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Class Information
Number: 430/323
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Forming nonplanar surface > Including etching substrate
Description: Processes wherein portions of the medium beneath an imaged layer in the medium are removed.

Patents under this class:

Patent Number Title Of Patent Date Issued
8709706 Methods and apparatus for performing multiple photoresist layer development and etching processes Apr. 29, 2014
8709701 Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin Apr. 29, 2014
8703406 Method of forming large-area masters for replication of transfer lithography templates Apr. 22, 2014
8693074 MOEMS apparatus and a method for manufacturing same Apr. 8, 2014
8691496 Method for forming resist under layer film, pattern forming method and composition for resist under layer film Apr. 8, 2014
8679733 Patterning process for small devices Mar. 25, 2014
8673541 Block copolymer assembly methods and patterns formed thereby Mar. 18, 2014
8663905 Pattern-forming method Mar. 4, 2014
8658346 Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition Feb. 25, 2014
8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Feb. 18, 2014
8652712 Photoacid generators for extreme ultraviolet lithography Feb. 18, 2014
8637225 Magnetic recording medium and magnetic recording/reproducing apparatus Jan. 28, 2014
8637213 Mask blank and transfer mask Jan. 28, 2014
8617798 Customized lithographic particles Dec. 31, 2013
8617792 Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same Dec. 31, 2013
8609323 System for producing patterned silicon carbide structures Dec. 17, 2013
8609305 Methods of forming a photolithography reticle Dec. 17, 2013
8603732 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process Dec. 10, 2013
8598041 Method for positioning spacers in pitch multiplication Dec. 3, 2013
8586289 Aromatic hydrocarbon resin and composition for forming underlayer film for lithography Nov. 19, 2013
8568963 Method of manufacturing mask for depositing thin film Oct. 29, 2013
8568958 Underlayer composition and process thereof Oct. 29, 2013
8563229 Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures Oct. 22, 2013
8551692 Forming a funnel-shaped nozzle Oct. 8, 2013
8551686 Antireflective composition for photoresists Oct. 8, 2013
8545969 Pattern-formed substrate, pattern-forming method, and die Oct. 1, 2013
8535858 Photomask and method for forming overlay mark using the same Sep. 17, 2013
8530147 Patterning process Sep. 10, 2013
8524442 Integrated membrane lamination and UV exposure system and method of the same Sep. 3, 2013
8524441 Silicon-based antireflective coating compositions Sep. 3, 2013
8512938 Methods of forming a pattern in a material and methods of forming openings in a material to be patterned Aug. 20, 2013
8507191 Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same Aug. 13, 2013
8501395 Line edge roughness reduction and double patterning Aug. 6, 2013
8492315 Method of providing a pattern of biological-binding areas for biological testing Jul. 23, 2013
8486608 Printing substrate for liquid crystal display, and manufacturing method thereof Jul. 16, 2013
8481245 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules Jul. 9, 2013
8476002 Methods of forming patterned masks Jul. 2, 2013
8455162 Alignment marks for multi-exposure lithography Jun. 4, 2013
8450052 Double patterning strategy for contact hole and trench in photolithography May. 28, 2013
8445187 Hardmask composition having antireflective properties and method of patterning material on substrate using the same May. 21, 2013
8426121 Self-aligned spatial frequency doubling Apr. 23, 2013
8426112 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group Apr. 23, 2013
8420302 Method of fine patterning a thin film and method of manufacturing a display substrate using the method Apr. 16, 2013
8389927 Optical arrangement and its use Mar. 5, 2013
8377316 Structure and method for creating surface texture of compliant coatings on piezo ink jet imaging drums Feb. 19, 2013
8361704 Method for reducing tip-to-tip spacing between lines Jan. 29, 2013
8354220 Resist ink and method of forming pattern using the same Jan. 15, 2013
8354215 Method for stripping photoresist Jan. 15, 2013
8343713 Method for patterning material layer Jan. 1, 2013
8338078 Photoresist undercoat-forming material and patterning process Dec. 25, 2012

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