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Class Information
Number: 427/255.394
Name: Coating processes > Coating by vapor, gas, or smoke > Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized > Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, cvd, etc.) > Nitrogen containing coating (e.g., metal nitride, etc.)
Description: Process wherein the resulting coating contains nitrogen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625609 |
Formation of silicon nitride film |
Dec. 1, 2009 |
| 7604841 |
Method for extending time between chamber cleaning processes |
Oct. 20, 2009 |
| 7597930 |
Substrate with a photocatalytic coating |
Oct. 6, 2009 |
| 7582574 |
Diethylsilane as a silicon source in the deposition of metal silicate films |
Sep. 1, 2009 |
| RE40873 |
Method of making grooving or parting insert |
Aug. 18, 2009 |
| 7560581 |
Vapor deposition of tungsten nitride |
Jul. 14, 2009 |
| 7557229 |
Atomic layer deposition using metal amidinates |
Jul. 7, 2009 |
| 7531212 |
Process for producing an alumina coating comprised mainly of .alpha. crystal structure |
May. 12, 2009 |
| 7524533 |
Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processes |
Apr. 28, 2009 |
| 7514120 |
Precoat film forming method |
Apr. 7, 2009 |
| 7510608 |
Hard coating film |
Mar. 31, 2009 |
| 7510742 |
Multilayered boron nitride/silicon nitride fiber coatings |
Mar. 31, 2009 |
| 7507848 |
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide |
Mar. 24, 2009 |
| 7470450 |
Forming a silicon nitride film |
Dec. 30, 2008 |
| 7462376 |
CVD method for forming silicon nitride film |
Dec. 9, 2008 |
| 7452811 |
Method for forming a wiring of a semiconductor device, method for forming a metal layer of a semiconductor device and apparatus for performing the same |
Nov. 18, 2008 |
| 7439180 |
Dispenser system for atomic beam assisted metal organic chemical vapor deposition (MOCVD) |
Oct. 21, 2008 |
| 7396563 |
Ceramic thin film on various substrates, and process for producing same |
Jul. 8, 2008 |
| 7390535 |
Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
Jun. 24, 2008 |
| 7384665 |
Formation of protective coatings for color filters |
Jun. 10, 2008 |
| 7378129 |
Atomic layer deposition methods of forming conductive metal nitride comprising layers |
May. 27, 2008 |
| 7344755 |
Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
Mar. 18, 2008 |
| 7326438 |
Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type |
Feb. 5, 2008 |
| 7311946 |
Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes |
Dec. 25, 2007 |
| 7309514 |
Electron beam modification of CVD deposited films, forming low dielectric constant materials |
Dec. 18, 2007 |
| 7285312 |
Atomic layer deposition for turbine components |
Oct. 23, 2007 |
| 7270719 |
Method for manufacturing surface hardened stainless steel with improved wear resistance and low static friction properties |
Sep. 18, 2007 |
| 7208197 |
Method of depositing copper on a support |
Apr. 24, 2007 |
| 7192626 |
Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
Mar. 20, 2007 |
| 7189431 |
Method for forming a passivated metal layer |
Mar. 13, 2007 |
| 7172792 |
Method for forming a high quality low temperature silicon nitride film |
Feb. 6, 2007 |
| 7166516 |
Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN or SiCN |
Jan. 23, 2007 |
| 7150789 |
Atomic layer deposition methods |
Dec. 19, 2006 |
| 7148367 |
Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same |
Dec. 12, 2006 |
| 7125582 |
Low-temperature silicon nitride deposition |
Oct. 24, 2006 |
| 7122222 |
Precursors for depositing silicon containing films and processes thereof |
Oct. 17, 2006 |
| 7105441 |
Preheating of chemical vapor deposition precursors |
Sep. 12, 2006 |
| 7081271 |
Cyclical deposition of refractory metal silicon nitride |
Jul. 25, 2006 |
| 7070916 |
Radiation image conversion panel and production method thereof |
Jul. 4, 2006 |
| 7060322 |
Method of making heat treatable coated article with diamond-like carbon (DLC) coating |
Jun. 13, 2006 |
| 7041335 |
Titanium tantalum nitride silicide layer |
May. 9, 2006 |
| 7022378 |
Nitrogen passivation of interface states in SiO.sub.2/SiC structures |
Apr. 4, 2006 |
| 6986914 |
Metal nitride deposition by ALD with reduction pulse |
Jan. 17, 2006 |
| 6974781 |
Reactor precoating for reduced stress and uniform CVD |
Dec. 13, 2005 |
| 6969426 |
Forming improved metal nitrides |
Nov. 29, 2005 |
| 6967159 |
Systems and methods for forming refractory metal nitride layers using organic amines |
Nov. 22, 2005 |
| 6962728 |
Method for forming ONO top oxide in NROM structure |
Nov. 8, 2005 |
| 6949273 |
Methods of forming coatings on gas-dispersion fixtures in chemical-vapor-deposition systems |
Sep. 27, 2005 |
| 6946158 |
Deposition of titanium amides |
Sep. 20, 2005 |
| 6933021 |
Method of TiSiN deposition using a chemical vapor deposition (CVD) process |
Aug. 23, 2005 |
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