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Class Information
Number: 430/322
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Forming nonplanar surface
Description: Processes wherein imaged areas of the medium are elevated or lowered relative to the rest of the medium.










Sub-classes under this class:

Class Number Class Name Patents
430/323 Including etching substrate 1,272
430/324 Including material deposition 818
430/325 Post image treatment to produce elevated pattern 2,077


Patents under this class:

Patent Number Title Of Patent Date Issued
8709705 Metal-containing compositions and method of making same Apr. 29, 2014
8709704 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method Apr. 29, 2014
8703409 Method for forming a microstructure Apr. 22, 2014
8703408 Patterning process Apr. 22, 2014
8703405 Methods of generating three-dimensional process window qualification Apr. 22, 2014
8703404 Patterning process Apr. 22, 2014
8703403 Method and apparatus for drying a wafer Apr. 22, 2014
8703402 Resist pattern forming method and developer Apr. 22, 2014
8703401 Method for forming pattern and developer Apr. 22, 2014
8703400 Substrate treatment method, coating treatment apparatus, and substrate treatment system Apr. 22, 2014
8703391 Polymeric matrix materials for infrared metamaterials Apr. 22, 2014
8691496 Method for forming resist under layer film, pattern forming method and composition for resist under layer film Apr. 8, 2014
8691495 Photoresist pattern forming method, and microlens array forming method Apr. 8, 2014
8691494 Patterning process Apr. 8, 2014
8685865 Method of forming patterns of semiconductor device Apr. 1, 2014
8685631 Inspection method for patterning of photoresist Apr. 1, 2014
8685630 Methods of forming a pattern in a material and methods of forming openings in a material to be patterned Apr. 1, 2014
8685629 Resist pattern forming process Apr. 1, 2014
8685615 Photosensitive resist underlayer film forming composition Apr. 1, 2014
8679727 Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method Mar. 25, 2014
8673539 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part Mar. 18, 2014
8663904 Norbornene-type polymers, compositions thereof and lithographic process using such compositions Mar. 4, 2014
8663898 Resist underlayer film composition and patterning process using the same Mar. 4, 2014
8658347 Method of manufacturing micro lens array Feb. 25, 2014
8658344 Patterning process and photoresist with a photodegradable base Feb. 25, 2014
8652767 Liquid ejection head and process for producing the same Feb. 18, 2014
8652765 Making a microfluidic device with improved adhesion Feb. 18, 2014
8652710 Device manufacturing method, method of making a mask, and mask Feb. 18, 2014
8647817 Vapor treatment process for pattern smoothing and inline critical dimension slimming Feb. 11, 2014
8647522 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles Feb. 11, 2014
8642252 Methods for fabrication of an air gap-containing interconnect structure Feb. 4, 2014
8642232 Method of direct writing with photons beyond the diffraction limit Feb. 4, 2014
8637623 Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition Jan. 28, 2014
8637226 Method of forming an image having multiple phases Jan. 28, 2014
8637213 Mask blank and transfer mask Jan. 28, 2014
8632942 Method of forming patterns Jan. 21, 2014
8628698 Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same Jan. 14, 2014
8623458 Methods of directed self-assembly, and layered structures formed therefrom Jan. 7, 2014
8619258 Lithographic apparatus and device manufacturing method Dec. 31, 2013
8617800 Patterning process Dec. 31, 2013
8617794 Method of forming patterns Dec. 31, 2013
8614050 Polymers, photoresist compositions and methods of forming photolithographic patterns Dec. 24, 2013
8614048 Resin, resist composition and method for producing resist pattern Dec. 24, 2013
8609325 Method of lithography Dec. 17, 2013
8609323 System for producing patterned silicon carbide structures Dec. 17, 2013
8609320 Resist composition, method of forming resist pattern, polymeric compound and compound Dec. 17, 2013
8609318 Radiation-sensitive resin composition, method for forming resist pattern and polymer Dec. 17, 2013
8603727 Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same Dec. 10, 2013
8597873 Method for pattern formation Dec. 3, 2013
8597868 Negative resist composition and patterning process Dec. 3, 2013











 
 
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