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Class Information
Number: 430/330
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Including heating
Description: Process wherein heat is used to image, perfect, or finish an image in the medium.

Patents under this class:

Patent Number Title Of Patent Date Issued
8709908 Improving alignment target contrast in a lithographic double patterning process Apr. 29, 2014
8709705 Metal-containing compositions and method of making same Apr. 29, 2014
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8703398 Method of manufacturing liquid ejection head Apr. 22, 2014
8703395 Pattern-forming method Apr. 22, 2014
8691491 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Apr. 8, 2014
8686098 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method Apr. 1, 2014
8685629 Resist pattern forming process Apr. 1, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685618 Resist composition and method for producing resist pattern Apr. 1, 2014
8673545 Method for manufacturing liquid crystal display device Mar. 18, 2014
8673539 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part Mar. 18, 2014
8669024 Method of fabricating color filter substrate and infrared heating apparatus for the same Mar. 11, 2014
8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Mar. 4, 2014
8663904 Norbornene-type polymers, compositions thereof and lithographic process using such compositions Mar. 4, 2014
8663900 Resist composition and method for producing resist pattern Mar. 4, 2014
8663899 Resist composition and method for producing resist pattern Mar. 4, 2014
8663897 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same Mar. 4, 2014
8658050 Method to transfer lithographic patterns into inorganic substrates Feb. 25, 2014
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8652762 Organic graded spin on BARC compositions for high NA lithography Feb. 18, 2014
8652758 Lithographic imaging and printing with printing members having fusible polymeric particles Feb. 18, 2014
8652755 Positive photosensitive resin composition and lyophobic film Feb. 18, 2014
8652754 Resist composition and method for producing resist pattern Feb. 18, 2014
8652753 Resist composition and method for producing resist pattern Feb. 18, 2014
8647812 Pattern forming method, chemical amplification resist composition and resist film Feb. 11, 2014
8647797 Methos and device for keeping mask dimensions constant Feb. 11, 2014
8637222 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern Jan. 28, 2014
8632958 Method of controlling surface roughness of a flexographic printing plate Jan. 21, 2014
8632948 Positive-working photoimageable bottom antireflective coating Jan. 21, 2014
8628908 Chemically amplified resist composition and patterning process Jan. 14, 2014
8628698 Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same Jan. 14, 2014
8623590 Pattern forming process Jan. 7, 2014
8623589 Bottom antireflective coating compositions and processes thereof Jan. 7, 2014
8617799 Post arrays and methods of making the same Dec. 31, 2013
8617794 Method of forming patterns Dec. 31, 2013
8617784 Increasing photoresist processing throughput Dec. 31, 2013
8614051 Photosensitive resin composition and circuit formation substrate using the same Dec. 24, 2013
8614048 Resin, resist composition and method for producing resist pattern Dec. 24, 2013
8614046 Salt and photoresist composition containing the same Dec. 24, 2013
8609327 Forming sub-lithographic patterns using double exposure Dec. 17, 2013
8609317 Salt and photoresist composition containing the same Dec. 17, 2013
8597869 Sulfonium salt, resist composition, and patterning process Dec. 3, 2013
8592132 Resist composition and method for producing resist pattern Nov. 26, 2013
8586290 Patterning process and chemical amplified photoresist composition Nov. 19, 2013
8586282 Resist composition and patterning process Nov. 19, 2013
8586269 Method for forming a high resolution resist pattern on a semiconductor wafer Nov. 19, 2013
8585830 Substrate processing apparatus and substrate processing method Nov. 19, 2013
8580486 Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method Nov. 12, 2013
8574823 Multi-level layer Nov. 5, 2013

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