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Browse by Category: Main > Chemistry
Class Information
Number: 430/327
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Processing feature prior to imaging
Description: Processes wherein there is a perfecting procedure prior to imaging the medium.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16

Patent Number Title Of Patent Date Issued
8709908 Improving alignment target contrast in a lithographic double patterning process Apr. 29, 2014
8623589 Bottom antireflective coating compositions and processes thereof Jan. 7, 2014
8563229 Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures Oct. 22, 2013
8541165 Resin film forming method Sep. 24, 2013
8524442 Integrated membrane lamination and UV exposure system and method of the same Sep. 3, 2013
8465903 Radiation patternable CVD film Jun. 18, 2013
8460856 Material and method for photolithography Jun. 11, 2013
8460857 Manufacturing method for wiring Jun. 11, 2013
8440387 Graded topcoat materials for immersion lithography May. 14, 2013
8426112 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group Apr. 23, 2013
8415083 On-track process for patterning hardmask by multiple dark field exposures Apr. 9, 2013
8415088 Method for forming a material layer Apr. 9, 2013
8394576 Method for patterning a photosensitive layer Mar. 12, 2013
8329387 Antireflective coating compositions Dec. 11, 2012
8323875 Methods for forming banks and organic thin film transistors comprising such banks Dec. 4, 2012
8323880 Positive resist processing liquid composition and liquid developer Dec. 4, 2012
8283112 Photoresist processing methods Oct. 9, 2012
8278026 Method for improving electron-beam Oct. 2, 2012
8241841 Patterning methods and products Aug. 14, 2012
8211619 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist Jul. 3, 2012
8206893 Photoimageable branched polymer Jun. 26, 2012
8192922 Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control Jun. 5, 2012
8163468 Method of reducing photoresist defects during fabrication of a semiconductor device Apr. 24, 2012
8133659 On-track process for patterning hardmask by multiple dark field exposures Mar. 13, 2012
8133644 Method of forming an image having multiple phases Mar. 13, 2012
8129101 Method for increasing the removal rate of photoresist layer Mar. 6, 2012
8124319 Semiconductor lithography process Feb. 28, 2012
8124323 Method for patterning a photosensitive layer Feb. 28, 2012
8124327 Method for using compositions containing fluorocarbinols in lithographic processes Feb. 28, 2012
8110336 Resin and chemically amplified resist composition comprising the same Feb. 7, 2012
8105738 Developing method Jan. 31, 2012
8105758 Microphotonic maskless lithography Jan. 31, 2012
8088565 Exposure system and pattern formation method Jan. 3, 2012
8084193 Self-segregating multilayer imaging stack with built-in antireflective properties Dec. 27, 2011
8080364 Pattern formation method Dec. 20, 2011
8053174 Manufacturing method for wiring Nov. 8, 2011
8048610 Sulfonium salt-containing polymer, resist composition, and patterning process Nov. 1, 2011
8048615 Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating Nov. 1, 2011
8039201 Antireflective coating composition and process thereof Oct. 18, 2011
7977037 Photoresist processing methods Jul. 12, 2011
7968275 Method of forming a pattern using a photoresist composition for immersion lithography Jun. 28, 2011
7939241 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method May. 10, 2011
7932019 Gettering members, methods of forming the same, and methods of performing immersion lithography using the same Apr. 26, 2011
7914972 Exposure method and device manufacturing method Mar. 29, 2011
7910291 Method for manufacturing semiconductor device using immersion lithography process Mar. 22, 2011
7892722 Pattern forming method Feb. 22, 2011
7892723 Method for forming patterned photoresist layer Feb. 22, 2011
7875416 Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition Jan. 25, 2011
7871744 Near-field exposure apparatus and near-field exposure method Jan. 18, 2011
7871211 Coating and developing system, coating and developing method and storage medium Jan. 18, 2011

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