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Class Information
Number: 430/286.1
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Radiation sensitive composition comprising ethylenically unsaturated compound > Resin or prepolymer containing ethylenical unsaturation
Description: Subject matter wherein the ethylenically unsaturated ingredient is a resin or prepolymer with ethylenic unsaturation in the main chain of the resin or prepolymer (see (1) Note in subclass 287.1).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618766 |
Flame retardant photoimagable coverlay compositions and methods relating thereto |
Nov. 17, 2009 |
| 7615323 |
Lithographic printing plate precursors with oligomeric or polymeric sensitizers |
Nov. 10, 2009 |
| 7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same |
Nov. 3, 2009 |
| 7604921 |
Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same |
Oct. 20, 2009 |
| 7598014 |
Thick film photoresist composition and method of forming resist pattern |
Oct. 6, 2009 |
| RE40920 |
Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
Sep. 22, 2009 |
| 7585611 |
Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof |
Sep. 8, 2009 |
| 7582685 |
Multi-photon polymerizable pre-ceramic polymeric compositions |
Sep. 1, 2009 |
| 7556843 |
Photosensitive resin composition |
Jul. 7, 2009 |
| 7556911 |
Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method |
Jul. 7, 2009 |
| 7553605 |
Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate |
Jun. 30, 2009 |
| 7544463 |
Photosensitive structure for flexographic printing |
Jun. 9, 2009 |
| RE40728 |
Acid functional polymers based on benzocyclobutene |
Jun. 9, 2009 |
| 7537810 |
Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel |
May. 26, 2009 |
| 7537802 |
Aqueous copolymer composition and method for preparing a coating therefrom |
May. 26, 2009 |
| 7527909 |
Resist composition |
May. 5, 2009 |
| 7524605 |
Lithographic printing plate precursor and lithographic printing method |
Apr. 28, 2009 |
| 7524614 |
Negative-working radiation-sensitive compositions and imageable materials |
Apr. 28, 2009 |
| 7517633 |
Composition for forming gap-filling material for lithography |
Apr. 14, 2009 |
| 7501220 |
Resist composition |
Mar. 10, 2009 |
| 7494764 |
Negative photosensitive resin composition |
Feb. 24, 2009 |
| 7482112 |
Pattern forming method |
Jan. 27, 2009 |
| 7479361 |
Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process |
Jan. 20, 2009 |
| 7476487 |
Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same |
Jan. 13, 2009 |
| 7473513 |
Photosensitive metal nanoparticle and method of forming conductive pattern using the same |
Jan. 6, 2009 |
| 7473514 |
Sulfur-containing dispersant and sulfide phosphor paste composition comprising the same |
Jan. 6, 2009 |
| 7462440 |
Lithographic printing plate precursor and lithographic printing method using the same |
Dec. 9, 2008 |
| 7449277 |
Positive resist compositions and patterning process |
Nov. 11, 2008 |
| 7442486 |
Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
Oct. 28, 2008 |
| 7442492 |
Planographic printing plate precursor |
Oct. 28, 2008 |
| 7439009 |
Three-dimensional optical data storage in fluorescent dye-doped photopolymer |
Oct. 21, 2008 |
| 7432037 |
Curable resin composition and flexographic plate material using the same |
Oct. 7, 2008 |
| 7427465 |
On-press development of high speed laser sensitive lithographic printing plates |
Sep. 23, 2008 |
| 7425405 |
Method for making a lithographic printing plate |
Sep. 16, 2008 |
| 7425400 |
Planographic printing plate precursor |
Sep. 16, 2008 |
| 7419765 |
Method for producing flexographic printing plates by means of laser engraving |
Sep. 2, 2008 |
| 7408002 |
Photosensitive resin composition and process for the formation of hydrogel |
Aug. 5, 2008 |
| 7399575 |
Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
Jul. 15, 2008 |
| 7399574 |
Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel |
Jul. 15, 2008 |
| 7393567 |
Pattern forming method, arranged fine particle pattern forming method, conductive pattern forming method, and conductive pattern material |
Jul. 1, 2008 |
| 7389585 |
Method of manufacturing a liquid discharging head |
Jun. 24, 2008 |
| 7381516 |
Multiphoton photosensitization system |
Jun. 3, 2008 |
| 7371506 |
Positive photosensitive resin composition |
May. 13, 2008 |
| 7371783 |
Alkali-soluble maleimide copolymer and liquid crystal display comprising the same |
May. 13, 2008 |
| 7364834 |
Functional polymer |
Apr. 29, 2008 |
| 7348128 |
Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound |
Mar. 25, 2008 |
| 7341828 |
Thiol compound, photopolymerization initiator composition and photosensitive composition |
Mar. 11, 2008 |
| 7335456 |
Top coat material and use thereof in lithography processes |
Feb. 26, 2008 |
| 7326513 |
Positive working resist composition |
Feb. 5, 2008 |
| 7323290 |
Dry film photoresist |
Jan. 29, 2008 |
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