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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Browse by Category: Main > Chemistry
Class Information
Number: 430/330
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Including heating
Description: Process wherein heat is used to image, perfect, or finish an image in the medium.


Patents under this class:

Patent Number Title Of Patent Date Issued
7622244 Method for contaminant removal Nov. 24, 2009
7622242 Resist composition and patterning process Nov. 24, 2009
7618765 Positive resist composition and patterning process Nov. 17, 2009
7618763 Resist composition and patterning process Nov. 17, 2009
7615338 Photoresist coating composition and method for forming fine pattern using the same Nov. 10, 2009
7615331 Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device Nov. 10, 2009
7615324 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same Nov. 10, 2009
7608387 Method for fabricating mold core Oct. 27, 2009
7608383 UV radiation blocking protective layers compatible with thick film pastes Oct. 27, 2009
7608368 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product Oct. 27, 2009
7608139 Erasable image forming material Oct. 27, 2009
7604919 Monomer, polymer and composition for photoresist Oct. 20, 2009
7604917 Polymer, top coating layer, top coating composition and immersion lithography process using the same Oct. 20, 2009
7604916 Donor films with pattern-directing layers Oct. 20, 2009
7604911 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor dev Oct. 20, 2009
7601483 Anti-reflective coatings using vinyl ether crosslinkers Oct. 13, 2009
7601480 Photoactive compounds Oct. 13, 2009
7601479 Polymer, resist composition and patterning process Oct. 13, 2009
7601469 Plasma etching chamber and method for manufacturing photomask using the same Oct. 13, 2009
7598022 Positive and negative dual function magnetic resist lithography Oct. 6, 2009
7598017 Negative resist composition and method of forming resist pattern Oct. 6, 2009
7598016 Resist composition and patterning process Oct. 6, 2009
7598015 Polymer, resist composition and patterning process Oct. 6, 2009
7598009 Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device Oct. 6, 2009
7592132 Method for fine pattern formation Sep. 22, 2009
7592131 Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head Sep. 22, 2009
7592129 Method for forming photoresist pattern and method for manufacturing semiconductor device Sep. 22, 2009
7592119 Photosensitive polyimide resin composition Sep. 22, 2009
7585615 Composite photoresist for modifying die-side bumps Sep. 8, 2009
7582414 Method and system for drying a substrate Sep. 1, 2009
7582409 Negative resist composition and method of forming resist pattern Sep. 1, 2009
7582407 Imageable elements with low pH developer solubility Sep. 1, 2009
7582406 Resist composition and method for forming resist pattern Sep. 1, 2009
7579138 Method for forming micropattern Aug. 25, 2009
7579133 Processless lithographic printing plate precursor Aug. 25, 2009
7575849 Imaging layers and structures including imaging layers Aug. 18, 2009
7575848 Image recording media and image layers Aug. 18, 2009
7575844 Color forming composites capable of multi-colored imaging and associated systems and methods Aug. 18, 2009
7572571 Image sensor and method for manufacturing the same Aug. 11, 2009
7569334 Method of manufacturing for conductive pattern substrate Aug. 4, 2009
7569330 Method for manufacturing pattern of light shielding layer and pattern forming body of light shielding layer Aug. 4, 2009
7569326 Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process Aug. 4, 2009
7569325 Monomer having sulfonyl group, polymer thereof and photoresist composition including the same Aug. 4, 2009
7569324 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Aug. 4, 2009
7569323 Resist protective coating material and patterning process Aug. 4, 2009
7566527 Fused aromatic structures and methods for photolithographic applications Jul. 28, 2009
7566181 Controlling critical dimensions of structures formed on a wafer in semiconductor processing Jul. 28, 2009
7563563 Wet developable bottom antireflective coating composition and method for use thereof Jul. 21, 2009
7563561 Pattern forming method and a semiconductor device manufacturing method Jul. 21, 2009
7560225 Method of forming uniform features using photoresist Jul. 14, 2009



 
 
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