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Class Information
Number: 430/30
Name: Radiation imagery chemistry: process, composition, or product thereof > Including control feature responsive to a test or measurement
Description: Subject matter including the step of regulating a condition as a result of test or measurement to maintain or effect a change of the same.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7620931 |
Method of adding fabrication monitors to integrated circuit chips |
Nov. 17, 2009 |
| 7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
Nov. 17, 2009 |
| 7619717 |
Method for performing a focus test and a device manufacturing method |
Nov. 17, 2009 |
| 7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields |
Nov. 17, 2009 |
| 7617473 |
Differential alternating phase shift mask optimization |
Nov. 10, 2009 |
| 7614031 |
Drawing apparatus with drawing data correction function |
Nov. 3, 2009 |
| 7611810 |
Charged beam processing apparatus |
Nov. 3, 2009 |
| 7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 27, 2009 |
| 7605383 |
Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium |
Oct. 20, 2009 |
| 7604912 |
Local flare correction |
Oct. 20, 2009 |
| 7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern |
Oct. 20, 2009 |
| 7603648 |
Mask design using library of corrections |
Oct. 13, 2009 |
| 7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask |
Oct. 13, 2009 |
| 7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 6, 2009 |
| 7598098 |
Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material |
Oct. 6, 2009 |
| 7598007 |
Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method |
Oct. 6, 2009 |
| 7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer |
Oct. 6, 2009 |
| 7596420 |
Device manufacturing method and computer program product |
Sep. 29, 2009 |
| 7595496 |
Optimized correction of wafer thermal deformations in a lithographic process |
Sep. 29, 2009 |
| 7592106 |
Halftone type phase shift mask blank and phase shift mask thereof |
Sep. 22, 2009 |
| 7592103 |
Electron beam writing method and lithography mask manufacturing method |
Sep. 22, 2009 |
| 7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
Sep. 15, 2009 |
| 7588870 |
Dual layer workpiece masking and manufacturing process |
Sep. 15, 2009 |
| 7588869 |
Divided exposure method for making a liquid crystal display |
Sep. 15, 2009 |
| 7588868 |
Method and system for reducing the impact of across-wafer variations on critical dimension measurements |
Sep. 15, 2009 |
| 7587702 |
Step-walk relaxation method for global optimization of masks |
Sep. 8, 2009 |
| 7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets |
Sep. 8, 2009 |
| 7585601 |
Method to optimize grating test pattern for lithography monitoring and control |
Sep. 8, 2009 |
| 7585600 |
Method and apparatus for performing target-image-based optical proximity correction |
Sep. 8, 2009 |
| 7585596 |
Micro-sculpting using phase masks for projection lithography |
Sep. 8, 2009 |
| 7583362 |
Stray light feedback for dose control in semiconductor lithography systems |
Sep. 1, 2009 |
| 7580559 |
System and method for calibrating a spatial light modulator |
Aug. 25, 2009 |
| 7573574 |
Lithographic apparatus and device manufacturing method |
Aug. 11, 2009 |
| 7571417 |
Method and system for correcting a mask pattern design |
Aug. 4, 2009 |
| 7569332 |
Processing method of thin-film and manufacturing method of thin-film magnetic head |
Aug. 4, 2009 |
| 7569316 |
Inkless reimageable printing paper and method |
Aug. 4, 2009 |
| 7567344 |
Apparatus and method for characterizing defects in a transparent substrate |
Jul. 28, 2009 |
| 7566882 |
Reflection lithography using rotating platter |
Jul. 28, 2009 |
| 7566517 |
Feature printability optimization by optical tool |
Jul. 28, 2009 |
| 7566181 |
Controlling critical dimensions of structures formed on a wafer in semiconductor processing |
Jul. 28, 2009 |
| 7560713 |
Correction lens system for a particle beam projection device |
Jul. 14, 2009 |
| 7560224 |
Method of manufacturing liquid discharge head, and liquid discharge head |
Jul. 14, 2009 |
| 7560201 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers |
Jul. 14, 2009 |
| 7557921 |
Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools |
Jul. 7, 2009 |
| 7556900 |
Measuring the effect of flare on line width |
Jul. 7, 2009 |
| 7556899 |
System for controlling an overlay, method for controlling overlay, and method for manufacturing a semiconductor device |
Jul. 7, 2009 |
| 7556898 |
Overlay target for polarized light lithography |
Jul. 7, 2009 |
| 7556896 |
Inspection method and photomask |
Jul. 7, 2009 |
| 7553678 |
Method for detecting semiconductor manufacturing conditions |
Jun. 30, 2009 |
| 7550237 |
Systems and methods for determining width/space limits for mask layout |
Jun. 23, 2009 |
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