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Class Information
Number: 430/270.1
Name: Radiation imagery chemistry: process, composition, or product thereof > Imaging affecting physical property of radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product > Radiation sensitive composition or product or process of making
Description: Radiation sensitive composition or product and the process of making the composition or product.

Sub-classes under this class:

Class Number Class Name Patents
430/271.1 Identified backing or protective layer containing 1,617
430/270.11 Optical recording nonstructural layered product having a radiation sensitive composition layer claimed or solely disclosed as optically reorderable and optically machine readable 580
430/289.1 Radiation sensitive chromium compound 52
430/281.1 Radiation sensitive composition comprising ethylenically unsaturated compound 2,243
430/280.1 Radiation sensitive composition comprising oxirane ring containing component 769

Patents under this class:

Patent Number Title Of Patent Date Issued
8709700 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Apr. 29, 2014
8709699 Resist composition and method for producing resist pattern Apr. 29, 2014
8709698 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography Apr. 29, 2014
8709552 Resin composition and display device using the same Apr. 29, 2014
8709294 Electrode and method for manufacturing the same Apr. 29, 2014
8703404 Patterning process Apr. 22, 2014
8703401 Method for forming pattern and developer Apr. 22, 2014
8703387 Resist composition, method of forming resist pattern, novel compound, and acid generator Apr. 22, 2014
8703386 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications Apr. 22, 2014
8703385 Photoresist composition Apr. 22, 2014
8703384 Positive resist composition and patterning process Apr. 22, 2014
8703383 Photosensitive copolymer and photoresist composition Apr. 22, 2014
8703382 Photosensitive resin composition for flexographic printing having excellent solvent resistance Apr. 22, 2014
8703381 Lithographic printing plate precursors for on-press development Apr. 22, 2014
8691496 Method for forming resist under layer film, pattern forming method and composition for resist under layer film Apr. 8, 2014
8691494 Patterning process Apr. 8, 2014
8691492 Silane-based compounds and photosensitive resin composition comprising the same Apr. 8, 2014
8691491 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Apr. 8, 2014
8691490 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process Apr. 8, 2014
8686098 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method Apr. 1, 2014
8685629 Resist pattern forming process Apr. 1, 2014
8685624 Photopolymerizable flexographic printing elements for printing with UV inks Apr. 1, 2014
8685623 Lithographic imaging and printing without defects of electrostatic origin Apr. 1, 2014
8685622 Method for preparing a lithographic printing plate Apr. 1, 2014
8685620 Resist composition, method of forming resist pattern and polymeric compound Apr. 1, 2014
8685619 Resist composition and method for producing resist pattern Apr. 1, 2014
8685618 Resist composition and method for producing resist pattern Apr. 1, 2014
8685617 Salt, photoresist composition and process for producing photoresist pattern Apr. 1, 2014
8685616 Photoacid generators and lithographic resists comprising the same Apr. 1, 2014
8685615 Photosensitive resist underlayer film forming composition Apr. 1, 2014
8685614 Positive photosensitive composition Apr. 1, 2014
8679727 Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method Mar. 25, 2014
8679726 Negative-working lithographic printing plate precursors Mar. 25, 2014
8679725 Near-infrared absorbing and color compensation film composition for electronic devices Mar. 25, 2014
8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Mar. 25, 2014
8674043 Photosensitive resin composition containing copolymer Mar. 18, 2014
8673539 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part Mar. 18, 2014
8673538 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition Mar. 18, 2014
8673537 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition Mar. 18, 2014
8673536 Photosensitive polymeric networks Mar. 18, 2014
8669041 Method for improving print performance of flexographic printing elements Mar. 11, 2014
8669040 Method of manufacturing relief printing plate and printing plate precursor for laser engraving Mar. 11, 2014
8669039 Flexographic printing precursors and methods of making Mar. 11, 2014
8669038 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same Mar. 11, 2014
8669026 Black matrix for colour filters Mar. 11, 2014
8669025 Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor Mar. 11, 2014
8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Mar. 4, 2014
8663904 Norbornene-type polymers, compositions thereof and lithographic process using such compositions Mar. 4, 2014
8663903 Top coating composition Mar. 4, 2014
8663901 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Mar. 4, 2014

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