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Class Information
Number: 430/272.1
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making > Identified backing or protective layer containing > Silicon containing backing or protective layer
Description: Subject matter wherein the backing layer or the protecting layer contains silicon.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7419772 |
Mesoporous materials and methods |
Sep. 2, 2008 |
| 7399581 |
Photoresist topcoat for a photolithographic process |
Jul. 15, 2008 |
| 7390608 |
Photoresists containing Si-polymers |
Jun. 24, 2008 |
| 7354695 |
Producing a substrate having high surface-area texturing |
Apr. 8, 2008 |
| 7351513 |
Planographic printing plate precursor, substrate for the same and surface hydrophilic material |
Apr. 1, 2008 |
| 7341821 |
Method for manufacture of lithographic printing plate precursor no dampening water |
Mar. 11, 2008 |
| 7326442 |
Antireflective composition and process of making a lithographic structure |
Feb. 5, 2008 |
| 7306850 |
Planographic printing plate precursor, substrate for the same and surface hydrophilic material |
Dec. 11, 2007 |
| 7303855 |
Photoresist undercoat-forming material and patterning process |
Dec. 4, 2007 |
| 7303858 |
Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor devi |
Dec. 4, 2007 |
| 7238464 |
Photoresist formulation for high aspect ratio plating |
Jul. 3, 2007 |
| 7223523 |
Demonstration kit and method for enhancing and/or demonstrating photoactive properties |
May. 29, 2007 |
| 7220486 |
Photoresist compositions |
May. 22, 2007 |
| 7217497 |
Hydroxy-amino thermally cured undercoat for 193 nm lithography |
May. 15, 2007 |
| 7205091 |
Lithographic printing with printing members having primer layers |
Apr. 17, 2007 |
| 7198882 |
Adhesion promoting polymeric materials and planographic printing elements containing them |
Apr. 3, 2007 |
| 7186482 |
Multilayer imageable elements |
Mar. 6, 2007 |
| 7183036 |
Low activation energy positive resist |
Feb. 27, 2007 |
| 7175966 |
Water and aqueous base soluble antireflective coating/hardmask materials |
Feb. 13, 2007 |
| 7175974 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same |
Feb. 13, 2007 |
| 7172849 |
Antireflective hardmask and uses thereof |
Feb. 6, 2007 |
| 7166416 |
Protecting groups in polymers, photoresists and processes for microlithography |
Jan. 23, 2007 |
| 7163778 |
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern |
Jan. 16, 2007 |
| 7150959 |
Heat-sensitive lithographic printing plate precursor |
Dec. 19, 2006 |
| 7147988 |
Printing plate material, roll of a printing plate material and printing method |
Dec. 12, 2006 |
| 7122294 |
Photoacid generators with perfluorinated multifunctional anions |
Oct. 17, 2006 |
| 7108957 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same |
Sep. 19, 2006 |
| 7108956 |
Thermosensitive lithographic printing plate |
Sep. 19, 2006 |
| 7108953 |
Dissolution inhibitors in photoresist compositions for microlithography |
Sep. 19, 2006 |
| 7105266 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
Sep. 12, 2006 |
| 7097956 |
Imageable element containing silicate-coated polymer particle |
Aug. 29, 2006 |
| 7087359 |
Heat-sensitive lithographic printing plate precursor |
Aug. 8, 2006 |
| 7087361 |
Support for lithographic printing plate, method of preparing the support and presensitized plate |
Aug. 8, 2006 |
| 7078153 |
Planographic printing plate |
Jul. 18, 2006 |
| 7063934 |
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same |
Jun. 20, 2006 |
| 7063935 |
Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate |
Jun. 20, 2006 |
| 7029824 |
Positive working thermal imaging assembly or structure, method for the manufacture thereof and products used as lithographic printing plates and the like |
Apr. 18, 2006 |
| 7022457 |
Photoresists with hydroxylated, photoacid-cleavable groups |
Apr. 4, 2006 |
| 7005232 |
Highly reflective substrates for the digital processing of photopolymer printing plates |
Feb. 28, 2006 |
| 6977132 |
Planographic printing plate precursor |
Dec. 20, 2005 |
| 6964841 |
Directly imageable waterless planographic printing plate precursor |
Nov. 15, 2005 |
| 6953652 |
Heat-sensitive lithographic printing plate precursor |
Oct. 11, 2005 |
| 6949325 |
Negative resist composition with fluorosulfonamide-containing polymer |
Sep. 27, 2005 |
| 6949324 |
Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same |
Sep. 27, 2005 |
| 6936399 |
Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate |
Aug. 30, 2005 |
| 6919162 |
Method for producing high-structure area texturing of a substrate, substrates prepared thereby and masks for use therein |
Jul. 19, 2005 |
| 6899995 |
Protecting groups in polymers, photoresists and processes for microlithography |
May. 31, 2005 |
| 6890448 |
Antireflective hard mask compositions |
May. 10, 2005 |
| 6887649 |
Multi-layered resist structure and manufacturing method of semiconductor device |
May. 3, 2005 |
| 6884571 |
Intermediate layer composition for three-layer resist process and pattern formation method using the same |
Apr. 26, 2005 |
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