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Class Information
Number: 430/311
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Making electrical device
Description: Processes wherein the image is used as or to form an electrical device.










Sub-classes under this class:

Class Number Class Name Patents
430/312 Including multiple resist image formation 1,182
430/319 Named electrical device 821
430/313 With formation of resist image, and etching of substrate or material deposition 2,331


Patents under this class:

Patent Number Title Of Patent Date Issued
8713484 Aware manufacturing of integrated circuits Apr. 29, 2014
8709908 Improving alignment target contrast in a lithographic double patterning process Apr. 29, 2014
8709702 Methods to fabricate a photoactive substrate suitable for microfabrication Apr. 29, 2014
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8709683 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method Apr. 29, 2014
8703391 Polymeric matrix materials for infrared metamaterials Apr. 22, 2014
8703383 Photosensitive copolymer and photoresist composition Apr. 22, 2014
8691493 Method for the production of a multilayer element, and multilayer element Apr. 8, 2014
8686098 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method Apr. 1, 2014
8685633 Method for optimizing wafer edge patterning Apr. 1, 2014
8685626 Method of measuring a characteristic Apr. 1, 2014
8685625 Photoresist processing methods Apr. 1, 2014
8685620 Resist composition, method of forming resist pattern and polymeric compound Apr. 1, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685618 Resist composition and method for producing resist pattern Apr. 1, 2014
8685597 Forming a bridging feature using chromeless phase-shift lithography Apr. 1, 2014
8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Mar. 25, 2014
8673539 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part Mar. 18, 2014
8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Mar. 4, 2014
8663905 Pattern-forming method Mar. 4, 2014
8663900 Resist composition and method for producing resist pattern Mar. 4, 2014
8663899 Resist composition and method for producing resist pattern Mar. 4, 2014
8663898 Resist underlayer film composition and patterning process using the same Mar. 4, 2014
8663874 Hardcoat composition Mar. 4, 2014
8658907 Conductive film and method for producing the same Feb. 25, 2014
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8652764 Method for manufacturing a piezoelectric membrane type device Feb. 18, 2014
8652762 Organic graded spin on BARC compositions for high NA lithography Feb. 18, 2014
8652755 Positive photosensitive resin composition and lyophobic film Feb. 18, 2014
8652754 Resist composition and method for producing resist pattern Feb. 18, 2014
8652753 Resist composition and method for producing resist pattern Feb. 18, 2014
8652751 Resist composition, method for forming resist pattern, and method for producing electronic device Feb. 18, 2014
8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Feb. 18, 2014
8647816 Method of manufacturing electronic device Feb. 11, 2014
8647815 Method of manufacturing copper electrode Feb. 11, 2014
8637222 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern Jan. 28, 2014
8637140 Method for defining an electrically conductive metal structure on a three-dimensional element and a device made from the method Jan. 28, 2014
8633908 Method of fabricating electronic apparatus Jan. 21, 2014
8632952 Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same Jan. 21, 2014
8628908 Chemically amplified resist composition and patterning process Jan. 14, 2014
8623590 Pattern forming process Jan. 7, 2014
8623587 Residue removing liquid composition and method for cleaning semiconductor element using same Jan. 7, 2014
8623458 Methods of directed self-assembly, and layered structures formed therefrom Jan. 7, 2014
8617797 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns Dec. 31, 2013
8617786 Poly-oxycarbosilane compositions for use in imprint lithography Dec. 31, 2013
8614053 Processess and compositions for removing substances from substrates Dec. 24, 2013
8614051 Photosensitive resin composition and circuit formation substrate using the same Dec. 24, 2013
8609323 System for producing patterned silicon carbide structures Dec. 17, 2013
8609321 Radiation-sensitive resin composition, polymer and compound Dec. 17, 2013
8609301 Mask, exposure apparatus and device manufacturing method Dec. 17, 2013











 
 
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