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Class Information
Number: 430/5
Name: Radiation imagery chemistry: process, composition, or product thereof > Radiation modifying product or process of making > Radiation mask
Description: Subject matter wherein the light modifying means is in the form of a radiation mask.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
Nov. 17, 2009 |
| 7618754 |
Pattern formation method |
Nov. 17, 2009 |
| 7618753 |
Photomask blank, photomask and method for producing those |
Nov. 17, 2009 |
| 7618752 |
Deformation-based contact lithography systems, apparatus and methods |
Nov. 17, 2009 |
| 7618751 |
RET for optical maskless lithography |
Nov. 17, 2009 |
| 7617473 |
Differential alternating phase shift mask optimization |
Nov. 10, 2009 |
| 7615837 |
Lithography device for semiconductor circuit pattern generation |
Nov. 10, 2009 |
| 7615336 |
Method of fabricating a display device by using a stepped halftone mask to form a three-step photoresist pattern on a material layer for etching and ashing |
Nov. 10, 2009 |
| 7615319 |
Quick and accurate modeling of transmitted field |
Nov. 10, 2009 |
| 7615318 |
Printing of design features using alternating PSM technology with double mask exposure strategy |
Nov. 10, 2009 |
| 7614034 |
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology |
Nov. 3, 2009 |
| 7614031 |
Drawing apparatus with drawing data correction function |
Nov. 3, 2009 |
| 7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same |
Nov. 3, 2009 |
| 7611809 |
Multi-layer, attenuated phase-shifting mask |
Nov. 3, 2009 |
| 7611808 |
Halftone type phase shift mask blank and halftone type phase shift mask |
Nov. 3, 2009 |
| 7611807 |
Method for forming poly-silicon film |
Nov. 3, 2009 |
| 7611806 |
Sub-wavelength diffractive elements to reduce corner rounding |
Nov. 3, 2009 |
| 7609805 |
Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process |
Oct. 27, 2009 |
| 7608370 |
Exposure mask and method for manufacturing semiconductor device using the same |
Oct. 27, 2009 |
| 7608369 |
Photomask to which phase shift is applied and exposure apparatus |
Oct. 27, 2009 |
| 7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 27, 2009 |
| 7608367 |
Vitreous carbon mask substrate for X-ray lithography |
Oct. 27, 2009 |
| 7605908 |
Near-field exposure mask, near-field exposure apparatus, and near-field exposure method |
Oct. 20, 2009 |
| 7605906 |
Patterning systems using photomasks including shadowing elements therein |
Oct. 20, 2009 |
| 7605390 |
Programmable photolithographic mask based on semiconductor nano-particle optical modulators |
Oct. 20, 2009 |
| 7605350 |
System for two-step resist soft bake to prevent ILD outgassing during semiconductor processing |
Oct. 20, 2009 |
| 7604925 |
Exposure apparatus and method |
Oct. 20, 2009 |
| 7604912 |
Local flare correction |
Oct. 20, 2009 |
| 7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern |
Oct. 20, 2009 |
| 7604909 |
Method for improved manufacturability and patterning of sub-wavelength contact hole mask |
Oct. 20, 2009 |
| 7604908 |
Fine pattern forming method |
Oct. 20, 2009 |
| 7604907 |
Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets |
Oct. 20, 2009 |
| 7604906 |
Films for prevention of crystal growth on fused silica substrates for semiconductor lithography |
Oct. 20, 2009 |
| 7604905 |
Photomasks |
Oct. 20, 2009 |
| 7604904 |
Pellicle for lithography |
Oct. 20, 2009 |
| 7604903 |
Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) |
Oct. 20, 2009 |
| 7603648 |
Mask design using library of corrections |
Oct. 13, 2009 |
| 7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask |
Oct. 13, 2009 |
| 7601469 |
Plasma etching chamber and method for manufacturing photomask using the same |
Oct. 13, 2009 |
| 7601468 |
Process for manufacturing half-tone phase shifting mask blanks |
Oct. 13, 2009 |
| 7601467 |
Method of manufacturing EUVL alternating phase-shift mask |
Oct. 13, 2009 |
| 7601466 |
System and method for photolithography in semiconductor manufacturing |
Oct. 13, 2009 |
| 7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 6, 2009 |
| 7599064 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods |
Oct. 6, 2009 |
| 7598020 |
Exposure apparatus and method |
Oct. 6, 2009 |
| 7598007 |
Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method |
Oct. 6, 2009 |
| 7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer |
Oct. 6, 2009 |
| 7598005 |
Photomask and manufacturing method of the same, and pattern forming method |
Oct. 6, 2009 |
| 7598004 |
Film-depositing target and preparation of phase shift mask blank |
Oct. 6, 2009 |
| 7596420 |
Device manufacturing method and computer program product |
Sep. 29, 2009 |
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