive polymer and photoresist composition |
Mar. 17, 2009 |
| 7501221 |
Positive type resist composition and resist pattern formation method using same |
Mar. 10, 2009 |
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