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Class Information
Number: 430/168
Name: Radiation imagery chemistry: process, composition, or product thereof > Diazo reproduction, process, composition, or product > Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction > Process of making diazo product
Description: Products of making a diazo product having at least two named layers.










Sub-classes under this class:

Class Number Class Name Patents
430/169 Using specific adjuvant other than radiation-sensitive diazo compound 134


Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
7695875 Photo-sensitive composition Apr. 13, 2010
RE41083 Solvent resistant polymers with improved bakeablity features Jan. 19, 2010
7399569 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material Jul. 15, 2008
7005227 One component EUV photoresist Feb. 28, 2006
6908717 Positive photosensitive resin composition, process for its preparation, and semiconductor devices Jun. 21, 2005
6861196 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds Mar. 1, 2005
6852464 Method of manufacturing a thermally imageable element Feb. 8, 2005
6849372 Method of manufacturing imaging compositions Feb. 1, 2005
6683674 Image recording device Jan. 27, 2004
6645689 Solvent resistant polymers with improved bakeability features Nov. 11, 2003
6475692 Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising such compositions Nov. 5, 2002
6346361 Method for synthesizing polymeric AZO dyes Feb. 12, 2002
6338930 Positive photoresist layer and a method for using the same Jan. 15, 2002
6291134 Lithographic plate precursor Sep. 18, 2001
6165689 Method for making positive working printing plates from a light sensitive imaging element Dec. 26, 2000
6080521 Universal diazotype precoat for application to base papers with acidic or alkaline sizing Jun. 27, 2000
5998084 Radiation-sensitive recording material for the production of planographic printing plates Dec. 7, 1999
5994031 Method of processing presensitized planographic printing plate Nov. 30, 1999
5962183 Metal ion reduction in photoresist compositions by chelating ion exchange resin Oct. 5, 1999
5928836 Fractionated novolak resin copolymer and photoresist composition therefrom Jul. 27, 1999
5922511 On the press development of a diazo based printing plate Jul. 13, 1999
5879861 Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask Mar. 9, 1999
5866295 Photosensitive quinolone compounds and a process of preparation Feb. 2, 1999
5863700 Isolation of novolak resin without high temperature distillation and photoresist composition therefrom Jan. 26, 1999
5753404 Photosensitive recording material containing negative working diazonium salt layer and discontinuous top layer May. 19, 1998
5739265 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom Apr. 14, 1998
5693749 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom Dec. 2, 1997
5677102 Method for the preparation of photoresist solution Oct. 14, 1997
5656413 Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom Aug. 12, 1997
5618649 Storage stability of a diazo-based imaging element for making a printing plate Apr. 8, 1997
5587267 Method of forming photoresist film exhibiting uniform reflectivity through electrostatic deposition Dec. 24, 1996
5547806 Process for producing microcapsule containing diazonium salt compound and photo- and heat-sensitive recording material produced using the same Aug. 20, 1996
5543263 Photoresist having a low level of metal ions Aug. 6, 1996
5492789 Process for producing microcapsules containing a diazonium salt compound and a photofixation thermal recording material employing the same Feb. 20, 1996
5476750 Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists Dec. 19, 1995
5401604 Positive-type photosensitive resin compositions with quinone diazide sulfonyl unit Mar. 28, 1995
5382495 Overcoats for diazo-containing layers with chemicals and abrasion resistance Jan. 17, 1995
5376504 Acid-hardening photoresists comprising a purified hexamethoxy methylmelamine resin as a crosslinker Dec. 27, 1994
5358823 Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone Oct. 25, 1994
5340681 Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigme Aug. 23, 1994
5302490 Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin Apr. 12, 1994
5242780 Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups Sep. 7, 1993
5223376 Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent Jun. 29, 1993
5217840 Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom Jun. 8, 1993
5200291 Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin Apr. 6, 1993
5192640 Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof Mar. 9, 1993
5166036 Electrodeposition coating composition and image-forming method using the same Nov. 24, 1992
5122442 Method for forming an image from a high speed screen printing composition on a screen mesh Jun. 16, 1992
5080997 Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condens Jan. 14, 1992
5080998 Process for the formation of positive images utilizing electrodeposition of o-quinone diazide compound containing photoresist on conductive surface Jan. 14, 1992

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