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Class Information
Number: 427/593
Name: Coating processes > Direct application of electrical, magnetic, wave, or particulate energy > Resistance heating > Vapor deposition employing resistance heating of substrate or coating material
Description: Processes wherein a substrate is resistively heated and a coating material is applied as a vapor or gas, or a source material for vapor deposition is resistively heated.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622149 |
Reactive metal sources and deposition method for thioaluminate phosphors |
Nov. 24, 2009 |
| 7588804 |
Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
Sep. 15, 2009 |
| 7560581 |
Vapor deposition of tungsten nitride |
Jul. 14, 2009 |
| 7488455 |
Apparatus for the production of carbon nanotubes |
Feb. 10, 2009 |
| 7488512 |
Method for preparing solid precursor tray for use in solid precursor evaporation system |
Feb. 10, 2009 |
| 7439208 |
Growth of in-situ thin films by reactive evaporation |
Oct. 21, 2008 |
| 7390381 |
Information recording medium and method of manufacturing the same |
Jun. 24, 2008 |
| 7378134 |
Method of forming high temperature corrosion resistant film |
May. 27, 2008 |
| 7378126 |
Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus |
May. 27, 2008 |
| 7358465 |
Method for restoring ceramic heater |
Apr. 15, 2008 |
| 7323229 |
Method and device for coating a substrate |
Jan. 29, 2008 |
| 7208744 |
Radiation image storage panel |
Apr. 24, 2007 |
| 7179508 |
Conducting polymer films and method of manufacturing the same by surface polymerization using ion-assisted deposition |
Feb. 20, 2007 |
| 7166732 |
Copper (I) compounds useful as deposition precursors of copper thin films |
Jan. 23, 2007 |
| 7156960 |
Method and device for continuous cold plasma deposition of metal coatings |
Jan. 2, 2007 |
| 7122736 |
Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique |
Oct. 17, 2006 |
| 7112690 |
Volatile noble metal organometallic complexes |
Sep. 26, 2006 |
| 7064224 |
Organometallic complexes and their use as precursors to deposit metal films |
Jun. 20, 2006 |
| 7056479 |
Process for preparing carbon nanotubes |
Jun. 6, 2006 |
| 7033640 |
Method of coloring cut gemstones |
Apr. 25, 2006 |
| 6992202 |
Single-source precursors for ternary chalcopyrite materials, and methods of making and using the same |
Jan. 31, 2006 |
| 6982341 |
Volatile copper aminoalkoxide complex and deposition of copper thin film using same |
Jan. 3, 2006 |
| 6956127 |
Alkyl group VA metal compounds |
Oct. 18, 2005 |
| 6929820 |
Method of forming a superconductor film |
Aug. 16, 2005 |
| 6919468 |
Asymmetric group 8 (VIII) metallocene compounds |
Jul. 19, 2005 |
| 6899966 |
Composite surface on a stainless steel matrix |
May. 31, 2005 |
| 6884901 |
Methods for making metallocene compounds |
Apr. 26, 2005 |
| 6861103 |
Synthesis of functional polymers and block copolymers on silicon oxide surfaces by nitroxide-mediated living free radical polymerization in vapor phase |
Mar. 1, 2005 |
| 6831188 |
Dihydrocarbylamino metal compounds |
Dec. 14, 2004 |
| 6824824 |
Method for recycling organometallic compound for MOCVD |
Nov. 30, 2004 |
| 6822107 |
Chemical vapor deposition precursors for deposition of copper |
Nov. 23, 2004 |
| 6818783 |
Volatile precursors for deposition of metals and metal-containing films |
Nov. 16, 2004 |
| 6808758 |
Pulse precursor deposition process for forming layers in semiconductor devices |
Oct. 26, 2004 |
| 6797341 |
Method for producing boride thin films |
Sep. 28, 2004 |
| 6777565 |
Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives |
Aug. 17, 2004 |
| 6767830 |
Br2SbCH3 a solid source ion implant and CVD precursor |
Jul. 27, 2004 |
| 6753437 |
CVD material compound and method for manufacturing the same, and CVD method of iridium or iridium compound thin film |
Jun. 22, 2004 |
| 6743933 |
Process of forming thin film and precursor for chemical vapor deposition |
Jun. 1, 2004 |
| 6743934 |
Raw material compounds for use in CVD, and chemical vapor deposition of ruthenium compound thin films |
Jun. 1, 2004 |
| 6695955 |
Method of forming polycrystalline silicon for liquid crystal display device |
Feb. 24, 2004 |
| 6683198 |
Group(III)-metal-hydrides with a guanidino-type ligand |
Jan. 27, 2004 |
| 6680397 |
Organoindium compounds |
Jan. 20, 2004 |
| 6663706 |
Raw material compounds for use in CVD, and chemical vapor deposition for producing iridium or iridium compound thin films |
Dec. 16, 2003 |
| 6642401 |
.beta.-diketonatocopper(I) complex containing allene compounds as ligand and process for producing the same |
Nov. 4, 2003 |
| 6638839 |
Hot-filament chemical vapor deposition chamber and process with multiple gas inlets |
Oct. 28, 2003 |
| 6620956 |
Nitrogen analogs of copper II .beta.-diketonates as source reagents for semiconductor processing |
Sep. 16, 2003 |
| 6610873 |
Method for recycling organometallic compound for MOCVD |
Aug. 26, 2003 |
| 6610416 |
Material treatment for reduced cutting energy and improved temperature capability of honeycomb seals |
Aug. 26, 2003 |
| 6605735 |
Ruthenium complex, process for producing the same and process for producing thin film |
Aug. 12, 2003 |
| 6603033 |
Organotitanium precursors for chemical vapor deposition and manufacturing method thereof |
Aug. 5, 2003 |
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