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Class Information
Number: 430/30
Name: Radiation imagery chemistry: process, composition, or product thereof > Including control feature responsive to a test or measurement
Description: Subject matter including the step of regulating a condition as a result of test or measurement to maintain or effect a change of the same.

Patents under this class:

Patent Number Title Of Patent Date Issued
8709687 Substrate and patterning device for use in metrology, metrology method and device manufacturing method Apr. 29, 2014
8709684 Automatic misalignment balancing scheme for multi-patterning technology Apr. 29, 2014
8703405 Methods of generating three-dimensional process window qualification Apr. 22, 2014
8703389 Method and system for forming patterns with charged particle beam lithography Apr. 22, 2014
8703369 Method of determining focus and dose of an apparatus of optical micro-lithography Apr. 22, 2014
8703368 Lithography process Apr. 22, 2014
8691481 Local exposure method and local exposure apparatus Apr. 8, 2014
8689150 Method of fabricating semiconductor device Apr. 1, 2014
8683395 Method and system for feed-forward advanced process control Mar. 25, 2014
8682466 Automatic virtual metrology for semiconductor wafer result prediction Mar. 25, 2014
8679708 Polarization monitoring reticle design for high numerical aperture lithography systems Mar. 25, 2014
8673522 Method for manufacturing photomask and photomask manufactured using the same Mar. 18, 2014
8669023 Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography Mar. 11, 2014
8663881 Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device Mar. 4, 2014
8658336 Methods of correcting for variation across substrates during photolithography Feb. 25, 2014
8647797 Methos and device for keeping mask dimensions constant Feb. 11, 2014
8642235 Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product Feb. 4, 2014
8640060 Method of generating a recipe for a manufacturing tool and system thereof Jan. 28, 2014
8637211 Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns Jan. 28, 2014
8625109 Method of determining an overlap distance of an optical head and digital exposure device using the method Jan. 7, 2014
8625096 Method and system for increasing alignment target contrast Jan. 7, 2014
8623576 Time differential reticle inspection Jan. 7, 2014
8617775 Optimized mask design for fabricating periodic and quasi-periodic patterns Dec. 31, 2013
8617774 Method and calibration mask for calibrating a position measuring apparatus Dec. 31, 2013
8614052 Method for controlling the electronic beam exposure of wafers and masks using proximity correction Dec. 24, 2013
8612900 Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions Dec. 17, 2013
8612899 Fast lithography compliance check for place and route optimization Dec. 17, 2013
8609308 Smart subfield method for E-beam lithography Dec. 17, 2013
8609307 Thin film evaluation method, mask blank, and transfer mask Dec. 17, 2013
8609306 Method for forming circular patterns on a surface Dec. 17, 2013
8609304 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device Dec. 17, 2013
8601407 Geometric pattern data quality verification for maskless lithography Dec. 3, 2013
8592108 Method for design and manufacture of patterns with variable shaped beam lithography Nov. 26, 2013
8587782 Optical-component fabricating method and optical-component fabricating apparatus Nov. 19, 2013
8584060 Block mask decomposition for mitigating corner rounding Nov. 12, 2013
8584052 Cell layout for multiple patterning technology Nov. 12, 2013
8581186 Charged particle beam apparatus Nov. 12, 2013
8574795 Lithographic CD correction by second exposure Nov. 5, 2013
8566756 Processing condition determining method and apparatus, display method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, substrate processing system, and progra Oct. 22, 2013
8563952 Charged particle beam writing apparatus Oct. 22, 2013
8563224 Data process for E-beam lithography Oct. 22, 2013
8563201 Mask, manufacturing method thereof and mask haze monitoring method Oct. 22, 2013
8563200 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Oct. 22, 2013
8559073 Booklet reading device Oct. 15, 2013
8555211 Mask making with error recognition Oct. 8, 2013
8555208 Systems and methods for implementing and manufacturing reticles for use in photolithography tools Oct. 8, 2013
8554510 Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product Oct. 8, 2013
8553198 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Oct. 8, 2013
8551677 Lithographic CD correction by second exposure Oct. 8, 2013
8548224 Method for inspecting measurement object Oct. 1, 2013

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