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Class Information
Number: 430/317
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Making electrical device > With formation of resist image, and etching of substrate or material deposition > Insulative or nonmetallic dielectric etched
Description: Processes wherein the portion of the medium being removed is an insulative or dielectric (nonmetal) material.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8663898 Resist underlayer film composition and patterning process using the same Mar. 4, 2014
8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Feb. 18, 2014
8652751 Resist composition, method for forming resist pattern, and method for producing electronic device Feb. 18, 2014
8647810 Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device Feb. 11, 2014
8609324 Method of forming pitch multiplied contacts Dec. 17, 2013
8603732 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process Dec. 10, 2013
8592130 Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board Nov. 26, 2013
8586284 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board Nov. 19, 2013
8563225 Forming a self-aligned hard mask for contact to a tunnel junction Oct. 22, 2013
8563227 Method and system for exposure of a phase shift mask Oct. 22, 2013
8507187 Multi-exposure lithography employing a single anti-reflective coating layer Aug. 13, 2013
8501386 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process Aug. 6, 2013
8460852 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board Jun. 11, 2013
8460853 Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method Jun. 11, 2013
8440576 Method for pitch reduction in integrated circuit fabrication May. 14, 2013
8435724 Fabricating method for touch screen panel May. 7, 2013
8431331 Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion Apr. 30, 2013
8426118 Method of forming pitch multiplied contacts Apr. 23, 2013
8426112 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group Apr. 23, 2013
8399174 Method of forming fine patterns using a block copolymer Mar. 19, 2013
8377626 Methods of forming a pattern using negative-type photoresist compositions Feb. 19, 2013
8377631 Planarization over topography with molecular glass materials Feb. 19, 2013
8343713 Method for patterning material layer Jan. 1, 2013
8338078 Photoresist undercoat-forming material and patterning process Dec. 25, 2012
8334090 Mixed lithography with dual resist and a single pattern transfer Dec. 18, 2012
8323871 Antireflective hardmask composition and a method of preparing a patterned material using same Dec. 4, 2012
8288082 Method of fabricating triode-structure field-emission device Oct. 16, 2012
8288074 Photoimaging method and apparatus Oct. 16, 2012
8288081 Method and system for exposure of a phase shift mask Oct. 16, 2012
8273519 Hardmask composition and associated methods Sep. 25, 2012
8263312 Antireflective coating material Sep. 11, 2012
8257908 Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative Sep. 4, 2012
8241823 Method of fabrication of a semiconductor device having reduced pitch Aug. 14, 2012
8241837 Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device Aug. 14, 2012
8227181 Method of preparing a patterned film with a developing solvent Jul. 24, 2012
8227180 Photolithography focus improvement by reduction of autofocus radiation transmission into substrate Jul. 24, 2012
8221961 Method of manufacturing semiconductor devices Jul. 17, 2012
8222075 Nonvolatile semiconductor memory device using a variable resistance film and method of manufacturing the same Jul. 17, 2012
8198014 Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same Jun. 12, 2012
8198016 Patterning process Jun. 12, 2012
8178405 Resistor random access memory cell device May. 15, 2012
8178284 Method of forming pattern May. 15, 2012
8173357 Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method May. 8, 2012
8173358 Method of forming fine patterns of a semiconductor device May. 8, 2012
8168372 Method of creating photolithographic structures with developer-trimmed hard mask May. 1, 2012
8168375 Patterning method May. 1, 2012
8163466 Method for selectively adjusting local resist pattern dimension with chemical treatment Apr. 24, 2012
8158334 Methods for forming a composite pattern including printed resolution assist features Apr. 17, 2012
8153349 Polymer composition, hardmask composition having antireflective properties, and associated methods Apr. 10, 2012
8155427 Wafer-scale image archiving and receiving system Apr. 10, 2012

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