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Class Information
Number: 430/396
Name: Radiation imagery chemistry: process, composition, or product thereof > Effecting frontal radiation modification during exposure, e,g., screening, masking, stenciling, etc.
Description: Processes employing some means interposed between the radiation source and the image receiver which changes the quantity or quality of radiation reaching the receiver, e.g., a mask, stencil, screening, vignetting, etc.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7415694 |
Graph based phase shift lithography mapping method and apparatus |
Aug. 19, 2008 |
| 7410736 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
Aug. 12, 2008 |
| 7402378 |
Exposure method and apparatus |
Jul. 22, 2008 |
| 7399559 |
Optical proximity correction method utilizing phase-edges as sub-resolution assist features |
Jul. 15, 2008 |
| 7389930 |
Mask management method and bar code reading apparatus thereof |
Jun. 24, 2008 |
| 7388216 |
Pattern writing and forming method |
Jun. 17, 2008 |
| 7385209 |
Micromachining process, system and product |
Jun. 10, 2008 |
| 7382959 |
Optically oriented three-dimensional polymer microstructures |
Jun. 3, 2008 |
| 7374866 |
System and method for exposure of partial edge die |
May. 20, 2008 |
| 7371510 |
Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern |
May. 13, 2008 |
| 7358035 |
Topcoat compositions and methods of use thereof |
Apr. 15, 2008 |
| 7354695 |
Producing a substrate having high surface-area texturing |
Apr. 8, 2008 |
| 7351523 |
Photographic materials having improved keeping properties |
Apr. 1, 2008 |
| 7329481 |
Substrate optical waveguides having fiber-like shape and methods of making the same |
Feb. 12, 2008 |
| 7326442 |
Antireflective composition and process of making a lithographic structure |
Feb. 5, 2008 |
| 7320856 |
Manufacturing method of pattern formed body |
Jan. 22, 2008 |
| 7312020 |
Lithography method |
Dec. 25, 2007 |
| 7288366 |
Method for dual damascene patterning with single exposure using tri-tone phase shift mask |
Oct. 30, 2007 |
| 7282309 |
Photomask, method for producing the same, and method for forming pattern using the photomask |
Oct. 16, 2007 |
| 7279253 |
Near-field light generating structure, near-field exposure mask, and near-field generating method |
Oct. 9, 2007 |
| 7270921 |
Pattern writing and forming method |
Sep. 18, 2007 |
| 7267930 |
Techniques for manufacturing a waveguide with a three-dimensional lens |
Sep. 11, 2007 |
| 7264918 |
Resist composition for liquid immersion exposure process and method of forming resist pattern therewith |
Sep. 4, 2007 |
| 7264909 |
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same |
Sep. 4, 2007 |
| 7250248 |
Method for forming pattern using a photomask |
Jul. 31, 2007 |
| 7241541 |
Method of the adjustable matching map system in lithography |
Jul. 10, 2007 |
| 7238463 |
Method for manufacturing electrodes of a plasma display panel |
Jul. 3, 2007 |
| 7239369 |
Lithographic apparatus and device manufacturing method |
Jul. 3, 2007 |
| 7192693 |
Methods for photopatterning hydrogels |
Mar. 20, 2007 |
| 7175968 |
Lithographic apparatus, device manufacturing method and a substrate |
Feb. 13, 2007 |
| 7172788 |
Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device |
Feb. 6, 2007 |
| 7169545 |
Resist exposure system and method of forming a pattern on a resist |
Jan. 30, 2007 |
| 7153614 |
Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device |
Dec. 26, 2006 |
| 7144684 |
Method for forming pattern using photomask |
Dec. 5, 2006 |
| 7144687 |
Manufacturing method for magnetic head suspension |
Dec. 5, 2006 |
| 7144690 |
Photolithographic methods of using a single reticle to form overlapping patterns |
Dec. 5, 2006 |
| 7125654 |
Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
Oct. 24, 2006 |
| 7125651 |
Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks |
Oct. 24, 2006 |
| 7118833 |
Forming partial-depth features in polymer film |
Oct. 10, 2006 |
| 7115886 |
Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
Oct. 3, 2006 |
| 7108960 |
Lithographic apparatus and device manufacturing method |
Sep. 19, 2006 |
| 7107573 |
Method for setting mask pattern and illumination condition |
Sep. 12, 2006 |
| 7105278 |
Pattern mask with features to minimize the effect of aberrations |
Sep. 12, 2006 |
| 7083900 |
Method for manufacturing a liquid crystal display device |
Aug. 1, 2006 |
| 7074547 |
Photomask and method of fabricating semiconductor device by use of same |
Jul. 11, 2006 |
| 7045255 |
Photomask and method for producing the same |
May. 16, 2006 |
| 7045258 |
Color filter and manufacturing method thereof |
May. 16, 2006 |
| 7041436 |
Method for the manufacture of micro structures |
May. 9, 2006 |
| 7037791 |
Application of single exposure alternating aperture phase shift mask to form sub 0.18 micron polysilicon gates |
May. 2, 2006 |
| 7033737 |
Manufacturing method of electroluminescent device |
Apr. 25, 2006 |
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