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Class Information
Number: 427/255.27
Name: Coating processes > Coating by vapor, gas, or smoke > Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized > Coating formed by reaction of vaporous or gaseous mixture with a base (i.e., reactive coating of non-metal base) > Silicon containing coating
Description: Process wherein the resulting coating contains silicon.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8709551 Smooth silicon-containing films Apr. 29, 2014
8703245 Coated cutting tool, cutting member or wear part Apr. 22, 2014
8673396 Method of forming continuous thin film and linear glass substrate with thin film Mar. 18, 2014
8591990 Microfiber supported metal silicide nanowires Nov. 26, 2013
8592005 Atomic layer deposition for controlling vertical film growth Nov. 26, 2013
8535760 Additives to silane for thin film silicon photovoltaic devices Sep. 17, 2013
8455293 Method for processing solar cell substrates Jun. 4, 2013
8440037 Coated article with low-E coating including IR reflecting layer(s) and corresponding method May. 14, 2013
8440021 Apparatus and method for deposition for organic thin films May. 14, 2013
8366892 Graphite electrode Feb. 5, 2013
8360001 Process for deposition of semiconductor films Jan. 29, 2013
8323737 Sequential chemical vapor deposition Dec. 4, 2012
8178162 Controlled deposition of silicon-containing coatings adhered by an oxide layer May. 15, 2012
8153833 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Apr. 10, 2012
8148012 Method for forming active material on a current collector of negative electrode using feedback process with measuring collector Apr. 3, 2012
8124181 Oxidation method providing parallel gas flow over substrates in a semiconductor process Feb. 28, 2012
8053038 Method for making titanium-based compound film of poly silicon solar cell Nov. 8, 2011
8043885 Method of manufacturing semiconductor film and method of manufacturing photovoltaic element Oct. 25, 2011
8043660 Method for manufacturing polycrystalline silicon Oct. 25, 2011
8043383 Reducing formaldehyde emissions Oct. 25, 2011
7976898 Atomic layer deposition apparatus Jul. 12, 2011
7955581 Method of producing silicon oxide, negative electrode active material for lithium ion secondary battery and lithium ion secondary battery using the same Jun. 7, 2011
7910765 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Mar. 22, 2011
7897205 Film forming method and film forming apparatus Mar. 1, 2011
7879409 Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamber Feb. 1, 2011
7879412 Diamond thin film coating method and diamond-coated cemented carbide member Feb. 1, 2011
7776751 Process for producing silicon compound Aug. 17, 2010
7758912 Anti-stiction coating Jul. 20, 2010
7732012 Method for manufacturing polycrystalline silicon, and polycrystalline silicon for solar cells manufactured by the method Jun. 8, 2010
7700156 Method and apparatus for forming silicon oxide film Apr. 20, 2010
7651726 Process for obtaining silicon nitride (SI.sub.3N.sub.4) surface coatings on ceramic components and pieces Jan. 26, 2010
7651730 Method and apparatus for forming silicon oxide film Jan. 26, 2010
7651961 Method for forming strained silicon nitride films and a device containing such films Jan. 26, 2010
7638167 Controlled deposition of silicon-containing coatings adhered by an oxide layer Dec. 29, 2009
7629033 Plasma processing method for forming a silicon nitride film on a silicon oxide film Dec. 8, 2009
7618901 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 Nov. 17, 2009
7531679 Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride May. 12, 2009
7514342 Method and apparatus for forming deposited film Apr. 7, 2009
7491660 Method of forming nitride films with high compressive stress for improved PFET device performance Feb. 17, 2009
7306852 Gas barrier film Dec. 11, 2007
7270849 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film Sep. 18, 2007
7201937 Methods for forming composite coatings on MEMS devices Apr. 10, 2007
7166516 Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN or SiCN Jan. 23, 2007
7125582 Low-temperature silicon nitride deposition Oct. 24, 2006
7118779 Reactor surface passivation through chemical deactivation Oct. 10, 2006
7067176 Method of fabricating an oxide layer on a silicon carbide layer utilizing an anneal in a hydrogen environment Jun. 27, 2006
7015061 Low temperature curable materials for optical applications Mar. 21, 2006
6998153 Suppression of NiSi.sub.2 formation in a nickel salicide process using a pre-silicide nitrogen plasma Feb. 14, 2006
6958174 Solid material comprising a thin metal film on its surface and methods for producing the same Oct. 25, 2005
6933021 Method of TiSiN deposition using a chemical vapor deposition (CVD) process Aug. 23, 2005

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