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Browse by Category: Main > Chemistry
Class Information
Number: 430/5
Name: Radiation imagery chemistry: process, composition, or product thereof > Radiation modifying product or process of making > Radiation mask
Description: Subject matter wherein the light modifying means is in the form of a radiation mask.










Patents under this class:

Patent Number Title Of Patent Date Issued
8713484 Aware manufacturing of integrated circuits Apr. 29, 2014
8711346 Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks Apr. 29, 2014
8710465 Pattern data conversion for lithography system Apr. 29, 2014
8709685 Reflective mask blank and method of manufacturing a reflective mask Apr. 29, 2014
8709684 Automatic misalignment balancing scheme for multi-patterning technology Apr. 29, 2014
8709683 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method Apr. 29, 2014
8709682 Mask and method for forming the mask Apr. 29, 2014
8709681 Mask blank, transfer mask, and film denseness evaluation method Apr. 29, 2014
8709340 Method for radiation sterilization of medical devices Apr. 29, 2014
8707231 Method and system for derived layer checking for semiconductor device design Apr. 22, 2014
8707222 Lithography mask functional optimization and spatial frequency analysis Apr. 22, 2014
8703389 Method and system for forming patterns with charged particle beam lithography Apr. 22, 2014
8703365 UV mask with anti-reflection coating and UV absorption material Apr. 22, 2014
8703364 Method for repairing photomask Apr. 22, 2014
8702901 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask Apr. 22, 2014
8694929 Method and apparatus for the position determination of structures on a mask for microlithography Apr. 8, 2014
8694927 Method of designing pattern layouts Apr. 8, 2014
8691479 Optical mask for forming pattern Apr. 8, 2014
8691478 Attenuated phase shift mask for multi-patterning Apr. 8, 2014
8691477 Reticle design for the reduction of lens heating phenomenon Apr. 8, 2014
8691476 EUV mask and method for forming the same Apr. 8, 2014
8689150 Method of fabricating semiconductor device Apr. 1, 2014
8685633 Method for optimizing wafer edge patterning Apr. 1, 2014
8685598 Pellicle and mask adhesive therefor Apr. 1, 2014
8685597 Forming a bridging feature using chromeless phase-shift lithography Apr. 1, 2014
8685596 Semi-transparent film grayscale mask Apr. 1, 2014
8683395 Method and system for feed-forward advanced process control Mar. 25, 2014
8682466 Automatic virtual metrology for semiconductor wafer result prediction Mar. 25, 2014
8679731 Semiconductor device manufacturing method Mar. 25, 2014
8679729 Method for forming patterns of semiconductor device by using mixed assist feature system Mar. 25, 2014
8679708 Polarization monitoring reticle design for high numerical aperture lithography systems Mar. 25, 2014
8679707 Method of fabricating a lithography mask Mar. 25, 2014
8679706 Photomask processing techniques Mar. 25, 2014
8677290 Method of forming and using photolithography mask having a scattering bar structure Mar. 18, 2014
8673538 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition Mar. 18, 2014
8673522 Method for manufacturing photomask and photomask manufactured using the same Mar. 18, 2014
8673521 Blank substrates for extreme ultra violet photo masks and methods of fabricating an extreme ultra violet photo mask using the same Mar. 18, 2014
8673520 Intensity selective exposure photomask Mar. 18, 2014
8670640 Optical fiber, method of preparation thereof and device Mar. 11, 2014
8669023 Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography Mar. 11, 2014
8669022 Photomask Mar. 11, 2014
RE44792 Rapid scattering simulation of objects in imaging using edge domain decomposition Mar. 4, 2014
8667430 Methods for directed self-assembly process/proximity correction Mar. 4, 2014
8667428 Methods for directed self-assembly process/proximity correction Mar. 4, 2014
8663879 Gate CD control using local design on both sides of neighboring dummy gate level features Mar. 4, 2014
8663878 Mask and method for forming the same Mar. 4, 2014
8663877 Lithography masks, systems, and manufacturing methods Mar. 4, 2014
8663876 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same Mar. 4, 2014
8663875 Method of manufacturing a photomask Mar. 4, 2014
8663874 Hardcoat composition Mar. 4, 2014











 
 
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