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Browse by Category: Main > Chemistry
Class Information
Number: 430/326
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Forming nonplanar surface > Post image treatment to produce elevated pattern > Pattern elevated in radiation unexposed areas
Description: Processes wherein the imaged medium is treated to produce an image in the form of an elevated pattern in radiation unexposed areas of the medium, i.e., by removal of soluble material in radiation exposed areas of a radiation-sensitive layer.










Patents under this class:

Patent Number Title Of Patent Date Issued
8709700 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Apr. 29, 2014
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8703383 Photosensitive copolymer and photoresist composition Apr. 22, 2014
8685620 Resist composition, method of forming resist pattern and polymeric compound Apr. 1, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685618 Resist composition and method for producing resist pattern Apr. 1, 2014
8685617 Salt, photoresist composition and process for producing photoresist pattern Apr. 1, 2014
8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Mar. 25, 2014
8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Mar. 4, 2014
8663905 Pattern-forming method Mar. 4, 2014
8663900 Resist composition and method for producing resist pattern Mar. 4, 2014
8663899 Resist composition and method for producing resist pattern Mar. 4, 2014
8652965 Production method for thick film metal electrode and production method for thick film resist Feb. 18, 2014
8652756 Positive resist composition and patterning process Feb. 18, 2014
8652755 Positive photosensitive resin composition and lyophobic film Feb. 18, 2014
8652754 Resist composition and method for producing resist pattern Feb. 18, 2014
8652753 Resist composition and method for producing resist pattern Feb. 18, 2014
8652751 Resist composition, method for forming resist pattern, and method for producing electronic device Feb. 18, 2014
8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Feb. 18, 2014
8652749 Photoresist composition and method of forming pattern by using the same Feb. 18, 2014
8647808 Fluorinated monomer, polymer, resist composition, and patterning process Feb. 11, 2014
8647807 Photosensitive resin composition, photosensitive dry film and method for forming pattern Feb. 11, 2014
8647806 Photosensitive resin composition, photosensitive dry film and method for forming pattern Feb. 11, 2014
8642245 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same Feb. 4, 2014
8642244 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound Feb. 4, 2014
8637229 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solut Jan. 28, 2014
8637220 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition Jan. 28, 2014
8632960 Method of forming resist pattern and negative tone-development resist composition Jan. 21, 2014
8632952 Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same Jan. 21, 2014
8632948 Positive-working photoimageable bottom antireflective coating Jan. 21, 2014
8632939 Polymer, chemically amplified positive resist composition and pattern forming process Jan. 21, 2014
8632938 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition Jan. 21, 2014
8628911 Polymers, photoresist compositions and methods of forming photolithographic patterns Jan. 14, 2014
8628908 Chemically amplified resist composition and patterning process Jan. 14, 2014
8623590 Pattern forming process Jan. 7, 2014
8623589 Bottom antireflective coating compositions and processes thereof Jan. 7, 2014
8617790 Photoresist composition and method for producing photoresist pattern Dec. 31, 2013
8617785 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Dec. 31, 2013
8617784 Increasing photoresist processing throughput Dec. 31, 2013
8617775 Optimized mask design for fabricating periodic and quasi-periodic patterns Dec. 31, 2013
8614047 Photodecomposable bases and photoresist compositions Dec. 24, 2013
8614046 Salt and photoresist composition containing the same Dec. 24, 2013
8609889 Photoacid generator, resist composition, and patterning process Dec. 17, 2013
8609323 System for producing patterned silicon carbide structures Dec. 17, 2013
8609321 Radiation-sensitive resin composition, polymer and compound Dec. 17, 2013
8609317 Salt and photoresist composition containing the same Dec. 17, 2013
8603732 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process Dec. 10, 2013
8597869 Sulfonium salt, resist composition, and patterning process Dec. 3, 2013
8592132 Resist composition and method for producing resist pattern Nov. 26, 2013
8592128 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Nov. 26, 2013











 
 
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