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Class Information
Number: 430/165
Name: Radiation imagery chemistry: process, composition, or product thereof > Diazo reproduction, process, composition, or product > Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction > Product with at least two named layers > Quinone diazide containing layer
Description: Products having a radiation-sensitive layer or coating containing a quinone diazide compound. Quinone diazides are sometimes called diazo ketones or diazo oxides. Iminoquinone diazides are considered quinone diazides for the purpose of this subclass.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7419763 |
Near-field exposure photoresist and fine pattern forming method using the same |
Sep. 2, 2008 |
| 7368205 |
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semicondu |
May. 6, 2008 |
| 7217489 |
Planographic printing plate |
May. 15, 2007 |
| 7214455 |
Photosensitive resin composition and process for producing heat-resistant resin film |
May. 8, 2007 |
| 7101650 |
Photosensitive resin composition for photoresist |
Sep. 5, 2006 |
| 7029820 |
Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate |
Apr. 18, 2006 |
| 7022463 |
Near-field exposure photoresist and fine pattern forming method using the same |
Apr. 4, 2006 |
| 7001705 |
Positively photosensitive resin composition and method of pattern formation |
Feb. 21, 2006 |
| 6908717 |
Positive photosensitive resin composition, process for its preparation, and semiconductor devices |
Jun. 21, 2005 |
| 6893791 |
Photoresist composition and method of forming pattern using the same |
May. 17, 2005 |
| 6893795 |
Lithographic printing plate precursor and production method of lithographic printing plate |
May. 17, 2005 |
| 6855292 |
In situ heat induced antigen recovery and staining apparatus and method |
Feb. 15, 2005 |
| 6849391 |
Photoresist, photolithography method using the same, and method for producing photoresist |
Feb. 1, 2005 |
| 6841330 |
Planographic printing plate precursor |
Jan. 11, 2005 |
| 6824947 |
Photosensitive composition comprising a phenol resin having a urea bond in the main chain |
Nov. 30, 2004 |
| 6821692 |
Kind of thin films for microsystem technology and microstructuring and their use |
Nov. 23, 2004 |
| 6815140 |
Positive resist composition |
Nov. 9, 2004 |
| 6806019 |
High-resolution photosensitive resin composition usable with i-line and method of forming pattern |
Oct. 19, 2004 |
| 6783911 |
Isocyanate crosslinked imageable compositions |
Aug. 31, 2004 |
| 6773858 |
Positive photoresist composition |
Aug. 10, 2004 |
| 6746812 |
Photosensitive resin composition |
Jun. 8, 2004 |
| 6733949 |
Novolak resin mixtures and photosensitive compositions comprising the same |
May. 11, 2004 |
| 6713225 |
1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition |
Mar. 30, 2004 |
| 6706454 |
Method for the production of a printing plate using particle growing acceleration by an additive polymer |
Mar. 16, 2004 |
| 6699636 |
Imaging element comprising a thermally activated crosslinking agent |
Mar. 2, 2004 |
| 6689531 |
Resist composition |
Feb. 10, 2004 |
| 6686120 |
Photoresist composition and method of forming pattern using the same |
Feb. 3, 2004 |
| 6680155 |
Positive photoresist composition |
Jan. 20, 2004 |
| 6677099 |
Positive type photosensitive polyimide resin composition |
Jan. 13, 2004 |
| 6670090 |
Positive working photosensitive composition, article and process for forming a relief pattern |
Dec. 30, 2003 |
| 6660445 |
Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound |
Dec. 9, 2003 |
| 6649319 |
Method of processing lithographic printing plate precursors |
Nov. 18, 2003 |
| 6645689 |
Solvent resistant polymers with improved bakeability features |
Nov. 11, 2003 |
| 6641972 |
Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same |
Nov. 4, 2003 |
| 6638680 |
Material and method for making an electroconductive pattern |
Oct. 28, 2003 |
| 6630279 |
Positive photoresist composition |
Oct. 7, 2003 |
| 6613494 |
Imageable element having a protective overlayer |
Sep. 2, 2003 |
| 6607865 |
Positive photosensitive resin composition |
Aug. 19, 2003 |
| 6593043 |
Composition of positive photosensitive resin precursor, and display device thereof |
Jul. 15, 2003 |
| 6576381 |
Semiconductor device |
Jun. 10, 2003 |
| 6558872 |
Relation to the manufacture of masks and electronic parts |
May. 6, 2003 |
| 6524764 |
Positive-type photosensitive polyimide precursor composition |
Feb. 25, 2003 |
| 6525152 |
Copolymer for improving the chemical and developer resistance of positive working printing plates |
Feb. 25, 2003 |
| 6517987 |
Positive-working presensitized plate useful for preparing a lithographic printing plate |
Feb. 11, 2003 |
| 6517988 |
Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
Feb. 11, 2003 |
| 6503682 |
Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition |
Jan. 7, 2003 |
| 6475692 |
Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising such compositions |
Nov. 5, 2002 |
| 6440646 |
Positive resist composition suitable for lift-off technique and pattern forming method |
Aug. 27, 2002 |
| 6426173 |
Preparation method for printing plate |
Jul. 30, 2002 |
| 6417317 |
Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin |
Jul. 9, 2002 |
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