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Browse by Category: Main > Chemistry
Class Information
Number: 430/296
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Electron beam imaging
Description: Processes wherein the radiation used for imaging the medium is in the form of an electron beam.










Patents under this class:

Patent Number Title Of Patent Date Issued
8710465 Pattern data conversion for lithography system Apr. 29, 2014
8710463 Illuminating waveguide fabrication method Apr. 29, 2014
8709701 Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin Apr. 29, 2014
8703389 Method and system for forming patterns with charged particle beam lithography Apr. 22, 2014
8703369 Method of determining focus and dose of an apparatus of optical micro-lithography Apr. 22, 2014
8691925 Compositions of neutral layer for directed self assembly block copolymers and processes thereof Apr. 8, 2014
8685624 Photopolymerizable flexographic printing elements for printing with UV inks Apr. 1, 2014
8685622 Method for preparing a lithographic printing plate Apr. 1, 2014
8679728 Method for fabricating patterned layer Mar. 25, 2014
8679726 Negative-working lithographic printing plate precursors Mar. 25, 2014
8673542 Method and system for charged particle beam lithography Mar. 18, 2014
8673541 Block copolymer assembly methods and patterns formed thereby Mar. 18, 2014
8673522 Method for manufacturing photomask and photomask manufactured using the same Mar. 18, 2014
8669041 Method for improving print performance of flexographic printing elements Mar. 11, 2014
8669040 Method of manufacturing relief printing plate and printing plate precursor for laser engraving Mar. 11, 2014
8669023 Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography Mar. 11, 2014
8652761 Photosensitive resin laminate and thermal processing of the same Feb. 18, 2014
8647814 Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials Feb. 11, 2014
8637226 Method of forming an image having multiple phases Jan. 28, 2014
8637222 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern Jan. 28, 2014
8637211 Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns Jan. 28, 2014
8618515 Lithography apparatus and device manufacturing method Dec. 31, 2013
8614052 Method for controlling the electronic beam exposure of wafers and masks using proximity correction Dec. 24, 2013
8614033 Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition Dec. 24, 2013
8613999 Laser-engraveable compositions and flexographic printing precursors comprising organic porous particles Dec. 24, 2013
8609323 System for producing patterned silicon carbide structures Dec. 17, 2013
8609308 Smart subfield method for E-beam lithography Dec. 17, 2013
8609306 Method for forming circular patterns on a surface Dec. 17, 2013
8609305 Methods of forming a photolithography reticle Dec. 17, 2013
8603731 Resist underlayer film forming composition for electron beam lithography Dec. 10, 2013
8598544 Method of generating a two-level pattern for lithographic processing and pattern generator using the same Dec. 3, 2013
8592108 Method for design and manufacture of patterns with variable shaped beam lithography Nov. 26, 2013
8581186 Charged particle beam apparatus Nov. 12, 2013
8563952 Charged particle beam writing apparatus Oct. 22, 2013
8563224 Data process for E-beam lithography Oct. 22, 2013
8563216 Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process Oct. 22, 2013
8563200 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Oct. 22, 2013
8557144 Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head Oct. 15, 2013
8552405 Charged particle beam writing apparatus and charged particle beam writing method Oct. 8, 2013
8546063 Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays Oct. 1, 2013
8530121 Multiple-grid exposure method Sep. 10, 2013
8525135 System and method of electron beam writing Sep. 3, 2013
8524442 Integrated membrane lamination and UV exposure system and method of the same Sep. 3, 2013
8524427 Electron beam lithography system and method for improving throughput Sep. 3, 2013
8524426 Method of manufacturing a photomask Sep. 3, 2013
8512919 Method and system for design of a reticle to be manufactured using variable shaped beam lithography Aug. 20, 2013
8507159 Electron beam data storage system and method for high volume manufacturing Aug. 13, 2013
8501374 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography Aug. 6, 2013
8492732 Multi charged particle beam writing apparatus and multi charged particle beam writing method Jul. 23, 2013
8492055 Method and system for fracturing a pattern using lithography with multiple exposure passes Jul. 23, 2013











 
 
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