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Class Information
Number: 430/396
Name: Radiation imagery chemistry: process, composition, or product thereof > Effecting frontal radiation modification during exposure, e,g., screening, masking, stenciling, etc.
Description: Processes employing some means interposed between the radiation source and the image receiver which changes the quantity or quality of radiation reaching the receiver, e.g., a mask, stencil, screening, vignetting, etc.










Sub-classes under this class:

Class Number Class Name Patents
430/397 Involving motion during exposure, e.g., dodging, etc. 125


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18

Patent Number Title Of Patent Date Issued
8709340 Method for radiation sterilization of medical devices Apr. 29, 2014
8710465 Pattern data conversion for lithography system Apr. 29, 2014
8685633 Method for optimizing wafer edge patterning Apr. 1, 2014
8679731 Semiconductor device manufacturing method Mar. 25, 2014
8669023 Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography Mar. 11, 2014
8652583 Method for producing a three-dimensionally controlled surface coating in a cavity Feb. 18, 2014
8637211 Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns Jan. 28, 2014
8617775 Optimized mask design for fabricating periodic and quasi-periodic patterns Dec. 31, 2013
8609306 Method for forming circular patterns on a surface Dec. 17, 2013
8609327 Forming sub-lithographic patterns using double exposure Dec. 17, 2013
8580483 Method of making nozzle chip Nov. 12, 2013
8574795 Lithographic CD correction by second exposure Nov. 5, 2013
8568963 Method of manufacturing mask for depositing thin film Oct. 29, 2013
8551677 Lithographic CD correction by second exposure Oct. 8, 2013
8541160 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same Sep. 24, 2013
8524426 Method of manufacturing a photomask Sep. 3, 2013
8512936 Optical lithography using graphene contrast enhancement layer Aug. 20, 2013
8501374 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography Aug. 6, 2013
8465887 Lower cost reusable polymer binder Jun. 18, 2013
8460854 Multiple step printing methods for microbarcodes Jun. 11, 2013
8435702 Manufacturing method of semiconductor device and manufacturing method of mask May. 7, 2013
8431914 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur Apr. 30, 2013
8426119 Dynamic projection method for micro-truss foam fabrication Apr. 23, 2013
8426088 Method for a lithographic apparatus Apr. 23, 2013
8383325 Lithographic apparatus and method Feb. 26, 2013
8343695 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography Jan. 1, 2013
8323866 Inorganic resist sensitizer Dec. 4, 2012
8318392 Alignment method and method for manufacturing flat panel display Nov. 27, 2012
8309297 Methods of lithographically patterning a substrate Nov. 13, 2012
8304173 Photomasks, methods of exposing a substrate to light, methods of forming a pattern, and methods of manufacturing a semiconductor device Nov. 6, 2012
8298483 Method for radiation sterilization of medical devices using a package having modifier sections Oct. 30, 2012
8293456 Semiconductor device manufacturing method Oct. 23, 2012
8283094 Method for fracturing and forming a pattern using circular characters with charged particle beam lithography Oct. 9, 2012
8252487 Device manufacturing method and mask for use therein Aug. 28, 2012
8252517 Stop flow interference lithography system Aug. 28, 2012
8236480 Fabrication method of topographically modulated microstructures using pattern homogenization with UV light Aug. 7, 2012
8232029 Methods of fabricating a photomask and use thereof Jul. 31, 2012
8227180 Photolithography focus improvement by reduction of autofocus radiation transmission into substrate Jul. 24, 2012
8222621 Method for maskless particle-beam exposure Jul. 17, 2012
8216765 Reimageable and reusable medium and method of producing and using the reimageable and reusable medium Jul. 10, 2012
8211624 Method for pattern formation and resin composition for use in the method Jul. 3, 2012
8206889 Manufacturing method of semiconductor integrated circuit device Jun. 26, 2012
8198004 Resist composition Jun. 12, 2012
8197991 Manufacturing method of a semiconductor device Jun. 12, 2012
8197930 Three-dimensional ordered open-cellular structures Jun. 12, 2012
8192920 Lithography method Jun. 5, 2012
8178263 Method for a lithographic apparatus May. 15, 2012
8178280 Self-contained proximity effect correction inspiration for advanced lithography (special) May. 15, 2012
8173347 Micropatterning of molecular surfaces via selective irradiation May. 8, 2012
8163466 Method for selectively adjusting local resist pattern dimension with chemical treatment Apr. 24, 2012

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