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Class Information
Number: 430/22
Name: Radiation imagery chemistry: process, composition, or product thereof > Registration or layout process other than color proofing
Description: Processes having a step recited for registering one or more images with each other or with the radiation-sensitive medium to be imaged.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 8709687 |
Substrate and patterning device for use in metrology, metrology method and device manufacturing method |
Apr. 29, 2014 |
| 8703405 |
Methods of generating three-dimensional process window qualification |
Apr. 22, 2014 |
| 8703368 |
Lithography process |
Apr. 22, 2014 |
| 8685633 |
Method for optimizing wafer edge patterning |
Apr. 1, 2014 |
| 8663877 |
Lithography masks, systems, and manufacturing methods |
Mar. 4, 2014 |
| 8625109 |
Method of determining an overlap distance of an optical head and digital exposure device using the method |
Jan. 7, 2014 |
| 8625096 |
Method and system for increasing alignment target contrast |
Jan. 7, 2014 |
| 8617774 |
Method and calibration mask for calibrating a position measuring apparatus |
Dec. 31, 2013 |
| 8610944 |
Method and apparatus for slow scan magnification adjustment using non-redundant overwriting |
Dec. 17, 2013 |
| 8609301 |
Mask, exposure apparatus and device manufacturing method |
Dec. 17, 2013 |
| 8592111 |
LCD panel photolithography process and mask |
Nov. 26, 2013 |
| 8592110 |
Alignment marks for multi-exposure lithography |
Nov. 26, 2013 |
| 8592107 |
Method and apparatus of providing overlay |
Nov. 26, 2013 |
| 8587782 |
Optical-component fabricating method and optical-component fabricating apparatus |
Nov. 19, 2013 |
| 8585915 |
Methods for fabricating sub-resolution alignment marks on semiconductor structures |
Nov. 19, 2013 |
| 8563952 |
Charged particle beam writing apparatus |
Oct. 22, 2013 |
| 8563202 |
Single field zero mask for increased alignment accuracy in field stitching |
Oct. 22, 2013 |
| 8555208 |
Systems and methods for implementing and manufacturing reticles for use in photolithography tools |
Oct. 8, 2013 |
| 8554510 |
Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product |
Oct. 8, 2013 |
| 8535858 |
Photomask and method for forming overlay mark using the same |
Sep. 17, 2013 |
| 8530121 |
Multiple-grid exposure method |
Sep. 10, 2013 |
| 8530120 |
Method and apparatus for performing pattern reconnection after individual or multipart alignment |
Sep. 10, 2013 |
| 8524426 |
Method of manufacturing a photomask |
Sep. 3, 2013 |
| 8512918 |
Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same |
Aug. 20, 2013 |
| 8486593 |
Roll-to-roll digital photolithography |
Jul. 16, 2013 |
| 8486587 |
Method for correcting layout pattern and method for manufacturing photomask |
Jul. 16, 2013 |
| 8455162 |
Alignment marks for multi-exposure lithography |
Jun. 4, 2013 |
| 8440372 |
Single field zero mask for increased alignment accuracy in field stitching |
May. 14, 2013 |
| 8435702 |
Manufacturing method of semiconductor device and manufacturing method of mask |
May. 7, 2013 |
| 8432548 |
Alignment for edge field nano-imprinting |
Apr. 30, 2013 |
| 8431827 |
Circuit modules and method of managing the same |
Apr. 30, 2013 |
| 8411271 |
Pattern forming method, pattern forming apparatus, and device manufacturing method |
Apr. 2, 2013 |
| 8404410 |
Method of aligning photomask with base material and method of manufacturing printed circuit board |
Mar. 26, 2013 |
| 8399163 |
Method of detecting alignment mark and method of manufacturing printed circuit board |
Mar. 19, 2013 |
| 8399160 |
Multilayer reflective film coated substrate, reflective mask blank, and method of manufacturing a reflective mask |
Mar. 19, 2013 |
| 8384900 |
Exposure apparatus |
Feb. 26, 2013 |
| 8383324 |
Mask registration correction |
Feb. 26, 2013 |
| 8367284 |
Exposure device, exposure method, and method for manufacturing semiconductor device |
Feb. 5, 2013 |
| 8361684 |
Method for patterning trenches with varying dimension |
Jan. 29, 2013 |
| 8361683 |
Multi-layer chip overlay target and measurement |
Jan. 29, 2013 |
| 8361679 |
Phase shift masks |
Jan. 29, 2013 |
| 8354209 |
Lithographic apparatus and device manufacturing method |
Jan. 15, 2013 |
| 8345244 |
Exposure apparatus |
Jan. 1, 2013 |
| 8343693 |
Focus test mask, focus measurement method, exposure method and exposure apparatus |
Jan. 1, 2013 |
| 8329366 |
Apparatus and method for providing resist alignment marks in a double patterning lithographic process |
Dec. 11, 2012 |
| 8329360 |
Method and apparatus of providing overlay |
Dec. 11, 2012 |
| 8323860 |
Solid-state imaging device producing method and exposure mask |
Dec. 4, 2012 |
| 8318392 |
Alignment method and method for manufacturing flat panel display |
Nov. 27, 2012 |
| 8313877 |
Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring mark |
Nov. 20, 2012 |
| 8309282 |
Apparatus and method for aligning mask |
Nov. 13, 2012 |
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