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Class Information
Number: 427/901
Name: Coating processes > Liquid source chemical depostion (i.e., lscvd) or aerosol chemical vapor deposition (i.e., acvd)
Description: Process which includes vaporizing a liquid material within a chemical vapor deposition chamber or reactor, wherein the vaporized liquid (per se or in aerosol form) contacts a heated substrate to thermally decompose, thereby forming a coating (film, layer, etc.) on the substrate surface.










Patents under this class:

Patent Number Title Of Patent Date Issued
8551248 Showerhead for CVD depositions Oct. 8, 2013
8377803 Methods and systems for forming thin films Feb. 19, 2013
8318590 Methods and systems for forming thin films Nov. 27, 2012
8236375 Selective deposition of carbon nanotubes on optical fibers Aug. 7, 2012
7544388 Methods of depositing materials over substrates, and methods of forming layers over substrates Jun. 9, 2009
7238389 Vaporizing fluidized organic materials Jul. 3, 2007
7048968 Methods of depositing materials over substrates, and methods of forming layers over substrates May. 23, 2006
7029724 Composition and method for forming doped A-site deficient thin-film manganate layers on a substrate Apr. 18, 2006
6730354 Forming ferroelectric Pb(Zr,Ti)O3 films May. 4, 2004
6660331 MOCVD of SBT using toluene-based solvent system for precursor delivery Dec. 9, 2003
6602549 Indium source reagent composition, and use thereof for deposition of indium-containing films on subtrates and ion implantation of indium-doped shallow junction microelectronic structures Aug. 5, 2003
6576345 Dielectric films with low dielectric constants Jun. 10, 2003
6541067 Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide and method of using same Apr. 1, 2003
6383555 Misted precursor deposition apparatus and method with improved mist and mist flow May. 7, 2002
6355311 Method for making an optical recording medium and an optical recording medium obtained by the method Mar. 12, 2002
6187379 Fluidized bed coating process with liquid reagent Feb. 13, 2001
6169031 Chemical vapor deposition for titanium metal thin film Jan. 2, 2001
6126994 Liquid material supply apparatus and method Oct. 3, 2000
5989635 High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film Nov. 23, 1999
5681614 Hydrophobic treatment method involving delivery of a liquid process agent to a process space Oct. 28, 1997
5456945 Method and apparatus for material deposition Oct. 10, 1995
5393564 High efficiency method for performing a chemical vapor deposition utilizing a nonvolatile precursor Feb. 28, 1995
5278138 Aerosol chemical vapor deposition of metal oxide films Jan. 11, 1994
4994301 ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate Feb. 19, 1991











 
 
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