| |
 |
|
Class Information
Number: 430/311
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Making electrical device
Description: Processes wherein the image is used as or to form an electrical device.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625692 |
Yield and line width performance for liquid polymers and other materials |
Dec. 1, 2009 |
| 7625677 |
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
Dec. 1, 2009 |
| 7623220 |
Source optimization for image fidelity and throughput |
Nov. 24, 2009 |
| 7622246 |
Contrast enhancing layers |
Nov. 24, 2009 |
| 7622244 |
Method for contaminant removal |
Nov. 24, 2009 |
| 7622243 |
Photosensitive element, resist pattern formation method and printed wiring board production method |
Nov. 24, 2009 |
| 7622240 |
Low blur molecular resist |
Nov. 24, 2009 |
| 7619716 |
Exposure method |
Nov. 17, 2009 |
| 7618767 |
Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method |
Nov. 17, 2009 |
| 7618751 |
RET for optical maskless lithography |
Nov. 17, 2009 |
| 7616383 |
Lithographic apparatus and device manufacturing method |
Nov. 10, 2009 |
| 7615335 |
Imaging methods |
Nov. 10, 2009 |
| 7615332 |
Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
Nov. 10, 2009 |
| 7614146 |
Method for fabricating circuit board structure |
Nov. 10, 2009 |
| 7612864 |
Exposure apparatus and method |
Nov. 3, 2009 |
| 7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same |
Nov. 3, 2009 |
| 7611825 |
Photolithography method to prevent photoresist pattern collapse |
Nov. 3, 2009 |
| 7611820 |
Positive resist composition and pattern-forming method using the same |
Nov. 3, 2009 |
| 7611819 |
Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same |
Nov. 3, 2009 |
| 7611818 |
Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board |
Nov. 3, 2009 |
| 7608390 |
Top antireflective coating composition containing hydrophobic and acidic groups |
Oct. 27, 2009 |
| 7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
Oct. 27, 2009 |
| 7608386 |
Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same |
Oct. 27, 2009 |
| 7608383 |
UV radiation blocking protective layers compatible with thick film pastes |
Oct. 27, 2009 |
| 7605390 |
Programmable photolithographic mask based on semiconductor nano-particle optical modulators |
Oct. 20, 2009 |
| 7604928 |
Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor |
Oct. 20, 2009 |
| 7604927 |
Methods of patterning using photomasks including shadowing elements therein and related systems |
Oct. 20, 2009 |
| 7604926 |
Method of manufacturing a semiconductor device |
Oct. 20, 2009 |
| 7604925 |
Exposure apparatus and method |
Oct. 20, 2009 |
| 7604922 |
Process of surface treatment, surface treating device, surface treated plate, and electro-optic device, and electronic equipment |
Oct. 20, 2009 |
| 7604912 |
Local flare correction |
Oct. 20, 2009 |
| 7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern |
Oct. 20, 2009 |
| 7604909 |
Method for improved manufacturability and patterning of sub-wavelength contact hole mask |
Oct. 20, 2009 |
| 7604908 |
Fine pattern forming method |
Oct. 20, 2009 |
| 7604906 |
Films for prevention of crystal growth on fused silica substrates for semiconductor lithography |
Oct. 20, 2009 |
| 7603001 |
Method and apparatus for providing back-lighting in an interferometric modulator display device |
Oct. 13, 2009 |
| 7601486 |
Ultra dark polymer |
Oct. 13, 2009 |
| 7601485 |
Exposure method |
Oct. 13, 2009 |
| 7601483 |
Anti-reflective coatings using vinyl ether crosslinkers |
Oct. 13, 2009 |
| 7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask |
Oct. 13, 2009 |
| 7601466 |
System and method for photolithography in semiconductor manufacturing |
Oct. 13, 2009 |
| 7598023 |
Process for fabricating micro-display |
Oct. 6, 2009 |
| 7598022 |
Positive and negative dual function magnetic resist lithography |
Oct. 6, 2009 |
| 7598021 |
High resolution printing technique |
Oct. 6, 2009 |
| 7598020 |
Exposure apparatus and method |
Oct. 6, 2009 |
| 7598019 |
Method for cleavage of labile functional groups from chemical compounds |
Oct. 6, 2009 |
| 7595496 |
Optimized correction of wafer thermal deformations in a lithographic process |
Sep. 29, 2009 |
| 7595145 |
Method of forming pattern of semiconductor device |
Sep. 29, 2009 |
| 7595144 |
Sulfonate-containing anti-reflective coating forming composition for lithography |
Sep. 29, 2009 |
| 7595143 |
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same |
Sep. 29, 2009 |
|
|
|
