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Class Information
Number: 430/270.1
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making
Description: Radiation sensitive composition or product and the process of making the composition or product.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618765 |
Positive resist composition and patterning process |
Nov. 17, 2009 |
| 7618764 |
Positive resist compositions and patterning process |
Nov. 17, 2009 |
| 7618763 |
Resist composition and patterning process |
Nov. 17, 2009 |
| 7618552 |
Liquid-crystalline polymer composition, method for producing the same, and molded article using the same |
Nov. 17, 2009 |
| RE40964 |
Negative type resist composition |
Nov. 10, 2009 |
| 7615338 |
Photoresist coating composition and method for forming fine pattern using the same |
Nov. 10, 2009 |
| 7615335 |
Imaging methods |
Nov. 10, 2009 |
| 7615332 |
Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
Nov. 10, 2009 |
| 7615331 |
Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device |
Nov. 10, 2009 |
| 7615330 |
Positive resist composition and pattern formation method using the same |
Nov. 10, 2009 |
| 7615329 |
Branching self-assembling photoresist with decomposable backbone |
Nov. 10, 2009 |
| 7615325 |
Compositions for liquid crystal display |
Nov. 10, 2009 |
| 7615324 |
Photosensitive composition, and cured relief pattern production method and semiconductor device using the same |
Nov. 10, 2009 |
| 7615322 |
Photoresist composition and method of manufacturing a color filter substrate by using the same |
Nov. 10, 2009 |
| 7615263 |
Method of forming alignment layer for liquid crystal display and liquid crystal display fabricated using the same |
Nov. 10, 2009 |
| 7611828 |
Photoactive adhesion promoter |
Nov. 3, 2009 |
| 7611827 |
Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head |
Nov. 3, 2009 |
| 7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same |
Nov. 3, 2009 |
| 7611822 |
Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
Nov. 3, 2009 |
| 7611821 |
Positive resist compositions and patterning process |
Nov. 3, 2009 |
| 7611820 |
Positive resist composition and pattern-forming method using the same |
Nov. 3, 2009 |
| 7611819 |
Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same |
Nov. 3, 2009 |
| 7611818 |
Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board |
Nov. 3, 2009 |
| 7611817 |
Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and |
Nov. 3, 2009 |
| 7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
Oct. 27, 2009 |
| 7608386 |
Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same |
Oct. 27, 2009 |
| 7608383 |
UV radiation blocking protective layers compatible with thick film pastes |
Oct. 27, 2009 |
| 7608382 |
Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers |
Oct. 27, 2009 |
| 7608381 |
Polymer compound, positive resist composition and process for forming resist pattern |
Oct. 27, 2009 |
| 7608380 |
Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings |
Oct. 27, 2009 |
| 7608309 |
Resin composition, film and image display device utilizing the resin composition |
Oct. 27, 2009 |
| 7605439 |
Antireflective hard mask compositions |
Oct. 20, 2009 |
| 7604924 |
Negative-working imageable elements and methods of use |
Oct. 20, 2009 |
| 7604920 |
Positive resist composition, method of forming resist pattern, polymeric compound, and compound |
Oct. 20, 2009 |
| 7604919 |
Monomer, polymer and composition for photoresist |
Oct. 20, 2009 |
| 7604918 |
Photosensitive polymer and photoresist composition having the same |
Oct. 20, 2009 |
| 7604917 |
Polymer, top coating layer, top coating composition and immersion lithography process using the same |
Oct. 20, 2009 |
| 7604916 |
Donor films with pattern-directing layers |
Oct. 20, 2009 |
| 7604911 |
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor dev |
Oct. 20, 2009 |
| 7601819 |
Azo dye, colored curable composition, color filter and producing method therefor |
Oct. 13, 2009 |
| 7601486 |
Ultra dark polymer |
Oct. 13, 2009 |
| 7601480 |
Photoactive compounds |
Oct. 13, 2009 |
| 7601479 |
Polymer, resist composition and patterning process |
Oct. 13, 2009 |
| 7601478 |
Bicyclo compound, method for producing fused aromatic compound using the same and method for forming film of the same |
Oct. 13, 2009 |
| 7598182 |
Anti-reflective coating forming composition containing polyamic acid |
Oct. 6, 2009 |
| 7598022 |
Positive and negative dual function magnetic resist lithography |
Oct. 6, 2009 |
| 7598019 |
Method for cleavage of labile functional groups from chemical compounds |
Oct. 6, 2009 |
| 7598017 |
Negative resist composition and method of forming resist pattern |
Oct. 6, 2009 |
| 7598016 |
Resist composition and patterning process |
Oct. 6, 2009 |
| 7598015 |
Polymer, resist composition and patterning process |
Oct. 6, 2009 |
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