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Browse by Category: Main > Chemistry
Class Information
Number: 430/22
Name: Radiation imagery chemistry: process, composition, or product thereof > Registration or layout process other than color proofing
Description: Processes having a step recited for registering one or more images with each other or with the radiation-sensitive medium to be imaged.










Patents under this class:

Patent Number Title Of Patent Date Issued
8709687 Substrate and patterning device for use in metrology, metrology method and device manufacturing method Apr. 29, 2014
8703405 Methods of generating three-dimensional process window qualification Apr. 22, 2014
8703368 Lithography process Apr. 22, 2014
8685633 Method for optimizing wafer edge patterning Apr. 1, 2014
8663877 Lithography masks, systems, and manufacturing methods Mar. 4, 2014
8625109 Method of determining an overlap distance of an optical head and digital exposure device using the method Jan. 7, 2014
8625096 Method and system for increasing alignment target contrast Jan. 7, 2014
8617774 Method and calibration mask for calibrating a position measuring apparatus Dec. 31, 2013
8610944 Method and apparatus for slow scan magnification adjustment using non-redundant overwriting Dec. 17, 2013
8609301 Mask, exposure apparatus and device manufacturing method Dec. 17, 2013
8592111 LCD panel photolithography process and mask Nov. 26, 2013
8592110 Alignment marks for multi-exposure lithography Nov. 26, 2013
8592107 Method and apparatus of providing overlay Nov. 26, 2013
8587782 Optical-component fabricating method and optical-component fabricating apparatus Nov. 19, 2013
8585915 Methods for fabricating sub-resolution alignment marks on semiconductor structures Nov. 19, 2013
8563952 Charged particle beam writing apparatus Oct. 22, 2013
8563202 Single field zero mask for increased alignment accuracy in field stitching Oct. 22, 2013
8555208 Systems and methods for implementing and manufacturing reticles for use in photolithography tools Oct. 8, 2013
8554510 Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product Oct. 8, 2013
8535858 Photomask and method for forming overlay mark using the same Sep. 17, 2013
8530121 Multiple-grid exposure method Sep. 10, 2013
8530120 Method and apparatus for performing pattern reconnection after individual or multipart alignment Sep. 10, 2013
8524426 Method of manufacturing a photomask Sep. 3, 2013
8512918 Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same Aug. 20, 2013
8486593 Roll-to-roll digital photolithography Jul. 16, 2013
8486587 Method for correcting layout pattern and method for manufacturing photomask Jul. 16, 2013
8455162 Alignment marks for multi-exposure lithography Jun. 4, 2013
8440372 Single field zero mask for increased alignment accuracy in field stitching May. 14, 2013
8435702 Manufacturing method of semiconductor device and manufacturing method of mask May. 7, 2013
8432548 Alignment for edge field nano-imprinting Apr. 30, 2013
8431827 Circuit modules and method of managing the same Apr. 30, 2013
8411271 Pattern forming method, pattern forming apparatus, and device manufacturing method Apr. 2, 2013
8404410 Method of aligning photomask with base material and method of manufacturing printed circuit board Mar. 26, 2013
8399163 Method of detecting alignment mark and method of manufacturing printed circuit board Mar. 19, 2013
8399160 Multilayer reflective film coated substrate, reflective mask blank, and method of manufacturing a reflective mask Mar. 19, 2013
8384900 Exposure apparatus Feb. 26, 2013
8383324 Mask registration correction Feb. 26, 2013
8367284 Exposure device, exposure method, and method for manufacturing semiconductor device Feb. 5, 2013
8361684 Method for patterning trenches with varying dimension Jan. 29, 2013
8361683 Multi-layer chip overlay target and measurement Jan. 29, 2013
8361679 Phase shift masks Jan. 29, 2013
8354209 Lithographic apparatus and device manufacturing method Jan. 15, 2013
8345244 Exposure apparatus Jan. 1, 2013
8343693 Focus test mask, focus measurement method, exposure method and exposure apparatus Jan. 1, 2013
8329366 Apparatus and method for providing resist alignment marks in a double patterning lithographic process Dec. 11, 2012
8329360 Method and apparatus of providing overlay Dec. 11, 2012
8323860 Solid-state imaging device producing method and exposure mask Dec. 4, 2012
8318392 Alignment method and method for manufacturing flat panel display Nov. 27, 2012
8313877 Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring mark Nov. 20, 2012
8309282 Apparatus and method for aligning mask Nov. 13, 2012











 
 
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