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Browse by Category: Main > Chemistry
Class Information
Number: 430/907
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Binder containing > Polyolefin or halogen containing
Description: Art collection involving a binder which is a polymer of an open chain aliphatic monoolefin or the binder molecule contains a halogen.










Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8703383 Photosensitive copolymer and photoresist composition Apr. 22, 2014
8685618 Resist composition and method for producing resist pattern Apr. 1, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685620 Resist composition, method of forming resist pattern and polymeric compound Apr. 1, 2014
8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Mar. 25, 2014
8663900 Resist composition and method for producing resist pattern Mar. 4, 2014
8663897 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same Mar. 4, 2014
8663899 Resist composition and method for producing resist pattern Mar. 4, 2014
8652754 Resist composition and method for producing resist pattern Feb. 18, 2014
8652751 Resist composition, method for forming resist pattern, and method for producing electronic device Feb. 18, 2014
8652753 Resist composition and method for producing resist pattern Feb. 18, 2014
8647808 Fluorinated monomer, polymer, resist composition, and patterning process Feb. 11, 2014
8628908 Chemically amplified resist composition and patterning process Jan. 14, 2014
8609321 Radiation-sensitive resin composition, polymer and compound Dec. 17, 2013
8592622 Polymerizable fluorine-containing compound Nov. 26, 2013
8592132 Resist composition and method for producing resist pattern Nov. 26, 2013
8580486 Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method Nov. 12, 2013
8574817 Positive resist composition and patterning process Nov. 5, 2013
8574812 Resist composition and method for producing resist pattern Nov. 5, 2013
8574813 Resist composition for immersion exposure and method of forming resist pattern Nov. 5, 2013
8563217 Resist composition and method for producing resist pattern Oct. 22, 2013
8563218 Resist composition and method for producing resist pattern Oct. 22, 2013
8563219 Resist composition and method for producing resist pattern Oct. 22, 2013
8551684 Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition Oct. 8, 2013
8535871 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer Sep. 17, 2013
8530136 Fluoroalcohol containing molecular photoresist materials and processes of use Sep. 10, 2013
8524440 Photoresist composition Sep. 3, 2013
8518628 Surface switchable photoresist Aug. 27, 2013
8518629 Resist composition for immersion exposure and method of forming resist pattern using the same Aug. 27, 2013
8507176 Photosensitive compositions Aug. 13, 2013
8486606 Acrylate derivative, haloester derivative, polymer compound and photoresist composition Jul. 16, 2013
8475997 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound Jul. 2, 2013
8470513 Radiation-sensitive resin composition and polymer Jun. 25, 2013
8460856 Material and method for photolithography Jun. 11, 2013
8450041 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same May. 28, 2013
8450044 Positive resist composition and method of forming resist pattern May. 28, 2013
8435717 Compound for photoacid generator, resist composition using the same, and pattern-forming method May. 7, 2013
8431323 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process Apr. 30, 2013
8426103 Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same Apr. 23, 2013
8420292 Polymer, resist composition, and patterning process Apr. 16, 2013
8420290 Acetal compounds and their preparation, polymers, resist compositions and patterning process Apr. 16, 2013
8404426 Negative resist composition, method of forming resist pattern and polymeric compound Mar. 26, 2013
8404428 Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound Mar. 26, 2013
8389201 Positive resist composition and pattern forming process Mar. 5, 2013
8361703 Resist protective coating composition and patterning process Jan. 29, 2013
8357483 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin Jan. 22, 2013
8349534 Positive resist composition and method of forming resist pattern Jan. 8, 2013
8343708 Positive resist composition and pattern forming method Jan. 1, 2013
8343694 Photomask blank, resist pattern forming process, and photomask preparation process Jan. 1, 2013

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