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Class Information
Number: 430/325
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Forming nonplanar surface > Post image treatment to produce elevated pattern
Description: Processes wherein the imaged medium is treated to produce an image in the form of raised pattern, e.g., by removal of soluble material in radiation unexposed areas of a radiation layer, etc.

Sub-classes under this class:

Class Number Class Name Patents
430/326 Pattern elevated in radiation unexposed areas 2,462

Patents under this class:

Patent Number Title Of Patent Date Issued
8709706 Methods and apparatus for performing multiple photoresist layer development and etching processes Apr. 29, 2014
8703409 Method for forming a microstructure Apr. 22, 2014
8703408 Patterning process Apr. 22, 2014
8703407 Pattern formation method Apr. 22, 2014
8703392 Method and apparatus for developing process Apr. 22, 2014
8691925 Compositions of neutral layer for directed self assembly block copolymers and processes thereof Apr. 8, 2014
8685632 Radiation source, lithographic apparatus and device manufacturing method Apr. 1, 2014
8685631 Inspection method for patterning of photoresist Apr. 1, 2014
8678284 System and a method for nano imprinting Mar. 25, 2014
8673546 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head Mar. 18, 2014
8673539 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part Mar. 18, 2014
8670640 Optical fiber, method of preparation thereof and device Mar. 11, 2014
8669042 Resist pattern-forming method Mar. 11, 2014
8666206 Asymmetric slotted waveguide and method for fabricating the same Mar. 4, 2014
8663907 Method of forming pattern Mar. 4, 2014
8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Mar. 4, 2014
8663905 Pattern-forming method Mar. 4, 2014
8658347 Method of manufacturing micro lens array Feb. 25, 2014
8658344 Patterning process and photoresist with a photodegradable base Feb. 25, 2014
8652762 Organic graded spin on BARC compositions for high NA lithography Feb. 18, 2014
8652751 Resist composition, method for forming resist pattern, and method for producing electronic device Feb. 18, 2014
8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Feb. 18, 2014
8642253 Resist composition for negative tone development and pattern forming method using the same Feb. 4, 2014
8637226 Method of forming an image having multiple phases Jan. 28, 2014
8637222 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern Jan. 28, 2014
8637220 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition Jan. 28, 2014
8632952 Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same Jan. 21, 2014
8623458 Methods of directed self-assembly, and layered structures formed therefrom Jan. 7, 2014
8617798 Customized lithographic particles Dec. 31, 2013
8617795 Photosensitive resin composition and pattern forming method using the same Dec. 31, 2013
8617775 Optimized mask design for fabricating periodic and quasi-periodic patterns Dec. 31, 2013
8609323 System for producing patterned silicon carbide structures Dec. 17, 2013
8609321 Radiation-sensitive resin composition, polymer and compound Dec. 17, 2013
8603732 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process Dec. 10, 2013
8603724 Negative resist composition and patterning process Dec. 10, 2013
8597869 Sulfonium salt, resist composition, and patterning process Dec. 3, 2013
8593632 Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method Nov. 26, 2013
8586268 Oxime ester photoinitiators Nov. 19, 2013
8574818 Method for preparing a photo-crosslinkable composition Nov. 5, 2013
8568962 Process for preparing a polymeric relief structure Oct. 29, 2013
8568955 Composition for formation of top antireflective film, and pattern formation method using the composition Oct. 29, 2013
8568043 Coating and developing apparatus and coating and developing method Oct. 29, 2013
8557509 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition Oct. 15, 2013
8557498 Photosensitive resin composition Oct. 15, 2013
8551686 Antireflective composition for photoresists Oct. 8, 2013
8551684 Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition Oct. 8, 2013
8546069 Method for enhancing lithographic imaging of isolated and semi-isolated features Oct. 1, 2013
8546063 Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays Oct. 1, 2013
8546048 Forming sloped resist, via, and metal conductor structures using banded reticle structures Oct. 1, 2013
8541157 Resist composition, method of forming resist pattern, compound and acid generator including the same Sep. 24, 2013

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