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Class Information
Number: 430/281.1
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Radiation sensitive composition comprising ethylenically unsaturated compound
Description: Subject matter wherein the radiation sensitive composition includes an ethylenically unsaturated ingredient.


Sub-classes under this class:

Class Number Class Name Patents
430/283.1 Amide 410
430/282.1 N-vinylidene 49
430/288.1 Plural, terminal unsaturation 595
430/285.1 Polyester 532
430/286.1 Resin or prepolymer containing ethylenical unsaturation 905


Patents under this class:

Patent Number Title Of Patent Date Issued
7618766 Flame retardant photoimagable coverlay compositions and methods relating thereto Nov. 17, 2009
7615331 Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device Nov. 10, 2009
7615323 Lithographic printing plate precursors with oligomeric or polymeric sensitizers Nov. 10, 2009
7615322 Photoresist composition and method of manufacturing a color filter substrate by using the same Nov. 10, 2009
7611818 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board Nov. 3, 2009
7611817 Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and Nov. 3, 2009
7608383 UV radiation blocking protective layers compatible with thick film pastes Oct. 27, 2009
7601764 Photosensitive resin composition Oct. 13, 2009
7601465 Holographic recording medium Oct. 13, 2009
7598014 Thick film photoresist composition and method of forming resist pattern Oct. 6, 2009
7592128 On-press developable negative-working imageable elements Sep. 22, 2009
7592124 Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparati Sep. 22, 2009
7588880 Incorporable photoinitiator Sep. 15, 2009
7588877 Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel Sep. 15, 2009
7582410 Laser-decomposable resin composition and pattern-forming material using the same Sep. 1, 2009
7582392 Hologram-recording material, hologram-recording medium, and hologram-recording method Sep. 1, 2009
7582391 Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization me Sep. 1, 2009
7579134 Polyimide composite coverlays and methods and compositions relating thereto Aug. 25, 2009
7574959 Radiation-sensitive compositions and imageable elements based thereon Aug. 18, 2009
7572559 Colorant-containing curable composition, color filter and manufacturing method thereof Aug. 11, 2009
7572555 Hologram recording material, hologram recording method and optical recording medium Aug. 11, 2009
7563558 Negative resists based on acid-catalyzed elimination of polar molecules Jul. 21, 2009
7560221 Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers Jul. 14, 2009
7556911 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method Jul. 7, 2009
7556910 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester Jul. 7, 2009
7553605 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate Jun. 30, 2009
7550240 Newtonian, ultrasonic-insensitive charge generating layer dispersion composition and a method for producing the composition Jun. 23, 2009
7550234 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording Jun. 23, 2009
7544461 Near infrared ray activation type positive resin composition Jun. 9, 2009
7541391 Self-forming polymer waveguide and waveguide material with reduced shrinkage Jun. 2, 2009
7537810 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel May. 26, 2009
7537802 Aqueous copolymer composition and method for preparing a coating therefrom May. 26, 2009
7531291 Laser-decomposable resin composition and laser-decomposable pattern-forming material and flexographic printing plate precursor of laser engraving type using the same May. 12, 2009
7527916 Photopolymerizable composition May. 5, 2009
7527909 Resist composition May. 5, 2009
7524617 Low-temperature curable photosensitive compositions Apr. 28, 2009
7524614 Negative-working radiation-sensitive compositions and imageable materials Apr. 28, 2009
7524606 Nanocomposite photoresist composition for imaging thick films Apr. 28, 2009
7524605 Lithographic printing plate precursor and lithographic printing method Apr. 28, 2009
7507525 Polymerizable composition and lithographic printing plate precursor Mar. 24, 2009
7504198 Methods for enhancing resolution of a chemically amplified photoresist Mar. 17, 2009
7504194 Positive resist composition and pattern making method using the same Mar. 17, 2009
7501220 Resist composition Mar. 10, 2009
7498115 Photoresist compositions Mar. 3, 2009
7497970 Chiral agent for liquid crystal, liquid crystal composition and polymer, as well as filter for optical recording medium, optical recording medium and color filter liquid for crystal Mar. 3, 2009
7491487 Polymerizable composition and lithographic printing plate precursor Feb. 17, 2009
7482112 Pattern forming method Jan. 27, 2009
7482111 Negative radiation-sensitive resin composition Jan. 27, 2009
7476487 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same Jan. 13, 2009
7476484 Photocrosslinkable polyurethanes Jan. 13, 2009



 
 
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