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Class Information
Number: 427/255.28
Name: Coating processes > Coating by vapor, gas, or smoke > Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized > Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, cvd, etc.)
Description: Process wherein all or any part of the mixture of vapors or gases is caused to react, resulting in the formation of a coating.
Sub-classes under this class:
| Class Number |
Class Name |
Patents |
| 427/255.39 |
Halogen or halogen compound containing reactant |
184 |
| 427/255.29 |
Inorganic oxygen, sulfur, selenium, or tellurium (i.e., chalcogen) containing coating (e.g., phosphosilicate, silicon oxynitride, etc.) |
206 |
| 427/255.394 |
Nitrogen containing coating (e.g., metal nitride, etc.) |
372 |
| 427/255.38 |
Phosphorus or boron containing coating (e.g., aluminum boride, boron phosphide etc.) |
198 |
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622153 |
Method of making vapour deposited oxygen-scavenging particles |
Nov. 24, 2009 |
| 7618681 |
Process for producing bismuth-containing oxide films |
Nov. 17, 2009 |
| 7615251 |
Processing device using shower head structure and processing method |
Nov. 10, 2009 |
| 7608299 |
Process for the deposition by CVD of a silver film on a substrate |
Oct. 27, 2009 |
| 7608301 |
Process for forming a protective coating containing aluminium and zirconium on a metal |
Oct. 27, 2009 |
| 7605083 |
Formation of composite tungsten films |
Oct. 20, 2009 |
| 7598196 |
Vapor-deposition material for the production of layers of high refractive index |
Oct. 6, 2009 |
| 7597951 |
Coated cutting tool insert |
Oct. 6, 2009 |
| 7597932 |
Mesoporous permeation layers for use on active electronic matrix devices |
Oct. 6, 2009 |
| 7592471 |
Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same |
Sep. 22, 2009 |
| 7585545 |
Hydrogen sulfide injection method for phosphor deposition |
Sep. 8, 2009 |
| 7556839 |
Method of manufacturing semiconductor device and apparatus for processing substrate |
Jul. 7, 2009 |
| 7547464 |
Organometallic precursor compounds |
Jun. 16, 2009 |
| 7544410 |
Hard metal or cermet body and method for producing the same |
Jun. 9, 2009 |
| 7531031 |
Copper (I) compounds useful as deposition precursors of copper thin films |
May. 12, 2009 |
| 7524481 |
Reactors for producing inorganic fullerene-like tungsten disulfide hollow nanoparticles and nanotubes |
Apr. 28, 2009 |
| 7514119 |
Method and apparatus for using solution based precursors for atomic layer deposition |
Apr. 7, 2009 |
| 7514586 |
Organic zinc precursor and ZnO thin-film deposition by MOCVD |
Apr. 7, 2009 |
| 7514374 |
Method for manufacturing flat substrates |
Apr. 7, 2009 |
| 7510608 |
Hard coating film |
Mar. 31, 2009 |
| 7501154 |
Surface modification of CVD polymer films |
Mar. 10, 2009 |
| 7501153 |
Alkoxide compound, thin film-forming material and method for forming thin film |
Mar. 10, 2009 |
| 7498059 |
Method for growing thin films |
Mar. 3, 2009 |
| 7485340 |
Production of elemental films using a boron-containing reducing agent |
Feb. 3, 2009 |
| 7470454 |
Non-thermal process for forming porous low dielectric constant films |
Dec. 30, 2008 |
| 7470450 |
Forming a silicon nitride film |
Dec. 30, 2008 |
| 7470296 |
Coated insert and method of making same |
Dec. 30, 2008 |
| 7468290 |
Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
Dec. 23, 2008 |
| 7455884 |
Atomic layer deposition with point of use generated reactive gas species |
Nov. 25, 2008 |
| 7452569 |
Organic aluminum precursor and method of manufacturing a metal wiring using the same |
Nov. 18, 2008 |
| 7442415 |
Modulated temperature method of atomic layer deposition (ALD) of high dielectric constant films |
Oct. 28, 2008 |
| 7431966 |
Atomic layer deposition method of depositing an oxide on a substrate |
Oct. 7, 2008 |
| 7431967 |
Limited thermal budget formation of PMD layers |
Oct. 7, 2008 |
| 7431969 |
Chemical vapor deposition of hydrogel films |
Oct. 7, 2008 |
| 7431998 |
Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
Oct. 7, 2008 |
| 7429402 |
Ruthenium as an underlayer for tungsten film deposition |
Sep. 30, 2008 |
| 7427425 |
Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
Sep. 23, 2008 |
| 7425350 |
Apparatus, precursors and deposition methods for silicon-containing materials |
Sep. 16, 2008 |
| 7422770 |
Forming a thin film structure |
Sep. 9, 2008 |
| 7422805 |
Cutting tool for bimetal machining |
Sep. 9, 2008 |
| 7419888 |
Method of forming a silicon-rich nanocrystalline structure by an atomic layer deposition process and method of manufacturing a non-volatile semiconductor device using the same |
Sep. 2, 2008 |
| 7413776 |
Method of depositing a metal-containing film |
Aug. 19, 2008 |
| 7410666 |
Metal nitride carbide deposition by ALD |
Aug. 12, 2008 |
| 7404983 |
Method and apparatus for open-air coating by laser-induced chemical vapor deposition |
Jul. 29, 2008 |
| 7404984 |
Method for growing thin films |
Jul. 29, 2008 |
| 7396563 |
Ceramic thin film on various substrates, and process for producing same |
Jul. 8, 2008 |
| 7393562 |
Deposition methods for improved delivery of metastable species |
Jul. 1, 2008 |
| 7390536 |
Method for fabricating composite gas separation modules |
Jun. 24, 2008 |
| 7390535 |
Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
Jun. 24, 2008 |
| 7384665 |
Formation of protective coatings for color filters |
Jun. 10, 2008 |
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